摘要:
A radiation-sensitive resin composition useful as a chemically amplified resist excelling particularly in depth of focus (DOF) and capability of substantially decreasing development defects, while maintaining excellent basic performance as a resist is provided. The radiation-sensitive resin composition comprises (A) a siloxane resin containing an acid-dissociable group and (B) a photoacid generator, wherein when a coating formed from the radiation-sensitive resin composition is exposed to radiation and heated, the contact angle (α) with water in an unexposed area and the contact angle (β) with water in an exposed area satisfy an inequality formula of (α−β)>5. The component (A) is preferably a compound having a structural unit (I) shown by the following formula (I) and a structural unit (II) shown by the following formula (II), wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or unsubstituted divalent hydrocarbon group.
摘要:
The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)
摘要:
The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)
摘要:
A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.
摘要翻译:提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性,并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜,可以提高抗蚀剂图案的再现性,并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。 该组合物包含下式(A)的硅烷化合物的水解产物和/或缩合物,其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si(OR 3)4-a(A),R 2各自表示 氢原子,卤原子或一价有机基团,R 3分别表示一价有机基团,R 1为除OR 3以外的基团,a为1〜3的整数,b为1〜3的整数,c为 0〜2的整数,条件是a = b + c。
摘要:
An electric heating device suitable for heating an electric vehicle and having a novel structure is provided. The electric heating device includes: an electric motor that includes a stator having a plurality of stator coils arranged along the circumferential direction to generate a rotating magnetic field and a disk-shaped rotor that includes a plurality of one-turn coils disposed correspondingly to the stator coils and a soft magnetic metal plate supporting the one-turn coils; and a fan secured to the soft magnetic metal plate on a side thereof opposite from the one-turn coils and including a vane wheel that has a plurality of vanes and rotates integrally with the rotor.
摘要:
The receiver includes a low noise amplifier, a local signal generator, a first mixer, a second mixer, a first amplifier, a second amplifier, a first A/D converter, a second A/D converter, and a signal level detection unit. A detection signal from at least one terminal of the first A/D converter is supplied to an input terminal of the signal level detection unit, thereby generating a reception start signal from the output terminal. Before an RF reception signal is received, a first signal processing unit containing the first mixer, the first amplifier, and the first A/D converter is controlled to an active state, and a second signal processing unit containing the second mixer, the second amplifier, and the second A/D converter is controlled to a low power consumption state. After the RF reception signal is received, the second signal processing unit is controlled to the active state.
摘要:
A vehicle seat with a function of absorbing volatile substances in an interior of a vehicle with the seat is disclosed. The vehicle seat comprises a seat frame structure, a cushioned padding member supported on the seat frame structure, and a volatile substances-absorbing member provided on a surface of the cushioned padding member which faces the seat frame structure.
摘要:
A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.
摘要:
An interference exclusion capability testing apparatus is provided for use in testing interference exclusion capability of a specimen by radiating an electromagnetic wave toward the specimen from a radiating antenna. The radiating antenna includes an electromagnetic horn, and a waveguide plate that guides an electromagnetic wave radiated from the electromagnetic horn to the specimen.
摘要:
A polymer clad optical fiber is provided in which, if the diameter of an inner core is taken as a1, and the diameter of an outer core is taken as a2, and if a ratio X (which=a22/a12) between a cross-sectional area of the inner core and a cross-sectional area of the outer core is within a range of 1.8≦X≦2.2, and if a relative refractive index difference between the inner core and the outer core is taken as Δ1, and if a relative refractive index difference between the outer core and a cladding is taken as Δ2, then for a parameter Y which is defined as Y=Δ1/Δ2, when a high temperature is taken as Ymax and a low temperature is taken as Ymin, a relationship is established in which, when X is within a range of 1.8≦X≦2.0, then 0.25≦Ymin≦0.84X−0.68, and Ymax is 0.25≦Ymax≦0.84X−0.68, and, when X is within a range of 2.0≦X≦2.2, Ymin is 0.48X−0.71≦Ymin≦−2/9X+13/9, and Ymax is 0.48X−0.71≦Ymax≦−2/9X+13/9.