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公开(公告)号：US5639308A
公开(公告)日：1997-06-17
申请号：US552673
申请日：1995-11-03
IPC分类号： C23F4/00 , C23F4/02 , H01J27/18 , H01J37/32 , H01L21/203 , H01L21/205 , H01L21/302 , H01L21/3065 , H05H1/24 , C23C16/48 , C23F1/02 , H01J27/20 , H05H1/16
CPC分类号： H01J27/18 , H01J37/3233 , H01J37/32623 , H01J37/3266 , H05H1/24
摘要： A plasma apparatus generates plasma by introducing electron beams into a processing chamber filled with a reactive gas for irradiation of the reactive gas with the introduced electron beams, to process a substance by the generated plasma. The plasma apparatus has a sample base for mounting the substance to be processed so that a processing surface of the substance is not directed in a direction perpendicular to a travel direction of the electron beams introduced into the processing chamber; a suppressing section for suppressing divergence of the electron beams introduced into the processing chamber; and a control section for controlling current density distribution of the divergence-suppressed electron beams so that current density distribution of ions contained in the plasma can be uniformalized on the substance to be processed.
摘要翻译： 等离子体装置通过将电子束引入填充有用于用引入的电子束照射反应性气体的反应气体的处理室来产生等离子体，以通过产生的等离子体处理物质。 等离子体装置具有用于安装待处理物质的样品基底，使得物质的处理表面不指向与引入处理室的电子束的行进方向垂直的方向; 用于抑制引入到处理室中的电子束的发散的抑制部分; 以及用于控制发散抑制电子束的电流密度分布的控制部分，使得包含在等离子体中的离子的电流密度分布能够对被处理物质均匀化。
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公开(公告)号：US5548183A
公开(公告)日：1996-08-20
申请号：US364747
申请日：1994-12-27
IPC分类号： H01J37/143 , H01J37/06 , H01J37/065 , H01J37/073 , H01J37/18 , H01J41/12 , H01J41/18 , H01J3/20
CPC分类号： H01J37/065 , H01J37/18 , H01J41/18
摘要： In a magnetic field immersion type electron gun for controlling an electron beam emitted by an electron gun (51) with the use of an electric lens (56) and a magnetic field lens formed by permanent magnets (57, 58) of a coaxial ion pump (53), the ion pump magnets are a pair of cylindrical permanent magnets (57, 58) disposed coaxially with an optical axis (52) of the electron gun (51) in such a way as to sandwich a cylindrical ion pump anode (61) of the coaxial ion pump; the two permanent magnets are magnetized in a mutually opposing direction; a hollow cylindrical yoke (60) is disposed also coaxially with the optical axis (52) in such a way as to enclose the two permanent magnets (57, 58) within a hollow portion thereof; and the yoke (60) is formed with an annular yoke gap (63) in a radially inner circumferential surface of the yoke (60) to leak out a magnetic flux flowing through the yoke toward the optical axis. In the above-mentioned construction, the magnetic field lens can be formed efficiently with the use of the magnetic field generated by the permanent magnets for constituting the coaxial ion pump, and further the formed magnetic field lens can be superimposed upon the electron gun. Therefore, an electric field immersion type electron gun of high performance can be obtained, and further the electron gun chamber can be efficiently evacuated in the vicinity of the cathode tip of the electron gun.
摘要翻译： 在使用电镜（56）和同轴离子泵的永磁体（57,58）形成的磁场透镜的电磁枪（51）发射的电子束的磁场浸渍型电子枪中， （53）中，离子泵磁体是与电子枪（51）的光轴（52）同轴配置的一对筒状的永久磁铁（57,58），夹着圆筒状离子泵阳极 ）的同轴离子泵; 两个永磁体在相互相反的方向被磁化; 中空圆柱形磁轭（60）还与光轴（52）同轴设置，以便将两个永磁体（57,58）包围在其中空部分内; 并且轭（60）在轭（60）的径向内周面上形成有环形磁轭间隙（63），以使流过磁轭的磁通向光轴泄漏。 在上述结构中，可以通过使用由用于构成同轴离子泵的永久磁铁产生的磁场来有效地形成磁场透镜，并且还可以将形成的磁场透镜叠加在电子枪上。 因此，可以获得高性能的电场浸没型电子枪，并且可以在电子枪的阴极尖端附近有效地排出电子枪室。
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公开(公告)号：US5535508A
公开(公告)日：1996-07-16
申请号：US457836
申请日：1995-06-01
CPC分类号： H01J37/12 , H01J2237/1207 , Y10T29/49117
摘要： An electrostatic lens produces a smooth potential distribution along the center axis and is reduced in lens size and in total shape.A metal layer 13 is deposited at a certain position on an inner surface of insulating cylinder 11, and a high-resistance layer 12 is deposited on a portion except for the metal layer 13 on the inner surface of cylinder 11. A negative potential is applied from an external power source 19 to the metal layer 13, and the high-resistance layer 12 is earthed.
摘要翻译： 静电透镜沿着中心轴产生平滑的电势分布，并减小透镜尺寸和总体形状。 金属层13沉积在绝缘圆筒11的内表面的特定位置，高电阻层12沉积在气缸11的内表面上除了金属层13之外的部分上。施加负电位 从外部电源19到金属层13，高电阻层12接地。
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公开(公告)号：US5444256A
公开(公告)日：1995-08-22
申请号：US168160
申请日：1993-12-17
CPC分类号： H01J37/12 , H01J2237/1207 , Y10T29/49117
摘要： An electrostatic lens produces a smooth potential distribution along the center axis and is reduced in lens size and in total shape. A metal layer 13 is deposited at a certain position on an inner surface of insulating cylinder 11, and a high-resistance layer 12 is deposited on a portion except for the metal layer 13 on the inner surface of cylinder 11. A negative potential is applied from an external power source 19 to the metal layer 13, and the high-resistance layer 12 is earthed.
摘要翻译： 静电透镜沿着中心轴产生平滑的电势分布，并减小透镜尺寸和总体形状。 金属层13沉积在绝缘圆筒11的内表面的特定位置，高电阻层12沉积在气缸11的内表面上除了金属层13之外的部分上。施加负电位 从外部电源19到金属层13，高电阻层12接地。
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5.发明申请Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device 有权基板检查装置，基板检查方法及制造半导体装置的方法公开(公告)号：US20050029451A1
公开(公告)日：2005-02-10
申请号：US10853678
申请日：2004-05-26
CPC分类号： H01J37/28 , H01J2237/2817
摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.
摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。
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公开(公告)号：US06525328B1
公开(公告)日：2003-02-25
申请号：US09624355
申请日：2000-07-24
IPC分类号： H01J3730
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： An electron beam lithography system 10 comprises an electron gun including a rectangular cathode 1 having an emission surface having an aspect ratio of other than 1, an illumination optical system 3 of an asymmetric lens system including multipole lenses Qa1 and Qa2, a CP aperture 5, and a projection optical system 8 of a symmetric lens system including multipole lenses Qb1 through Qb4. This electron beam lithography system 10 is used for emitting an electron beam at a low acceleration of 5 kV or less from the rectangular cathode 1, for controlling the illumination optical system so as to form an image of a desired character of the CP aperture 5 on an isotropic plane of incidence at different demagnifications in minor-axis and major-axis directions in accordance with the aspect ratio of the rectangular cathode 1, and for controlling the projection optical system 8 so that the electron beam leaving the CP aperture 5 as an aperture image is incident on a substrate 21 at the same demagnification in the minor-axis and major-axis directions and at different incident angles in the minor-axis and major-axis directions while passing through the trajectory without establishing any crossovers.
摘要翻译： 电子束光刻系统10包括电子枪，其包括具有不同于1的纵横比的发射表面的矩形阴极1，包括多极透镜Qa1和Qa2的非对称透镜系统的照明光学系统3，CP孔5， 以及包括多极透镜Qb1至Qb4的对称透镜系统的投影光学系统8。 该电子束光刻系统10用于从矩形阴极1以5kV以下的低加速度发射电子束，用于控制照明光学系统，以便形成CP孔5的所需字符的图像 根据矩形阴极1的纵横比在短轴和长轴方向上的不同缩小的各向同性平面，并且用于控制投影光学系统8，使得离开CP孔5的电子束作为孔 图像在短轴和长轴方向上以相同的缩小入射在基板21上，并且在短轴和长轴方向上以不同的入射角同时穿过轨迹而不建立任何交叉。
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7.发明授权Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens 失效能够减少静电透镜像差的磁性浸没场发射电子枪系统
公开(公告)号：US5371371A
公开(公告)日：1994-12-06
申请号：US112802
申请日：1993-08-27
IPC分类号： H01J37/073 , H01J37/10 , H01J37/145 , H01J37/15
CPC分类号： H01J37/073 , H01J2237/06316
摘要： A magnetic immersion field emission electron gun has a vacuum vessel having a central axis in a predetermined direction, a cathode arranged along the central axis of the vacuum vessel for generating an electron beam, an anode for forming an electron beam path by accelerating a generated electron beam in the central axis direction, an electrostatic lens arranged between the cathode and anode for generating an electric field which focuses an accelerated electron beam toward the central axis, a magnetic field generating element arranged around the electron beam path for generating a magnetic field for focusing the electron beam in order to preventing a diameter of the electron beam from expansion by an aberration of the electrostatic lens, and a moving mechanism for moving the magnetic field generating element at a position where a peak point of a strength of the magnetic field generated by the magnetic field generating element coincides with a portion where the aberration of the electrostatic lens becomes most conspicuous. The electron gun having such a configuration can provide an effect of reducing a spherical and chromatic aberration by efficiently providing a lens characteristic to the electrostatic lens even though the entire length of electrostatic lens is long.
摘要翻译： 磁浸式场致发射电子枪具有沿预定方向具有中心轴的真空容器，沿着真空容器的中心轴布置的用于产生电子束的阴极，用于通过加速产生的电子形成电子束路径的阳极 在中心轴方向上形成光束，静电透镜，其布置在阴极和阳极之间，用于产生将加速电子束朝向中心轴聚焦的电场;围绕电子束路径设置的磁场产生元件，用于产生用于聚焦的磁场 电子束，以防止电子束的直径由于静电透镜的像差而膨胀;以及移动机构，用于使磁场产生元件移动到由磁场产生元件产生的磁场的强度的峰值点 磁场产生元件与电极的像差部分重合 tatic镜头变得最显眼。 具有这种结构的电子枪即使静电透镜的整个长度都很长，也可以通过有效地向静电透镜提供透镜特性来提供减小球面和色差的效果。
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8.发明授权Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device 有权基板检查装置，基板检查方法及制造半导体装置的方法公开(公告)号：US07847250B2
公开(公告)日：2010-12-07
申请号：US12289846
申请日：2008-11-05
IPC分类号： H01J37/244 , H01J37/26
CPC分类号： H01J37/28 , H01J2237/2817
摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.
摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。
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公开(公告)号：US06495841B1
公开(公告)日：2002-12-17
申请号：US09299145
申请日：1999-04-26
申请人： Atsushi Ando , Shunko Magoshi , Kazuyoshi Sugihara , Yuichiro Yamazaki , Motosuke Miyoshi , Katsuya Okumura , Kiyoshi Hattori
发明人： Atsushi Ando , Shunko Magoshi , Kazuyoshi Sugihara , Yuichiro Yamazaki , Motosuke Miyoshi , Katsuya Okumura , Kiyoshi Hattori
IPC分类号： H01J37317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/023 , H01J37/3174
摘要： In an electron beam drawing apparatus including an objective lens for focusing an electron beam emitted from an electron gun on a sample surface and an objective deflector for controlling the position of the electron beam on the sample surface, an objective driving mechanism for mechanically moving the objective lens and objective deflector in a plane perpendicular to the optical axis of the electron beam is provided and an optical axis shifting deflector arranged nearer to the electron gun than the objective lens and objective deflector, for deflecting the electron beam in synchronism with the operation of the objective lens and objective deflector is provided.
摘要翻译： 在包括用于将从电子枪发射的电子束聚焦在样品表面上的物镜和用于控制电子束在样品表面上的位置的物镜偏转器的电子束描绘装置中，用于机械地移动物镜的物镜驱动机构 提供了与电子束的光轴垂直的平面中的透镜和物镜偏转器，并且与物镜和物镜偏转器相比更靠近电子枪布置的光轴移动偏转器，用于与电子束的操作同步地偏转 提供物镜和物镜偏转器。
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公开(公告)号：US5576833A
公开(公告)日：1996-11-19
申请号：US402486
申请日：1995-03-10
IPC分类号： H01J37/22 , G01N23/225 , H01J37/04 , H01J37/06 , H01J37/09 , H01J37/12 , H01J37/244 , H01J37/28 , H01L21/66 , G01B11/00
CPC分类号： G01N23/2251 , H01J2237/2446
摘要： A scanning electron beam is formed as a rectangular electron beam. The electro-optical system which forms this rectangular beam has a rectangular-cathode light source and a quadrupole lens system. This rectangular beam is scanned in its short-axis (X-axis) direction by a deflection system while a stage is moved in its long-axis (Y-axis) direction to achieve scanning of the surface of the wafer under inspection. The rectangular beam corresponds to a number of circular beams arranged in a row. Therefore, pixel signals corresponding to a number of pixels equal to the aspect ratio of the rectangular beam (ratio of the length in the long-axis direction to the length in the short-axis direction) are simultaneously output.
摘要翻译： 扫描电子束形成为矩形电子束。 形成该矩形光束的电光系统具有矩形阴极光源和四极透镜系统。 这个矩形光束是通过偏转系统在其短轴（X轴）方向扫描的，同时一个台沿其长轴（Y轴）方向移动，以实现在检查晶片的表面的扫描。 矩形梁对应于排列成一排的多个圆形梁。 因此，同时输出与矩形光束的长宽比（长轴方向的长度与短轴方向的长度的比）相等的像素数的像素信号。
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