摘要:
To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.
摘要:
To provide a laminate excellent in weather resistance, moisture-proof property, adhesion between layers and its long-term stability, and a process for its production. A laminate comprising a substrate sheet containing a fluororesin, an adhesive layer, and a moisture-proof layer containing, as the main component, at least one inorganic compound selected from the group consisting of an inorganic oxide, an inorganic nitride and an inorganic oxynitride, laminated in this order, wherein the adhesive layer contains, as the main component, at least one metal oxide selected from the group consisting of zirconium oxide, tantalum oxide and hafnium oxide.
摘要:
To provide an electroconductive laminate which has an excellent electrical conductivity (electromagnetic wave shielding properties) and a high visible light transmittance and is excellent in productivity, and a protective plate for a plasma display which has excellent electromagnetic wave shielding properties and a broad transmission/reflection band and is excellent in productivity.An electroconductive laminate comprising a substrate and an electroconductive film formed on the substrate, wherein the electroconductive film has laminated n lamination units (wherein n is an integer of from 1 to 6) each having a first metal oxide layer, a second metal oxide layer and a metal layer arranged in this order from the substrate side, and further has a first metal oxide layer disposed as the outermost layer of the electroconductive film; the first metal oxide layer is an oxide layer containing titanium element and an M element, wherein the M element is at least one element selected from the group consisting of elements having atomic weights of at least 80, and the amount of the M element is from 10 to 60 atom % in the total amount of titanium element and the M element in the first metal oxide layer; the second metal oxide layer is a layer having, as its main component, an oxide containing zinc element; the metal layer is a layer having silver as its main component; and the second metal oxide layer and the metal layer in the lamination unit are directly in contact with each other.
摘要:
To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo-convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity.A mold 10 for nanoimprinting having on its mold surface a fine concavo-convex structure comprising a plurality of grooves 14 formed in parallel with one another at a constant pitch, which comprises a mold base 12 made of a resin having on its surface a fine concavo-convex structure to be the base of the fine concavo-convex structure, a metal oxide layer 16 covering the surface having the fine concavo-convex structure of the mold base 12, and a release layer 18 covering the surface of the metal oxide layer 16, is used.
摘要:
A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.
摘要:
The present invention provides a substrate with antireflection films, which has excellent antireflection properties to incident light at an oblique angle from the film face side and high transmittance. Moreover, the antireflection films of the present invention provide a reflection color tone that does not tend to be bluish. This object is achieved where the substrate with antireflection films comprises a transparent substrate and at least two antireflection film layers deposited on one side of the transparent substrate as described herein.
摘要:
A CRT panel glass and a CRT wherein a surface treating film is formed on an outer surface of a CRT panel so that overall transmittance distribution and reflectance distribution within an effective picture plane satisfy specific mathematical expressions, whereby, even with a flattened panel glass, brightness and contrast are uniform over the entire surface of the image display plane, and their production method.
摘要:
Provided are a wire-grid polarizer, which has not only a high degree of polarization, a high p-polarized light transmittance and a high s-polarized light reflectance but also a low angle dependency and a low wavelength dependency in terms of optical properties in a visible light region, and a process for producing the same.A wire-grid polarizer 10 comprising a light-transmitting substrate 14 having a plurality of ridges 12 formed in parallel to one another at certain pitches Pp through respective flat portions 13 disposed between adjacent ridges 12, each of the ridges having a width gradually reduced from a base portion to a top portion thereof, and a metal layer 20 composed of metal or a metal compound, the metal layer covering the entirety of a first lateral face 16 of each ridge 12 and a part of the flat portion 13 adjacent to the first lateral face 16 such that a second lateral face 18 of each ridge 12 is covered with no metal layer or is partially covered with the metal layer; and a process for forming the metal layer 20 by vapor-depositing metal or a metal compound on the first lateral face from a direction that is substantially orthogonal to a longitudinal direction of the ridges 12 and forms an angle of from 25 to 40 degrees toward the first lateral face 16 with respect to a height direction of the ridge 12 under conditions where the metal layer is disposed at a deposition amount of from 40 to 60 nm.
摘要:
A multilayer film-coated substrate having the stress of the film relaxed by depositing a multilayer film comprising a metal oxide film and a silicon oxide film on a substrate at a high speed by a sputtering method using a conductive sputtering material, and a process for producing a multilayer film-coated substrate having such a low stress, are presented.A multilayer film-coated substrate comprising a substrate and at least a metal oxide film and a silicon oxide film laminated thereon repeatedly at least once, wherein at least one layer of said metal oxide film is a metal oxide film deposited by sputtering by using, as the target material, a metal oxide MOX which is deficient in oxygen than the stoichiometric composition, to have the oxygen deficiency resolved, and the stress of the multilayer film is from −100 MPa to +100 MPa.
摘要:
An active matrix liquid crystal display element and a projection type active matrix liquid crystal display device by which a display can be obtained which is good in color balance and high in brightness and also in contrast ratio. The display element includes a liquid crystal material held between an active matrix substrate and a counter electrode substrate. The liquid crystal material is formed from a liquid crystal polymer composite wherein nematic liquid is contained dispersively in a polymer matrix having a refractive index which coincides with the ordinary refractive index of the liquid crystal used, and a silicon thin film transistor is used as an active element on the active matrix substrate. The display device includes such an active matrix liquid crystal display element, a light source for projection light, and an optical system of projection.