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17 条记录 (耗时 0.025 秒)

    Process for forming a cured film of a thermoplastic resin
    1.
    发明授权
    Process for forming a cured film of a thermoplastic resin 有权
    形成热塑性树脂固化膜的方法

    公开(公告)号：US06168908A

    公开(公告)日：2001-01-02

    申请号：US09166776

    申请日：1998-10-06

    申请人： Masayoshi Suzuki ,  Tomohiro Utaka ,  Masayuki Endo

    发明人： Masayoshi Suzuki ,  Tomohiro Utaka ,  Masayuki Endo

    IPC分类号： G03F726

    CPC分类号： G03F7/00 ,  G03F7/0007 ,  G03F7/094 ,  G03F7/422

    摘要： A process for forming a cured film comprising the steps of: coating an alkali-soluble thermosetting resin composition on a substrate, and baking it; coating a radiation sensitive resin composition on the coated film, and baking it, exposing the radiation sensitive resin composition on the substrate to radiation through a predetermined mask and baking it; carrying out development with an alkaline developer; immersing the substrate carrying the coated films in a stripping solution; and heating the alkali-soluble thermosetting resin remaining on the substrate to obtain a cured film pattern.

    摘要翻译： 一种形成固化膜的方法，包括以下步骤：将碱溶性热固性树脂组合物涂布在基材上，并烘烤; 在涂膜上涂布辐射敏感性树脂组合物，并烘烤，将基材上的辐射敏感性树脂组合物曝光通过预定掩模进行辐射并烘烤; 用碱性显影剂进行显影; 将承载涂膜的基材浸渍在剥离溶液中; 并加热残留在基材上的碱溶性热固性树脂以获得固化的膜图案。

    Positive type radiosensitive composition and method for forming pattern
    3.
    发明授权
    Positive type radiosensitive composition and method for forming pattern 有权
    正型放射敏感组合物和形成图案的方法

    公开(公告)号：US07005231B2

    公开(公告)日：2006-02-28

    申请号：US10484716

    申请日：2002-07-19

    申请人： Kentarou Tamaki ,  Tomohiro Utaka ,  Akira Nishikawa

    发明人： Kentarou Tamaki ,  Tomohiro Utaka ,  Akira Nishikawa

    IPC分类号： G03C1/73 ,  G03F7/075 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40

    CPC分类号： G02B6/13 ,  G02B6/122 ,  G02B6/1221 ,  G02B6/1347 ,  G02B6/138 ,  G02B2006/12097 ,  G02B2006/121 ,  G03F7/0045 ,  G03F7/0755 ,  G03F7/0757

    摘要： A positive-tone radiation-sensitive composition including: (A) at least one compound selected from the group consisting of a hydrolyzable silane compound represented by general formula (R1)pSi(X)4−p (wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer from 0 to 3), hydrolyzates thereof and condensates thereof; (B) a photoacid generator; and (C) a basic compound. A cured product that is excellent in terms of pattern precision and so on can be obtained by using the composition. The composition can be used as a material for forming optical waveguides.

    摘要翻译： 一种正音辐射敏感性组合物，其包含：（A）至少一种选自由通式（R 1）2表示的可水解硅烷化合物的化合物， Si（X）4-p（其中R 1是具有1至12个碳原子的不可水解的有机基团，X是可水解基团，p是整数 0至3），其水解产物和其缩合物; （B）光致酸发生器; 和（C）碱性化合物。 通过使用该组合物可以获得在图案精度等方面优异的固化物。 该组合物可以用作形成光波导的材料。

    Photosensitive resin composition for optical waveguide formation and optical waveguide
    4.
    发明授权
    Photosensitive resin composition for optical waveguide formation and optical waveguide 有权
    用于光波导形成和光波导的光敏树脂组合物

    公开(公告)号：US07394965B2

    公开(公告)日：2008-07-01

    申请号：US10593815

    申请日：2005-02-23

    申请人： Tomohiro Utaka ,  Hideaki Takase ,  Yuuichi Eriyama

    发明人： Tomohiro Utaka ,  Hideaki Takase ,  Yuuichi Eriyama

    IPC分类号： G02B6/00

    CPC分类号： G02B6/1221 ,  C08G59/08 ,  C08G59/68 ,  G02B6/138

    摘要： A radiation-sensitive resin composition for forming optical waveguides, which comprises (A) a novolac type epoxy resin and (B) a photo-acid generator. The composition is used as materials for a core portion 5 of an optical waveguide 1, and the like. In the composition, component (A) is represented by the following general formula (1). (In the formula, R1 is a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an aralkyl group; and n is an integer from 0 to 10.) The composition is excellent in patterning properties and the like in curing process, and is also excellent in heat resistance, transmission characteristics, and long-term reliability after the optical waveguide has been formed.

    摘要翻译： 一种用于形成光波导的辐射敏感性树脂组合物，其包含（A）酚醛清漆型环氧树脂和（B）光酸产生剂。 该组合物用作光波导1的芯部分5的材料等。 在组合物中，组分（A）由以下通式（1）表示。 （式中，R 1为氢原子，碳原子数为1〜12的烷基或芳烷基，n为0〜10的整数。）组成优异 在固化过程中的图案化特性等，并且在形成光波导之后的耐热性，透射特性和长期可靠性也优异。

    Lactone copolymer and radiation-sensitive resin composition
    6.
    发明申请
    Lactone copolymer and radiation-sensitive resin composition 有权
    内酯共聚物和辐射敏感树脂组合物

    公开(公告)号：US20090053649A1

    公开(公告)日：2009-02-26

    申请号：US11579646

    申请日：2005-05-02

    申请人： Hiromitsu Nakashima ,  Tomohiro Utaka ,  Takashi Chiba ,  Eiji Yoneda ,  Atsushi Nakamura

    发明人： Hiromitsu Nakashima ,  Tomohiro Utaka ,  Takashi Chiba ,  Eiji Yoneda ,  Atsushi Nakamura

    IPC分类号： G03F7/004 ,  C08F24/00

    CPC分类号： C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    摘要： A radiation-sensitive resin composition excelling in basic properties as a resist such as sensitivity, resolution, and the like, having a wide depth of focus (DOF) to both a line-and-space pattern and an isolated space pattern, and exhibiting a minimal line width change due to fluctuation of a bake temperature, and having a small line width limit in which the line pattern destroying phenomenon does not occur, and a lactone-containing copolymer useful as a resin component of the composition are provided.The lactone-containing copolymer is represented by a copolymer of the following compounds (1-1), (2-1), and (3-1). The radiation-sensitive resin composition comprises (a) the lactone-containing copolymer and (b) a photoacid generator.

    摘要翻译： 作为具有对于线间距图案和隔离空间图案的宽焦点（DOF）的宽灵敏度，分辨率等的抗蚀剂的基本性能优异的辐射敏感性树脂组合物， 由于烘烤温度的波动引起的线宽变化最小，并且具有不发生线型破坏现象的小线宽限制，并且提供可用作该组合物的树脂成分的含内酯共聚物。 含有内酯的共聚物由以下化合物（1-1），（2-1）和（3-1）的共聚物表示。 辐射敏感性树脂组合物包含（a）含内酯共聚物和（b）光酸产生剂。

    Copolymer and Top Coating Composition
    7.
    发明申请
    Copolymer and Top Coating Composition 有权
    共聚物和顶部涂料组合物

    公开(公告)号：US20080038661A1

    公开(公告)日：2008-02-14

    申请号：US11664296

    申请日：2005-09-28

    申请人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    发明人： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC分类号： C08F12/30 ,  G03C1/73

    CPC分类号： G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    摘要： A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.

    摘要翻译： 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000，其中R 1〜 R 2是具有1〜4个碳原子的氟代烷基，式（2）中的R 3表示碳原子数1〜20的氟代烷基 。

    Radiation-curable composition, optical waveguide and method for formation thereof
    8.
    发明授权
    Radiation-curable composition, optical waveguide and method for formation thereof 有权
    可辐射固化组合物，光波导及其形成方法

    公开(公告)号：US07162131B2

    公开(公告)日：2007-01-09

    申请号：US10513355

    申请日：2003-10-20

    申请人： Hideaki Takase ,  Kentarou Tamaki ,  Jun Huangfu ,  Tomohiro Utaka ,  Yuuichi Eriyama

    发明人： Hideaki Takase ,  Kentarou Tamaki ,  Jun Huangfu ,  Tomohiro Utaka ,  Yuuichi Eriyama

    IPC分类号： G02B6/10 ,  G03C1/73

    CPC分类号： C09D183/08 ,  C08L83/08 ,  G02B6/138 ,  G02B2006/121 ,  G03F7/001 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0757 ,  C08L2666/24 ,  C08L2666/34 ,  C08L2666/28

    摘要： A radiation-curable composition containing (A) hydrolyzates of hydrolyzable silane compounds represented by general formula (1): (R1)p(R2)qSi(X)4-p-q (wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms that contains fluorine atoms, R2 is a non-hydrolyzable organic group having 1 to 12 carbon atoms (but excluding ones that contain fluorine atoms), X is a hydrolyzable group, p is an integer of 1 or 2, and q is an integer of 0 or 1) and condensates of such hydrolyzates, and (B) a photo acid generator, wherein the ratio of silanol (Si—OH) groups in the composition is 0.1 to 0.5 out of all the bonding groups on Si. With such a composition, the waveguide loss is low for light having a wavelength in a broad range from the visible region to the near infrared region, and moreover the cracking resistance, the patterning ability upon irradiation with radiation, and so on are excellent.

    摘要翻译： 一种含有（A）由通式（1）表示的可水解硅烷化合物的水解产物的可辐射固化组合物：（R 1）2（R 2） ）其中R 1是具有1至12个碳原子的不可水解的有机基团，其含有（C 1 -C 4） 氟原子，R 2是具有1至12个碳原子的不可水解的有机基团（但不包括含有氟原子的有机基团），X是可水解基团，p是1或2的整数， 和q是0或1的整数）和这些水解产物的缩合物，和（B）光酸产生剂，其中组合物中硅烷醇（Si-OH）基团的比例为0.1至0.5， Si。 通过这样的组成，对于具有从可见光区域到近红外区域的宽范围的波长的光，波导损耗低，而且耐龟裂性，照射辐射时的图案化能力等优异。

    Radiation curable composition, optical waveguide and method for formation thereof
    9.
    发明申请
    Radiation curable composition, optical waveguide and method for formation thereof 有权
    辐射固化性组合物，光波导及其形成方法

    公开(公告)号：US20060165362A1

    公开(公告)日：2006-07-27

    申请号：US10513355

    申请日：2003-10-20

    申请人： Hideaki Takase ,  Kentarou Tamaki ,  Jun Huangfu ,  Tomohiro Utaka ,  Yuuichi Eriyama

    发明人： Hideaki Takase ,  Kentarou Tamaki ,  Jun Huangfu ,  Tomohiro Utaka ,  Yuuichi Eriyama

    IPC分类号： G02B6/10

    CPC分类号： C09D183/08 ,  C08L83/08 ,  G02B6/138 ,  G02B2006/121 ,  G03F7/001 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0757 ,  C08L2666/24 ,  C08L2666/34 ,  C08L2666/28

    摘要： A radiation-curable composition containing (A) hydrolyzates of hydrolyzable silane compounds represented by general formula (1): (R1)p(R2)qSi(X)4-p-q (wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms that contains fluorine atoms, R2 is a non-hydrolyzable organic group having 1 to 12 carbon atoms (but excluding ones that contain fluorine atoms), X is a hydrolyzable group, p is an integer of 1 or 2, and q is an integer of 0 or 1) and condensates of such hydrolyzates, and (B) a photo acid generator, wherein the ratio of silanol (Si—OH) groups in the composition is 0.1 to 0.5 out of all the bonding groups on Si. With such a composition, the waveguide loss is low for light having a wavelength in a broad range from the visible region to the near infrared region, and moreover the cracking resistance, the patterning ability upon irradiation with radiation, and so on are excellent.

    摘要翻译： 一种含有（A）由通式（1）表示的可水解硅烷化合物的水解产物的可辐射固化组合物：（R 1）P（R 2） ）其中R 1是具有1至12个碳原子的不可水解的有机基团，其含有（C 1 -C 4） 氟原子，R 2是具有1至12个碳原子的不可水解的有机基团（但不包括含有氟原子的有机基团），X是可水解基团，p是1或2的整数， 和q是0或1的整数）和这些水解产物的缩合物，和（B）光酸产生剂，其中组合物中硅烷醇（Si-OH）基团的比例为0.1至0.5， Si。 通过这样的组成，对于具有从可见光区域到近红外区域的宽范围的波长的光，波导损耗低，而且耐龟裂性，照射辐射时的图案化能力等优异。