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    Monitoring apparatus and method particularly useful in photolithographically processing substrates
    7.
    发明授权
    Monitoring apparatus and method particularly useful in photolithographically processing substrates 有权
    监控设备和方法特别适用于光刻处理基板

    公开(公告)号：US08482715B2

    公开(公告)日：2013-07-09

    申请号：US12911371

    申请日：2010-10-25

    申请人： Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

    发明人： Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

    IPC分类号： G03B27/32 ,  G01B11/00 ,  G01N21/00

    CPC分类号： G03F7/70058 ,  G01B11/14 ,  G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8867 ,  G03F7/3028 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70675 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67155

    摘要： A system for determining at least two properties of a substrate, including a supporting plate configured to support the substrate, and a measurement device coupled to the supporting plate, including an illumination system configured to direct light toward a surface of the substrate, and a detection system coupled to the illumination system and configured to detect light propagating from the surface of the substrate, wherein the measurement device is configured to generate one or more output signals in response to the detected light, and a control unit coupled to the measurement device and configured to determine a first property and a second property of the substrate from the one or more output signals, wherein the first property comprises a presence of macro defects on the substrate, and wherein the second property comprises overlay misregistration in the substrate.

    摘要翻译： 一种用于确定衬底的至少两个性质的系统，包括被配置为支撑衬底的支撑板以及耦合到支撑板的测量装置，包括被配置为将光引向衬底的表面的照明系统，以及检测 耦合到所述照明系统并被配置为检测从所述衬底的表面传播的光，其中所述测量装置被配置为响应于所检测到的光而产生一个或多个输出信号，以及控制单元，耦合到所述测量装置并且被配置 以从所述一个或多个输出信号确定所述衬底的第一特性和第二特性，其中所述第一特性包括所述衬底上的宏观缺陷的存在，并且其中所述第二特性包括在所述衬底中的重叠错位。

    Monitoring apparatus and method particularly useful in photolithographically processing substrates
    9.
    发明授权
    Monitoring apparatus and method particularly useful in photolithographically processing substrates 有权
    监控设备和方法特别适用于光刻处理基板

    公开(公告)号：US06166801A

    公开(公告)日：2000-12-26

    申请号：US184727

    申请日：1998-11-02

    申请人： Giora Dishon ,  Moshe Finarov ,  Yoel Cohen ,  Zvi Nirel

    发明人： Giora Dishon ,  Moshe Finarov ,  Yoel Cohen ,  Zvi Nirel

    IPC分类号： G03F7/20 ,  G03B27/32 ,  G01B9/02 ,  H01L21/66

    CPC分类号： G03F7/70633 ,  G03F7/70675 ,  G03F7/7075 ,  Y10S414/135

    摘要： Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

    摘要翻译： 用于根据预定的光刻工艺处理衬底的设备包括其中装载衬底的装载站，其中衬底涂覆有光致抗蚀剂材料的涂覆站，其中光致抗蚀剂涂层通过掩模暴露于光的曝光站 具有预定图案以在光致抗蚀剂涂层上产生掩模的潜像，其中潜像显影的显影站，卸载基板的卸载站和用于相对于预定参数监测基板的监控站 的光刻工艺。