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    POLISHING LIQUID FOR CMP AND POLISHING METHOD
    3.
    发明申请
    POLISHING LIQUID FOR CMP AND POLISHING METHOD 审中-公开
    抛光液用于CMP和抛光方法

    公开(公告)号：US20110027997A1

    公开(公告)日：2011-02-03

    申请号：US12937463

    申请日：2009-04-16

    申请人： Takashi Shinoda ,  Takaaki Tanaka ,  Mamiko Kanamaru ,  Jin Amanokura

    发明人： Takashi Shinoda ,  Takaaki Tanaka ,  Mamiko Kanamaru ,  Jin Amanokura

    IPC分类号： H01L21/302 ,  C09K3/14

    CPC分类号： C09K3/1463 ,  B24B37/044 ,  C09G1/02 ,  H01L21/31053 ,  H01L21/3212

    摘要： The present invention can provide a polishing liquid for CMP having good dispersion stability and a high polishing rate in polishing of interlayer insulating films and a polishing method. Disclosed a polishing liquid for CMP comprising: a medium; and colloidal silica particles dispersed in the medium, a blending amount of the colloidal silica particles being 2.0 to 8.0% by mass relative to 100% by mass of the polishing liquid, wherein the colloidal silica particles satisfy the following conditions (1) to (3): (1) a two-axis average primary particle diameter (R1) obtained from images of twenty arbitrarily selected colloidal silica particles observed by a scanning electron microscope is within the range of 35 to 55 nm; (2) a value S1/S0 obtained by dividing a specific surface area (S1) of a colloidal silica particle measured by BET method by a calculated specific surface area (S0) of a true sphere having the same particle diameter as the two-axis average primary particle diameter (R1) determined by (1) above is 1.20 or less; and (3) a ratio, association degree: RS/R1, of a secondary particle diameter (RS) of the colloidal silica particles measured with a dynamic light scattering particle size distribution analyzer and the two-axis average primary particle diameter (R1) determined by (1) above in the polishing liquid for CMP is 1.30 or less.

    摘要翻译： 本发明可以提供一种用于CMP的抛光液，其具有在层间绝缘膜的研磨中具有良好的分散稳定性和高抛光速率以及抛光方法。 公开了一种用于CMP的抛光液，包括：介质; 和分散在该介质中的胶体二氧化硅粒子，相对于100质量％的研磨液，胶体二氧化硅粒子的配合量为2.0〜8.0质量％，其中胶态二氧化硅粒子满足下述条件（1）〜（3） ）：（1）通过扫描电子显微镜观察到的20个任意选择的胶体二氧化硅粒子的图像得到的2轴平均一次粒径（R1）在35〜55nm的范围内， （2）将通过BET法测定的胶体二氧化硅粒子的比表面积（S1）除以与两轴相同粒径的真球的计算比表面积（S0）得到的值S1 / S0 由（1）确定的平均一次粒径（R1）为1.20以下; 和（3）用动态光散射粒度分布分析仪测定的胶体二氧化硅粒子的二次粒径（RS）与双轴平均一次粒径（R1）的比例，相关度：RS / R1 在CMP抛光液中的（1）以上为1.30以下。

    CMP Polishing Liquid and Polishing Method
    7.
    发明申请
    CMP Polishing Liquid and Polishing Method 审中-公开
    CMP抛光液和抛光方法

    公开(公告)号：US20090094901A1

    公开(公告)日：2009-04-16

    申请号：US12298342

    申请日：2007-04-24

    申请人： Takashi Shinoda ,  Shigeru Nobe ,  Takaaki Tanaka

    发明人： Takashi Shinoda ,  Shigeru Nobe ,  Takaaki Tanaka

    IPC分类号： B24B37/00 ,  H01L21/304 ,  H01L21/306 ,  C09K3/14

    CPC分类号： H01L21/7684 ,  B24B37/044 ,  C09G1/02 ,  H01L21/3212

    摘要： A CMP polishing liquid being capable of using in a chemical mechanical polishing comprising of: a first chemical mechanical polishing step of polishing a conductive substance layer of a substrate having an interlayer insulation film containing convex and concave regions on a surface thereof, a barrier layer coating along the surface of the interlayer insulation film, and the conductive substance layer coating the barrier layer while filling the concave regions, and thus exposing the barrier layer in the convex regions; and a second chemical mechanical polishing step of exposing the interlayer insulation film in the convex regions by polishing the barrier layer exposed in the first chemical mechanical polishing step; characterized in that a difference (B)−(A) is 650 {acute over (Å)} or less, wherein the (A) is a polishing amount of the interlayer insulation film in a field area when the interlayer insulation film in the field area having a width of 1,000 μm or more of the interlayer insulation film region formed on the substrate is polished to a depth of 400 {acute over (Å)} or more; and the (B) is a polishing amount of the interlayer insulation film in a stripe-shaped patterned area having a total width of 1,000 μm or more wherein a wiring metal region having a width of 90 μm and the interlayer insulation film region having a width of 10 μm are aligned alternately on the substrate when the interlayer insulation film in the field area having the width of 1,000 μm or more of the interlayer insulation film region formed on the substrate is polished to a depth of 400 {acute over (Å)} or more.

    摘要翻译： 一种能够在化学机械抛光中使用的CMP抛光液，包括：第一化学机械抛光步骤，其在其表面上抛光具有包含凸凹区域的层间绝缘膜的基板的导电物质层，阻挡层涂层 沿着所述层间绝缘膜的表面，并且所述导电物质层在填充所述凹区域的同时涂覆所述阻挡层，从而使所述阻挡层暴露在所述凸部区域中。 以及第二化学机械抛光步骤，通过对在所述第一化学机械抛光步骤中暴露的所述阻挡层进行抛光来使所述凸起区域中的所述层间绝缘膜曝光; 其特征在于，差异（B） - （A）为650（锐锐度（））以下，其中，（A）是场内层间绝缘膜的场区域中的层间绝缘膜的研磨量 将形成在基板上的层间绝缘膜区域的宽度为1,000μm以上的区域抛光至深度为400（）以上的深度; （B）是总宽度为1000μm以上的条状图案区域中的层间绝缘膜的研磨量，其中宽度为90μm的布线金属区域和宽度为90μm的层间绝缘膜区域 当在衬底上形成的层间绝缘膜区域的宽度为1,000μm或更大的场区域中的层间绝缘膜被抛光到深度为400（）时，交替地在衬底上对准10微米。 或者更多。

    Starter driving semiconductor switch apparatus
    8.
    发明授权
    Starter driving semiconductor switch apparatus 有权
    起动器驱动半导体开关装置

    公开(公告)号：US08829710B2

    公开(公告)日：2014-09-09

    申请号：US12962390

    申请日：2010-12-07

    申请人： Yasuhiro Takahashi ,  Takaaki Tanaka ,  Toru Kubo ,  Toshiaki Hata ,  Hideki Umemoto

    发明人： Yasuhiro Takahashi ,  Takaaki Tanaka ,  Toru Kubo ,  Toshiaki Hata ,  Hideki Umemoto

    IPC分类号： B60R22/00 ,  F02P9/00 ,  H02G3/00 ,  F02N11/08 ,  F02N11/10

    CPC分类号： F02N11/0825 ,  F02N11/0818 ,  F02N11/087 ,  F02N11/10 ,  Y02T10/48

    摘要： A starter driving semiconductor switch apparatus energizes and de-energizes a starter according to a command from an outside. A series circuit to which semiconductor switches are connected in series is provided between a battery serving as a power supply and the starter. The starter is energized by bringing all the semiconductor switches into conduction. A voltage or a current at a predetermined point in the series circuit is monitored to make a self-diagnosis on whether the starter is allowed to start and whether there is a failure in the semiconductor switches according to a monitor output. The starter driving semiconductor switch apparatus is thus expected to have a longer useful life by energizing the starter not by using mechanical contacts but by using semiconductor switches.

    摘要翻译： 启动器驱动半导体开关装置根据来自外部的指令使启动器通电和断电。 在用作电源的电池和起动器之间提供串联连接有半导体开关的串联电路。 通过使所有的半导体开关导通来启动启动器。 监视串联电路中的预定点处的电压或电流，以便根据监视器输出是否启动起动器以及半导体开关是否发生故障进行自我诊断。 因此，启动器驱动半导体开关装置通过使用机械触点而不是通过使用半导体开关来激励起动器而具有更长的使用寿命。

    Projection-type display apparatus
    9.
    发明授权
    Projection-type display apparatus 有权
    投影型显示装置

    公开(公告)号：US08130331B2

    公开(公告)日：2012-03-06

    申请号：US12821374

    申请日：2010-06-23

    申请人： Takaaki Tanaka

    发明人： Takaaki Tanaka

    IPC分类号： G02F1/1335

    CPC分类号： G03B21/006 ,  G02B27/26 ,  G02B27/283 ,  H04N13/324 ,  H04N13/337 ,  H04N13/363

    摘要： Provided are an illumination optical system allowing light beams to be condensed and enter an illumination area at different angles from each other, color separating elements that separate colors of the light beams from the illumination optical systems, liquid crystal light valves that modulate the color lights to form image light for the right and the left eyes, a color combining element that combines the color light beams, a wavelength-selective polarization rotating element that rotates the polarization direction of a predetermined color light so as to align the polarization direction with that of a light beam of another color, and a projection lens that magnifies and projects images. The liquid crystal light valves are provided with an incident side microlens array that causes the light beams for the right and the left eyes to pass respectively through the right and the left eye image pixels, and an exit side microlens array that condenses the light that has passed through the pixels. The projection lens is provided with a polarized light separating element that causes the polarization directions of image light for the right and the left eyes to be orthogonal to each other. Using one projection-type display apparatus, a highly efficient stereoscopic image can be displayed with little flicker and cross talk of image light for the right eye and for the left eye.

    摘要翻译： 提供了一种照明光学系统，其允许光束被聚光并且以彼此不同的角度进入照明区域，将来自照明光学系统的光束的颜色分离的分色元件，将颜色调制的液晶光阀 形成用于右眼和左眼的图像光，组合彩色光束的颜色组合元件，使预定颜色光的偏振方向旋转的波长选择性偏振旋转元件，以使偏振方向与 另一种颜色的光束，以及放大和投影图像的投影透镜。 液晶光阀设有入射侧微透镜阵列，其使右眼和左眼的光束分别通过右眼图像像素和左眼图像像素，以及出射侧微透镜阵列，其使具有 通过像素。 投影透镜设置有使得右眼和左眼的图像光的偏振方向彼此正交的偏振光分离元件。 使用一个投影型显示装置，可以以少许的右眼和左眼的图像光的闪烁和串扰来显示高效的立体图像。

    STEREOSCOPIC VISION GLASSES AND STEREOSCOPIC VISION ELECTRONIC APPARATUS
    10.
    发明申请
    STEREOSCOPIC VISION GLASSES AND STEREOSCOPIC VISION ELECTRONIC APPARATUS 审中-公开
    立体视觉眼镜和立体视觉电子装置

    公开(公告)号：US20120033184A1

    公开(公告)日：2012-02-09

    申请号：US13197682

    申请日：2011-08-03

    申请人： Takaaki Tanaka ,  Akihiko Ito

    发明人： Takaaki Tanaka ,  Akihiko Ito

    IPC分类号： G02B27/26 ,  G03B21/14

    CPC分类号： G03B35/16 ,  G02B27/26 ,  H04N13/324 ,  H04N13/337 ,  H04N13/341 ,  H04N2213/008

    摘要： Stereoscopic vision glasses include a right-eye shutter and a left-eye shutter axisymmetric to each other with respect to a symmetric axis. Each of the right-eye shutter and the left-eye shutter includes an incident side polarization plate, an exit side polarization plate, and liquid crystal interposed therebetween. Each of the right-eye shutter and the left-eye shutter is opened or closed in accordance with an application voltage of the liquid crystal. The polarization axis of the incident side polarization plate of each of the right-eye shutter and the left-eye shutter is inclined with respect to the symmetric axis. A stereoscopic vision electronic apparatus includes a projection type display device displaying a right-eye image and a left-eye image in a time division manner by projecting first projected light and second projected light of which directions of polarization axes are different from each other; and the stereoscopic vision glasses.

    摘要翻译： 立体视觉眼镜包括相对于对称轴彼此对称的右眼快门和左眼快门。 右眼快门和左眼快门中的每一个包括插入侧偏振板，出射侧偏振板和液晶。 根据液晶的施加电压，右眼快门和左眼快门中的每一个都被打开或关闭。 每个右眼快门和左眼快门的入射侧偏振板的偏振轴相对于对称轴倾斜。 立体视觉电子设备包括通过投影第一投影光和偏振轴方向彼此不同的第二投影光以时分方式显示右眼图像和左眼图像的投影型显示装置; 和立体视觉眼镜。