公开(公告)号：US6090523A

公开(公告)日：2000-07-18

申请号：US54885

申请日：1998-04-03

申请人： Norihiko Samoto ,  Haruo Iwasaki ,  Atsushi Nishizawa ,  Tsuyoshi Yoshii ,  Hiroshi Yoshino

发明人： Norihiko Samoto ,  Haruo Iwasaki ,  Atsushi Nishizawa ,  Tsuyoshi Yoshii ,  Hiroshi Yoshino

IPC分类号： G03F7/11 ,  C08L25/18 ,  C08L33/02 ,  C08L33/12 ,  C08L61/06 ,  C08L79/08 ,  G02B1/11 ,  G02B1/111 ,  G03F7/09 ,  H01L21/027 ,  G03C1/76

CPC分类号： G03F7/091

摘要： An antireflection film includes a base resin and an additive resin, the additive resin having a dry etching rate higher than that of the base resin. A photoresist pattern is formed and the antireflection film is selectively etched using the photoresist pattern as a mask. The molecular weight and weight percent of the additive resin are selected to provide an etching rate for the antireflection film that permits selective removal of the antireflection film while leaving an effective amount of the photoresist.

摘要翻译： 防反射膜包括基础树脂和添加剂树脂，添加剂树脂的干蚀刻速率高于基础树脂。 形成光致抗蚀剂图案，并使用光致抗蚀剂图案作为掩模选择性地蚀刻防反射膜。 选择添加剂树脂的分子量和重量百分数以提供防反射膜的蚀刻速率，其允许选择性去除防反射膜，同时留下有效量的光致抗蚀剂。

公开(公告)号：US06864021B2

公开(公告)日：2005-03-08

申请号：US10341160

申请日：2003-01-13

申请人： Haruo Iwasaki ,  Shinji Ishida ,  Tsuyoshi Yoshii

发明人： Haruo Iwasaki ,  Shinji Ishida ,  Tsuyoshi Yoshii

IPC分类号： G03F1/00 ,  G03F1/68 ,  G03F1/70 ,  G03F7/20 ,  G03F7/40 ,  H01L21/027 ,  H01L21/28 ,  H01L21/311 ,  G03F9/00

CPC分类号： G03F7/40 ,  G03F1/00 ,  H01L21/31144

摘要： The invention relates to a photomask for use in a thermal flow process in which: a photomask is prepared in which a plurality of exposure openings are formed; a resist is applied to the surface of a layer of a semiconductor integrated circuit that is to undergo processing; this resist is patterned by an exposure process through the photomask to form a plurality of openings in the resist that correspond to each of the exposure openings; and the patterned resist is then heated to cause each of the openings to shrink; wherein at least a portion of exposure openings among the plurality of exposure openings are formed in shapes that compensate for anisotropic deformation that occurs in the openings when the patterned resist is heated to cause each of the openings to shrink. Since the openings that are formed in the resist are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation.

摘要翻译： 本发明涉及一种用于热流程的光掩模，其中：准备形成多个曝光孔的光掩模; 将抗蚀剂施加到要进行处理的半导体集成电路的层的表面上; 该抗蚀剂通过曝光工艺通过光掩模进行图案化以在抗蚀剂中形成与每个曝光开口相对应的多个开口; 然后加热图案化的抗蚀剂以使每个开口收缩; 其中所述多个曝光开口中的所述曝光开口的至少一部分形成为补偿当所述图案化抗蚀剂被加热以使每个所述开口收缩时在所述开口中发生的各向异性变形的形状。 由于在抗蚀剂中形成的开口预先设置有补偿当开口收缩时发生的变形的形状，所以这些开口在经历收缩和变形之后达到适当的形状。

公开(公告)号：US06566041B2

公开(公告)日：2003-05-20

申请号：US09757841

申请日：2001-01-10

申请人： Haruo Iwasaki ,  Shinji Ishida ,  Tsuyoshi Yoshii

发明人： Haruo Iwasaki ,  Shinji Ishida ,  Tsuyoshi Yoshii

IPC分类号： G03F740

CPC分类号： G03F7/40 ,  G03F1/00 ,  H01L21/31144

摘要： The invention relates to a photomask for use in a thermal flow process in which: a photomask is prepared in which a plurality of exposure openings are formed; a resist is applied to the surface of a layer of a semiconductor integrated circuit that is to undergo processing; this resist is patterned by an exposure process through the photomask to form a plurality of openings in the resist that correspond to each of the exposure openings; and the patterned resist is then heated to cause each of the openings to shrink; wherein at least a portion of exposure openings among the plurality of exposure openings are formed in shapes that compensate for anisotropic deformation that occurs in the openings when the patterned resist is heated to cause each of the openings to shrink. Since the openings that are formed in the resist are provided in advance with shapes that compensate for the deformation that occurs when the openings shrink, these openings attain the proper shape after undergoing shrinking and deformation.

摘要翻译： 本发明涉及一种用于热流程的光掩模，其中：准备形成多个曝光孔的光掩模; 将抗蚀剂施加到要进行处理的半导体集成电路的层的表面上; 该抗蚀剂通过曝光工艺通过光掩模进行图案化以在抗蚀剂中形成与每个曝光开口相对应的多个开口; 然后加热图案化的抗蚀剂以使每个开口收缩; 其中所述多个曝光开口中的所述曝光开口的至少一部分形成为补偿当所述图案化抗蚀剂被加热以使每个所述开口收缩时在所述开口中发生的各向异性变形的形状。 由于在抗蚀剂中形成的开口预先设置有补偿当开口收缩时发生的变形的形状，所以这些开口在经历收缩和变形之后达到适当的形状。

公开(公告)号：US07817856B2

公开(公告)日：2010-10-19

申请号：US11632967

申请日：2005-07-15

申请人： Tsuyoshi Yoshii ,  Yuji Tanikawa ,  Masahiro Okada

发明人： Tsuyoshi Yoshii ,  Yuji Tanikawa ,  Masahiro Okada

IPC分类号： G06K9/18 ,  G06K9/34 ,  H04N7/00 ,  H04N7/10 ,  H04N7/025 ,  H04N11/00

CPC分类号： H04N9/8233 ,  G06K9/3266 ,  G06K2209/01 ,  H04N5/782 ,  H04N5/85 ,  H04N19/17 ,  H04N21/478 ,  H04N21/4882 ,  H04N21/4884

摘要： A video processing method for selectively processing character information (Ic) included in an inputted video stream (Svc). The video stream (Svc) is separated in units of frame into a brightness frame (Y) representing brightness information (VY) and a plurality of color difference frames (Cb, Cr) representing color difference information (VCb, VCr). Character information (Ic) included according to at least either of the brightness information (VY) and the color difference information (VCb, VCr) is recognized. The recognized character information (Ic) is subjected to a processing by at least one of deletion, movement, and enlargement.

摘要翻译： 一种用于选择性地处理输入的视频流（Svc）中包括的字符信息（Ic）的视频处理方法。 将视频流（Svc）以帧为单位分离为表示色差信息（VCb，VCr）的亮度信息（VY）和多个色差帧（Cb，Cr）的亮度帧（Y）。 识别根据亮度信息（VY）和色差信息（VCb，VCr）中的至少一个所包含的字符信息（Ic）。 识别的字符信息（Ic）通过删除，移动和放大中的至少一个进行处理。

公开(公告)号：US20080085051A1

公开(公告)日：2008-04-10

申请号：US11632967

申请日：2005-07-15

申请人： Tsuyoshi Yoshii ,  Yuji Tanikawa ,  Masahiro Okada

发明人： Tsuyoshi Yoshii ,  Yuji Tanikawa ,  Masahiro Okada

IPC分类号： G06K9/34 ,  G06K9/18

CPC分类号： H04N9/8233 ,  G06K9/3266 ,  G06K2209/01 ,  H04N5/782 ,  H04N5/85 ,  H04N19/17 ,  H04N21/478 ,  H04N21/4882 ,  H04N21/4884

摘要： A video processing method for selectively processing character information (Ic) included in an inputted video stream (Svc). The video stream (Svc) is separated in units of frame into a brightness frame (Y) representing brightness information (VY) and a plurality of color difference frames (Cb, Cr) representing color difference information (VCb, VCr). Character information (Ic) included according to at least either of the brightness information (VY) and the color difference information (VCb, VCr) is recognized. The recognized character information (Ic) is subjected to a processing by at least one of deletion, movement, and enlargement.

摘要翻译： 一种用于选择性地处理输入的视频流（Svc）中包括的字符信息（Ic）的视频处理方法。 将视频流（Svc）以帧为单位分离为表示色差信息（VCb，VCr）的亮度信息（VY）和多个色差帧（Cb，Cr）的亮度帧（Y）。 识别根据亮度信息（VY）和色差信息（VCb，VCr）中的至少一个所包含的字符信息（Ic）。 识别的字符信息（Ic）通过删除，移动和放大中的至少一个进行处理。

公开(公告)号：US20120033945A1

公开(公告)日：2012-02-09

申请号：US13271962

申请日：2011-10-12

申请人： Masato KIHARA ,  Tsuyoshi Yoshii ,  Michiko Mizote

发明人： Masato KIHARA ,  Tsuyoshi Yoshii ,  Michiko Mizote

IPC分类号： H04N9/80

CPC分类号： G11B27/32 ,  G11B27/002 ,  G11B27/105 ,  G11B27/3027 ,  G11B2220/2516 ,  G11B2220/2541 ,  G11B2220/2562 ,  G11B2220/41 ,  H04N5/781 ,  H04N5/85 ,  H04N9/7921 ,  H04N9/8205

摘要： A playback apparatus for playing back video data includes a read section and a control section, a first content includes first information and the first video data, a second content includes second information and second video data recorded in a different format from a format of the first video data, the first information is a part of management information for third video data recorded in a different format from the format of the first video data, the second information is a part of management information for the second video data, the read section reads out the first information and the second information from the first content and the second content, respectively, and outputs the first information and the second information to the control section, and when the first information and the second information match, the control section plays back the first video data.

摘要翻译： 用于播放视频数据的重放装置包括读取部分和控制部分，第一内容包括第一信息和第一视频数据，第二内容包括以与第一视频数据格式不同的格式记录的第二信息和第二视频数据 视频数据，第一信息是以与第一视频数据的格式不同的格式记录的第三视频数据的管理信息的一部分，第二信息是第二视频数据的管理信息的一部分，读取部分读出 分别从第一内容和第二内容输出第一信息和第二信息，并将第一信息和第二信息输出到控制部分，并且当第一信息和第二信息匹配时，控制部分重放第一信息 视频数据。

公开(公告)号：US20100209079A1

公开(公告)日：2010-08-19

申请号：US12667633

申请日：2008-06-27

申请人： Masato Kihara ,  Ken Nagai ,  Tsuyoshi Yoshii ,  Miki Shimizu ,  Chikashi Hayashi ,  Yasunori Kawakami

发明人： Masato Kihara ,  Ken Nagai ,  Tsuyoshi Yoshii ,  Miki Shimizu ,  Chikashi Hayashi ,  Yasunori Kawakami

IPC分类号： H04N5/00

CPC分类号： H04N5/85 ,  G11B20/00086 ,  G11B20/00471 ,  G11B20/00702 ,  G11B27/034 ,  G11B27/329 ,  H04N5/913 ,  H04N9/8205 ,  H04N9/8227 ,  H04N9/8715 ,  H04N2005/91321

摘要： In a DVD+VR recording method, when a VCPS (Video Content Protection System) title (204) recorded under protection of its copyright is recorded in a VCPS-incapable apparatus, a dummy title (203) having a protection attribute is provided immediately before the VCPS title, and information about the dummy title is included in title management information for VCPS-incapable apparatuses and information about the VCPS title is not included in the title management information for VCPS-incapable apparatuses. As a result, even when a user tries to perform overwriting from a deleted title immediately before a VCPS title in a VCPS-incapable apparatus, the recording is stopped as the dummy title has the protection attribute, whereby the VCPS title is prevented from being deleted.

摘要翻译： 在DVD + VR记录方法中，当在VCPS不能装置的保护下记录VCPS（视频内容保护系统）标题（204）被记录在VCPS不能装置的情况下时，具有保护属性的虚拟标题（203） VCPS标题和关于虚拟标题的信息被包括在用于VCPS不能装置的标题管理信息中，并且关于VCPS标题的信息不包括在用于VCPS不能装置的标题管理信息中。 结果，即使当用户尝试在VCPS无法装置中的VCPS标题之前立即从删除的标题中执行重写时，由于虚拟标题具有保护属性，所以停止记录，由此防止VCPS标题被删除 。

公开(公告)号：US06210868B1

公开(公告)日：2001-04-03

申请号：US09187855

申请日：1998-11-06

申请人： Tsuyoshi Yoshii

发明人： Tsuyoshi Yoshii

IPC分类号： G03F740

CPC分类号： G03F7/40 ,  Y10S430/146

摘要： A method for forming a fine pattern on a chemical sensitization photoresist includes the consecutive steps of exposing a photoresist film with KrF excimer laser, developing the exposed photoresist film to form a photoresist pattern, separating protective group from the photoresist pattern, and heating the photoresist film to make the photoresist pattern to have a swelling property, thereby reshaping the openings in the photoresist pattern while reducing the size of the openings. The method achieves a finer pattern in a design rule of 0.30 to 0.18 &mgr;m without degradation of the shape.

摘要翻译： 用于在化学增感光致抗蚀剂上形成精细图案的方法包括用KrF准分子激光器曝光光致抗蚀剂膜的步骤，显影曝光的光致抗蚀剂膜以形成光刻胶图案，将保护基与光致抗蚀剂图案分离，以及加热光致抗蚀剂膜 以使光致抗蚀剂图案具有溶胀特性，从而在减小开口尺寸的同时重塑光致抗蚀剂图案中的开口。 该方法在0.30至0.18μm的设计规则中实现更细的图案，而不会使形状退化。