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公开(公告)号:US11276449B2
公开(公告)日:2022-03-15
申请号:US16838585
申请日:2020-04-02
IPC分类号: G11C11/22 , H01L27/1159 , H01L21/28 , H01L29/78 , H01L27/11507 , H01L29/788
摘要: Some embodiments include a ferroelectric transistor. The transistor has gate dielectric material configured as a first container, with the first container having a first inner surface. Metal-containing material is configured as a second container nested within said first container. The second container has a second inner surface with an area less than the first inner surface. Ferroelectric material is configured as a third container nested within the second container. The third container has a third inner surface with an area less than the second inner surface. Gate material is within the third container. Some embodiments include memory arrays having ferroelectric transistors as memory cells. Some embodiments include methods of writing/reading relative to memory cells of memory arrays when the memory cells are metal-ferroelectric-metal-insulator-semiconductor (MFMIS) transistors.
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2.
公开(公告)号:US20200234751A1
公开(公告)日:2020-07-23
申请号:US16838585
申请日:2020-04-02
IPC分类号: G11C11/22 , H01L21/28 , H01L27/1159 , H01L29/788 , H01L27/11507 , H01L29/78
摘要: Some embodiments include a ferroelectric transistor. The transistor has gate dielectric material configured as a first container, with the first container having a first inner surface. Metal-containing material is configured as a second container nested within said first container. The second container has a second inner surface with an area less than the first inner surface. Ferroelectric material is configured as a third container nested within the second container. The third container has a third inner surface with an area less than the second inner surface. Gate material is within the third container. Some embodiments include memory arrays having ferroelectric transistors as memory cells. Some embodiments include methods of writing/reading relative to memory cells of memory arrays when the memory cells are metal-ferroelectric-metal-insulator-semiconductor (MFMIS) transistors.
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3.
公开(公告)号:US20170309322A1
公开(公告)日:2017-10-26
申请号:US15134221
申请日:2016-04-20
IPC分类号: G11C11/22 , H01L27/11507 , H01L29/788 , H01L29/78
摘要: Some embodiments include a ferroelectric transistor. The transistor has gate dielectric material configured as a first container, with the first container having a first inner surface. Metal-containing material is configured as a second container nested within said first container. The second container has a second inner surface with an area less than the first inner surface. Ferroelectric material is configured as a third container nested within the second container. The third container has a third inner surface with an area less than the second inner surface. Gate material is within the third container. Some embodiments include memory arrays having ferroelectric transistors as memory cells. Some embodiments include methods of writing/reading relative to memory cells of memory arrays when the memory cells are metal-ferroelectric-metal-insulator-semiconductor (MFMIS) transistors.
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公开(公告)号:US20220157364A1
公开(公告)日:2022-05-19
申请号:US17589603
申请日:2022-01-31
IPC分类号: G11C11/22 , H01L27/1159 , H01L21/28 , H01L29/78 , H01L27/11507 , H01L29/788
摘要: Some embodiments include a ferroelectric transistor. The transistor has gate dielectric material configured as a first container, with the first container having a first inner surface. Metal-containing material is configured as a second container nested within said first container. The second container has a second inner surface with an area less than the first inner surface. Ferroelectric material is configured as a third container nested within the second container. The third container has a third inner surface with an area less than the second inner surface. Gate material is within the third container. Some embodiments include memory arrays having ferroelectric transistors as memory cells. Some embodiments include methods of writing/reading relative to memory cells of memory arrays when the memory cells are metal-ferroelectric-metal-insulator-semiconductor (MFMIS) transistors.
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5.
公开(公告)号:US10943986B2
公开(公告)日:2021-03-09
申请号:US15859122
申请日:2017-12-29
IPC分类号: H01L29/66 , H01L29/51 , H01L21/28 , H01L29/423 , H01L29/78 , H01L45/00 , G11C14/00 , H01L27/108 , H01L27/1159 , H01L29/08 , H01L29/10 , H01L29/40 , H01L27/11585
摘要: Some embodiments include a semiconductor construction having a gate extending into a semiconductor base. Conductively-doped source and drain regions are within the base adjacent the gate. A gate dielectric has a first segment between the source region and the gate, a second segment between the drain region and the gate, and a third segment between the first and second segments. At least a portion of the gate dielectric comprises ferroelectric material. In some embodiments the ferroelectric material is within each of the first, second and third segments. In some embodiments, the ferroelectric material is within the first segment or the third segment. In some embodiments, a transistor has a gate, a source region and a drain region; and has a channel region between the source and drain regions. The transistor has a gate dielectric which contains ferroelectric material between the source region and the gate.
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公开(公告)号:US09882016B2
公开(公告)日:2018-01-30
申请号:US15411886
申请日:2017-01-20
IPC分类号: H01L29/51 , H01L29/08 , H01L29/10 , H01L29/40 , H01L29/423 , H01L29/78 , H01L27/1159 , H01L27/108
CPC分类号: H01L29/516 , G11C14/0027 , H01L21/28291 , H01L27/10823 , H01L27/10876 , H01L27/11585 , H01L27/1159 , H01L29/0847 , H01L29/1037 , H01L29/408 , H01L29/4236 , H01L29/42364 , H01L29/42368 , H01L29/511 , H01L29/513 , H01L29/518 , H01L29/6684 , H01L29/7827 , H01L29/78391 , H01L29/784 , H01L45/1206 , H01L45/1233 , H01L45/14
摘要: Some embodiments include a semiconductor construction having a gate extending into a semiconductor base. Conductively-doped source and drain regions are within the base adjacent the gate. A gate dielectric has a first segment between the source region and the gate, a second segment between the drain region and the gate, and a third segment between the first and second segments. At least a portion of the gate dielectric comprises ferroelectric material. In some embodiments the ferroelectric material is within each of the first, second and third segments. In some embodiments, the ferroelectric material is within the first segment or the third segment. In some embodiments, a transistor has a gate, a source region and a drain region; and has a channel region between the source and drain regions. The transistor has a gate dielectric which contains ferroelectric material between the source region and the gate.
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公开(公告)号:US09590066B2
公开(公告)日:2017-03-07
申请号:US14991792
申请日:2016-01-08
IPC分类号: H01L29/51 , H01L29/423 , H01L27/108 , H01L27/115 , H01L31/062 , H01L29/78 , H01L21/28 , H01L45/00 , H01L29/66 , G11C14/00 , H01L29/08
CPC分类号: H01L29/516 , G11C14/0027 , H01L21/28291 , H01L27/10823 , H01L27/10876 , H01L27/11585 , H01L27/1159 , H01L29/0847 , H01L29/1037 , H01L29/408 , H01L29/4236 , H01L29/42364 , H01L29/42368 , H01L29/511 , H01L29/513 , H01L29/518 , H01L29/6684 , H01L29/7827 , H01L29/78391 , H01L29/784 , H01L45/1206 , H01L45/1233 , H01L45/14
摘要: Some embodiments include a semiconductor construction having a gate extending into a semiconductor base. Conductively-doped source and drain regions are within the base adjacent the gate. A gate dielectric has a first segment between the source region and the gate, a second segment between the drain region and the gate, and a third segment between the first and second segments. At least a portion of the gate dielectric comprises ferroelectric material. In some embodiments the ferroelectric material is within each of the first, second and third segments. In some embodiments, the ferroelectric material is within the first segment or the third segment. In some embodiments, a transistor has a gate, a source region and a drain region; and has a channel region between the source and drain regions. The transistor has a gate dielectric which contains ferroelectric material between the source region and the gate.
摘要翻译: 一些实施例包括具有延伸到半导体基底中的栅极的半导体结构。 导电掺杂的源极和漏极区域在与栅极相邻的基极内。 栅极电介质在源极区域和栅极之间具有第一区段,在漏极区域和栅极之间的第二区段以及第一和第二区段之间的第三区段。 栅电介质的至少一部分包括铁电材料。 在一些实施例中,铁电材料在第一,第二和第三段内。 在一些实施例中,铁电材料在第一段或第三段内。 在一些实施例中,晶体管具有栅极,源极区和漏极区; 并且在源区和漏区之间具有沟道区。 晶体管具有在源极区域和栅极之间包含铁电材料的栅极电介质。
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公开(公告)号:US09263672B2
公开(公告)日:2016-02-16
申请号:US14331026
申请日:2014-07-14
IPC分类号: H01L27/115 , H01L45/00 , H01L29/78 , H01L29/423 , H01L21/28 , H01L27/108
CPC分类号: H01L29/516 , G11C14/0027 , H01L21/28291 , H01L27/10823 , H01L27/10876 , H01L27/11585 , H01L27/1159 , H01L29/0847 , H01L29/1037 , H01L29/408 , H01L29/4236 , H01L29/42364 , H01L29/42368 , H01L29/511 , H01L29/513 , H01L29/518 , H01L29/6684 , H01L29/7827 , H01L29/78391 , H01L29/784 , H01L45/1206 , H01L45/1233 , H01L45/14
摘要: Some embodiments include a semiconductor construction having a gate extending into a semiconductor base. Conductively-doped source and drain regions are within the base adjacent the gate. A gate dielectric has a first segment between the source region and the gate, a second segment between the drain region and the gate, and a third segment between the first and second segments. At least a portion of the gate dielectric comprises ferroelectric material. In some embodiments the ferroelectric material is within each of the first, second and third segments. In some embodiments, the ferroelectric material is within the first segment or the third segment. In some embodiments, a transistor has a gate, a source region and a drain region; and has a channel region between the source and drain regions. The transistor has a gate dielectric which contains ferroelectric material between the source region and the gate.
摘要翻译: 一些实施例包括具有延伸到半导体基底中的栅极的半导体结构。 导电掺杂的源极和漏极区域在与栅极相邻的基极内。 栅极电介质在源极区域和栅极之间具有第一区段,在漏极区域和栅极之间的第二区段以及第一和第二区段之间的第三区段。 栅电介质的至少一部分包括铁电材料。 在一些实施例中,铁电材料在第一,第二和第三段内。 在一些实施例中,铁电材料在第一段或第三段内。 在一些实施例中,晶体管具有栅极,源极区和漏极区; 并且在源区和漏区之间具有沟道区。 晶体管具有在源极区域和栅极之间包含铁电材料的栅极电介质。
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公开(公告)号:US20150212871A1
公开(公告)日:2015-07-30
申请号:US14681471
申请日:2015-04-08
发明人: Wayne Kinney , Gurtej S. Sandhu
CPC分类号: G06F11/0751 , G06F11/0727 , G11C11/16 , G11C11/1673 , G11C11/1677 , G11C29/021 , G11C2029/0411
摘要: This disclosure relates to selectively performing a read with increased accuracy, such as a self-reference read, from a memory. In one aspect, data is read from memory cells, such as magnetoresistive random access memory (MRAM) cells, of a memory array. In response to detecting a condition associated with reading from the memory cells, a self-reference read can be performed from at least one of the memory cells. For instance, the condition can indicate that data read from the memory cells is uncorrectable via decoding of error correction codes (ECC). Selectively performing self-reference reads can reduce power consumption and/or latency associated with reading from the memory compared to always performing self-reference reads.
摘要翻译: 本公开涉及从存储器中以增加的准确性(例如自引用读取)来选择性地执行读取。 在一个方面,从存储器阵列的诸如磁阻随机存取存储器(MRAM)单元的存储器单元读取数据。 响应于检测与从存储器单元的读取相关联的条件,可以从至少一个存储器单元执行自参考读取。 例如,条件可以指示通过纠错码(ECC)的解码,从存储器单元读取的数据是不可校正的。 与始终执行自参考读取相比,选择性执行自参考读取可以降低与从存储器读取相关联的功耗和/或延迟。
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公开(公告)号:US11037942B2
公开(公告)日:2021-06-15
申请号:US16743088
申请日:2020-01-15
IPC分类号: H01L27/115 , H01L27/11507 , H01L49/02 , H01L27/11514 , G11C11/21 , G11C11/24
摘要: A memory cell includes a first electrode and a second electrode. A select device and a programmable device are in series with each other between the first and second electrodes. The select device is proximate and electrically coupled to the first electrode. The programmable device is proximate and electrically coupled to the second electrode. The programmable device includes a radially inner electrode having radially outer sidewalls. Ferroelectric material is radially outward of the outer sidewalls of the inner electrode. A radially outer electrode is radially outward of the ferroelectric material. One of the outer electrode or the inner electrode is electrically coupled to the select device. The other of the outer electrode and the inner electrode is electrically coupled to the second electrode. Arrays of memory cells are disclosed.
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