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公开(公告)号：US06508695B2
公开(公告)日：2003-01-21
申请号：US09817206
申请日：2001-03-27
申请人： Mutsumi Tanikawa , Mitsunori Komatsu , Kiyotaka Kawashima , Hiroshi Shimomoto , Katsuya Okumura
发明人： Mutsumi Tanikawa , Mitsunori Komatsu , Kiyotaka Kawashima , Hiroshi Shimomoto , Katsuya Okumura
IPC分类号： B24B100
摘要： A pure water reusing system recovers water discharged from apparatuses in which pure water is used, and regenerates the water to produce pure water. The pure water reusing system has a recovering and regenerating apparatus for recovering water discharged from the apparatuses and regenerating the water by removing impurities from the water to produce pure water, and a regenerated pure water supply line for supplying the regenerated pure water to at least one of the apparatuses. The same process is conducted in the apparatuses in which pure water is used.
摘要翻译： 纯水再利用系统可以回收从使用纯水的设备排出的水，再生水以产生纯净水。 纯水再利用系统具有回收再生装置，用于回收从装置排出的水并通过从水中除去杂质来再生水以产生纯净水;以及再生纯水供应管线，用于将再生的纯水供给到至少一个 的装置。 在使用纯水的装置中进行相同的处理。
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公开(公告)号：US06358125B2
公开(公告)日：2002-03-19
申请号：US09724999
申请日：2000-11-29
IPC分类号： B24B719
摘要： A polishing liquid supply apparatus supplies a polishing liquid to a polishing unit. The polishing liquid supply apparatus includes a supply tank for storing a polishing liquid having a predetermined concentration, and a polishing liquid pipe for delivering the polishing liquid from the supply tank to a polishing liquid supply nozzle in the polishing unit. The polishing liquid supply apparatus further includes an additive tank for storing an additive having a predetermined concentration, and an additive supply pipe for adding the additive supplied from the additive tank to the polishing liquid stored in the supply tank or to the polishing liquid in a polishing liquid passage including the polishing liquid pipe.
摘要翻译： 研磨液供给装置将研磨液供给到研磨单元。 研磨液供给装置具备：储存预定浓度的研磨液的供给槽和将研磨液从供给槽输送到研磨单元的研磨液供给喷嘴的研磨液管。 该研磨液供给装置还具备用于储存规定浓度的添加剂的添加剂槽，以及添加剂供给管，其用于将从添加剂供给的添加剂添加到在供给槽中储存的研磨液或抛光液中的研磨液 液体通道包括抛光液管。
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公开(公告)号：US06338671B1
公开(公告)日：2002-01-15
申请号：US09533779
申请日：2000-03-24
IPC分类号： B24G900
摘要： An apparatus for supplying a polishing liquid to a polishing section is used for polishing a surface of a semiconductor substrate in the polishing section. The apparatus comprises a supply tank for storing a polishing liquid having given properties, a supply pipe for supplying the polishing liquid to the polishing section, a sensing device for detecting properties of the polishing liquid flowing through the supply pipe, and a stabilization device for maintaining properties of the polishing liquid stored in the supply tank or flowing through the supply pipe within an allowable range on the basis of an output signal from the sensing device.
摘要翻译： 用于将研磨液供给到研磨部的装置用于研磨研磨部中的半导体基板的表面。 该装置包括用于存储具有给定特性的抛光液的供应罐，用于将抛光液供给到抛光部的供应管，用于检测流过供给管的抛光液的性质的检测装置，以及用于维持 基于来自感测装置的输出信号，存储在供应罐中的抛光液的特性或者通过供给管流动在允许范围内。
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公开(公告)号：US06280300B1
公开(公告)日：2001-08-28
申请号：US09450269
申请日：1999-11-26
IPC分类号： B24C900
CPC分类号： B24B37/04 , B01D35/12 , B01D61/14 , B01D61/142 , B01D61/18 , B01D61/20 , B01D65/00 , B01D65/02 , B01D2321/164 , B24B57/02
摘要： A filter apparatus provided in a fluid pipeline for conveying a treatment fluid. A regenerating pipeline is provided adjacently to the fluid pipeline to convey a regenerating liquid. At least two filter units are switched between the fluid pipeline and the regenerating pipeline by a switching valve device. The filter apparatus enables a filter replacing operation to be carried out smoothly and reliably and is also capable of reliably trapping solid particles contained in the fluid, e.g. an abrasive liquid, continuously without the need of a filter replacing operation, thereby allowing supply of a fluid of high quality and a stable operation free from clogging.
摘要翻译： 一种设置在流体管道中用于输送处理流体的过滤装置。 与流体管道相邻设置再生管道以输送再生液体。 至少两个过滤器单元通过切换阀装置在流体管道和再生管道之间切换。 过滤装置能够平稳而可靠地进行过滤器更换操作，并且还能够可靠地捕获包含在流体中的固体颗粒，例如， 研磨液体，连续地不需要过滤器更换操作，从而允许供应高质量的流体和稳定的操作而不会堵塞。
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公开(公告)号：US5384986A
公开(公告)日：1995-01-31
申请号：US124648
申请日：1993-09-22
IPC分类号： B24B37/26 , B24B53/007 , B24B53/017 , B41J11/62
CPC分类号： B24B53/017 , B24B37/26
摘要： A turntable with an abrasive cloth mounted thereon and a top ring positioned above the turntable are independently rotatably provided. The top ring holds a workpiece to be polished and presses the workpiece against the abrasive cloth. The turntable and the top ring are rotated to polish the surface of the workpiece to a flat mirror finish on the abrasive cloth. A rotatable brush pressed against the abrasive cloth is rotated about an axis substantially perpendicularly to the plane of the abrasive cloth, and oscillated substantially radially between radially inner and outer positions over the abrasive cloth. A cleaning solution is sprayed from a nozzle onto the abrasive cloth. The turntable has a bank along an outer circumferential edge thereof for preventing a protective solution, which is supplied to the abrasive cloth to keep the abrasive cloth wet and prevent it, from flowing off the turntable when the turntable is stationary.
摘要翻译： 安装有研磨布的转盘和位于转盘上方的顶环可独立地可旋转地设置。 顶环保持要抛光的工件，并将工件压在研磨布上。 转盘和顶环旋转以将工件的表面抛光到研磨布上的平整镜面上。 压在研磨布上的可旋转刷子围绕基本上垂直于研磨布平面的轴线旋转，并且在磨料布的径向内部和外部位置之间基本径向摆动。 将清洁溶液从喷嘴喷射到研磨布上。 转台沿其外圆周边缘具有一个堤，用于防止当转台静止时供给磨料以保持磨料湿润并防止磨损的保护溶液流出转台。
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公开(公告)号：US5177137A
公开(公告)日：1993-01-05
申请号：US467117
申请日：1990-01-19
摘要： A polyphenylene sulfide resin composition comprising(1) a polyphenylene resin, and(2) at least one compound selected from the group consisting of(a) zinc carbonate,(b) manganese carbonate, and(c) zinc hydroxide.
摘要翻译： 1.一种聚苯硫醚树脂组合物，其包含（1）聚苯醚树脂，和（2）选自（a）碳酸锌，（b）碳酸锰和（c）氢氧化锌中的至少一种化合物。
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公开(公告)号：US20130207608A1
公开(公告)日：2013-08-15
申请号：US13881839
申请日：2011-12-28
申请人： Kiyotaka Kawashima
发明人： Kiyotaka Kawashima
IPC分类号： H02J7/00
CPC分类号： H02J7/0042 , B60L11/1816 , B60L11/1844 , B60L11/1846 , B60L2210/30 , B60L2210/40 , B60L2230/16 , B60L2240/547 , B60L2240/549 , B60L2240/80 , B60L2250/16 , B60L2260/52 , B60L2260/54 , B60L2260/58 , H01M10/44 , H01M2220/20 , H02J7/0047 , Y02E60/721 , Y02T10/7005 , Y02T10/7088 , Y02T10/7241 , Y02T90/121 , Y02T90/127 , Y02T90/128 , Y02T90/14 , Y02T90/16 , Y02T90/163 , Y02T90/169 , Y04S10/126 , Y04S30/14
摘要： A vehicle charging system includes: a vehicle (14) provided with a battery (13) and a charging control unit (53); an external power source (11); a charging cable (12) provided with an electric power line (12L) and a first communication control unit (33); an external power source line (11L); a second communication control unit (24); a consumed power acquiring unit (23) acquiring consumed power (PIF); a charging-allowable power calculating unit (23) calculating charging-allowable power (PEV), and transmitting unit (43) and a control unit (34) provided at the charging cable.
摘要翻译： 车辆充电系统包括：设置有电池（13）和充电控制单元（53）的车辆（14）; 外部电源（11）; 设置有电力线（12L）的充电电缆（12）和第一通信控制单元（33）; 外部电源线（11L）; 第二通信控制单元（24）; 消耗功率获取单元（23）获取消耗功率（PIF）; 计算充电容许功率（PEV）的充电容许功率计算单元（23）和设置在充电电缆上的发送单元（43）和控制单元（34）。
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公开(公告)号：US06406364B1
公开(公告)日：2002-06-18
申请号：US09355895
申请日：1999-10-25
申请人： Norio Kimura , Hirokuni Hiyama , Yutaka Wada , Kiyotaka Kawashima , Manabu Tsujimura , Takayoshi Kawamoto
发明人： Norio Kimura , Hirokuni Hiyama , Yutaka Wada , Kiyotaka Kawashima , Manabu Tsujimura , Takayoshi Kawamoto
IPC分类号： B24B5700
CPC分类号： B24B37/04 , B24B57/02 , Y10S451/91
摘要： The object of the present invention is to provide a polishing apparatus that can supply a polishing solution having a non-varying distribution of abrading particles sizes at a steady rate. An apparatus (20) for delivering a polishing solution to a polishing apparatus (22) is disclosed. The apparatus (20) comprises: a solution passage for transporting the polishing solution; and an ultrasonic vibrator (72) being provided in at least one location of the solution passage.
摘要翻译： 本发明的目的是提供一种抛光装置，其能够以稳定的速度供给研磨粒子尺寸不变的抛光液。 公开了一种用于将抛光溶液输送到抛光装置（22）的装置（20）。 装置（20）包括：用于输送抛光溶液的溶液通道; 和超声波振动器（72）设置在溶液通道的至少一个位置。
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公开(公告)号：US5584959A
公开(公告)日：1996-12-17
申请号：US291530
申请日：1994-08-16
CPC分类号： C02F1/5236 , B01D53/14 , B01D53/1456 , B01D53/50 , B01D53/58 , B24B55/03 , C02F1/52 , C02F2103/18 , Y10S438/909
摘要： A waste treatment system in a polishing apparatus treats waste gas and waste liquid discharged from the polishing apparatus. The waste treatment system comprises an exhaust duct provided in a partition wall enclosing the polishing apparatus, a scrubber connected to the exhaust duct through an exhauster for scrubbing waste gas discharged from the polishing apparatus, a waste liquid receiver provided below an abrasive cloth of the polishing apparatus for receiving waste liquid generated by a polishing operation and a waste liquid treatment apparatus connected to the waste liquid receiver for treating the waste liquid discharged from the polishing apparatus.
摘要翻译： 抛光装置中的废物处理系统处理从抛光装置排出的废气和废液。 废物处理系统包括设置在包围抛光装置的分隔壁中的排气管道，通过用于洗涤从抛光装置排出的废气的排气器连接到排气管道的洗涤器，设置在抛光装置的研磨布下方的废液接收器 用于接收由抛光操作产生的废液的设备和连接到废液接收器的废液处理设备，用于处理从抛光设备排出的废液。
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公开(公告)号：US5302651A
公开(公告)日：1994-04-12
申请号：US779789
申请日：1991-10-21
CPC分类号： C08K5/103
摘要： A polyarylenesulfide resin composition manufactured by compounding polyarylenesulfide resin with one or more ester-based compounds selected from the groups of compounds shown in the following formulas (1) and (2): ##STR1## where R.sup.1 to R.sup.4 are such that at least one of them is an alkyl or alkenyl group of 10-40 carbon atoms, the remaining Rs represent --H, --OH, alkyl, or aryl radicals, and 1.0
摘要翻译： 通过将聚芳基硫醚树脂与一种或多种选自下式（1）和（2）所示的化合物的酯基化合物混合制备的聚芳基硫醚树脂组合物：（*化学结构*）（1）其中R1至R4为 使得它们中的至少一个是10-40个碳原子的烷基或烯基，其余的R 5表示-H，-OH，烷基或芳基，并且1.0
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