Radiation-sensitive resin composition
    1.
    发明申请
    Radiation-sensitive resin composition 审中-公开
    辐射敏感树脂组合物

    公开(公告)号:US20060223001A1

    公开(公告)日:2006-10-05

    申请号:US11387711

    申请日:2006-03-24

    IPC分类号: G03C1/00

    摘要: A radiation-sensitive resin composition useful as a chemically amplified resist excelling particularly in depth of focus (DOF) and capability of substantially decreasing development defects, while maintaining excellent basic performance as a resist is provided. The radiation-sensitive resin composition comprises (A) a siloxane resin containing an acid-dissociable group and (B) a photoacid generator, wherein when a coating formed from the radiation-sensitive resin composition is exposed to radiation and heated, the contact angle (α) with water in an unexposed area and the contact angle (β) with water in an exposed area satisfy an inequality formula of (α−β)>5. The component (A) is preferably a compound having a structural unit (I) shown by the following formula (I) and a structural unit (II) shown by the following formula (II), wherein A represents a substituted or unsubstituted divalent cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, X represents a single bond or a substituted or unsubstituted divalent hydrocarbon group, Y represents a single bond or a divalent coupling means, and Z represents a single bond or a substituted or unsubstituted divalent hydrocarbon group.

    摘要翻译: 提供了用作化学放大抗蚀剂的辐射敏感性树脂组合物,其具有特别优异的焦深(DOF)和显着减少显影缺陷的能力,同时保持了作为抗蚀剂的优异的基本性能。 该辐射敏感性树脂组合物包含(A)含有酸解离基团的硅氧烷树脂和(B)光致酸产生剂,其中当将由该辐射敏感性树脂组合物形成的涂层暴露于辐射并加热时,其接触角 α)与暴露区域中的水的接触角(β)满足不等式(α-β)> 5。 组分(A)优选是具有由下式(I)表示的结构单元(I)的化合物和由下式(II)表示的结构单元(II),其中A表示取代或未取代的二价环状烃 基团R 1表示一价酸解离基团,X表示单键或取代或未取代的二价烃基,Y表示单键或二价键合方式,Z表示单键 或取代或未取代的二价烃基。

    Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method
    2.
    发明授权
    Resin for formation of upper antireflective film, composition for formation of upper antireflective film, and resist pattern formation method 有权
    用于形成上部抗反射膜的树脂,用于形成上部抗反射膜的组合物和抗蚀剂图案形成方法

    公开(公告)号:US08497062B2

    公开(公告)日:2013-07-30

    申请号:US12530624

    申请日:2008-03-13

    IPC分类号: G03F7/32 C08F12/32 G03F7/11

    摘要: The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)

    摘要翻译: 本发明的目的是提供一种用于形成上部抗反射膜的树脂和用于形成上部抗反射膜的组合物,其可以令人满意地降低驻波效应并且在平版印刷术中在碱性显影剂中导致优异的溶解度,以及形成 抗蚀图案 具体地说,用于形成上部抗反射膜的树脂具有选自由式(1)表示的重复单元和式(2)表示的重复单元中的至少一个单元,其重均分子量为1,000至100,000, 通过GPC法测量,并且可溶于碱性显影剂。 (式(1)和(2)中,R 1〜R 14独立地表示氢原子,-OH,-COOH或-SO 3 H,条件是R 1〜R 7或R 8〜R 14全部不在分子中表示氢原子 。)

    RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD
    3.
    发明申请
    RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD 有权
    用于形成上层抗反射膜的树脂,用于形成上层抗反射膜的组合物和耐蚀图案形成方法

    公开(公告)号:US20100112475A1

    公开(公告)日:2010-05-06

    申请号:US12530624

    申请日:2008-03-13

    IPC分类号: G03F7/20 G03F7/004

    摘要: The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R1 to R14 independently represent a hydrogen atom, —OH, —COOH or —SO3H, provided that all of R1 to R7 or R8 to R14 do not represent a hydrogen atom in a molecule.)

    摘要翻译: 本发明的目的是提供一种用于形成上部抗反射膜的树脂和用于形成上部抗反射膜的组合物,其可以令人满意地降低驻波效应并且在平版印刷术中在碱性显影剂中导致优异的溶解度,以及形成 抗蚀图案 具体地说,用于形成上部抗反射膜的树脂具有选自由式(1)表示的重复单元和式(2)表示的重复单元中的至少一个单元,其重均分子量为1,000至100,000, 通过GPC法测量,并且可溶于碱性显影剂。 (式(1)和(2)中,R 1〜R 14独立地表示氢原子,-OH,-COOH或-SO 3 H,条件是R 1〜R 7或R 8〜R 14全部不在分子中表示氢原子 。)

    Composition for resist underlayer film and process for producing same
    4.
    发明授权
    Composition for resist underlayer film and process for producing same 有权
    抗蚀剂下层膜的组合物及其制造方法

    公开(公告)号:US08968458B2

    公开(公告)日:2015-03-03

    申请号:US12715406

    申请日:2010-03-02

    摘要: A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), R1bR2cSi(OR3)4-a  (A) wherein R1 is a monovalent organic group having at least one unsaturated bond, R2 individually represents a hydrogen atom, a halogen atom or a monovalent organic group, R3 individually represents a monovalent organic group, R1 is a group other than OR3, a is an integer of 1 to 3, b is an integer of 1 to 3, and c is an integer of 0 to 2, provided that a=b+c.

    摘要翻译: 提供了抗蚀剂下层膜用组合物。 该组合物具有优异的储存稳定性,并且可以形成对抗蚀剂膜具有优异粘合性的抗蚀剂下层膜,可以提高抗蚀剂图案的再现性,并且耐显影用碱性液体和除去抗蚀剂期间的氧气需求。 该组合物包含下式(A)的硅烷化合物的水解产物和/或缩合物,其中R1是具有至少一个不饱和键的一价有机基团的R 1 b R 2 c Si(OR 3)4-a(A),R 2各自表示 氢原子,卤原子或一价有机基团,R 3分别表示一价有机基团,R 1为除OR 3以外的基团,a为1〜3的整数,b为1〜3的整数,c为 0〜2的整数,条件是a = b + c。

    ELECTRIC HEATING DEVICE AND ELECTRIC VEHICLE
    5.
    发明申请
    ELECTRIC HEATING DEVICE AND ELECTRIC VEHICLE 审中-公开
    电加热装置和电动车

    公开(公告)号:US20140079375A1

    公开(公告)日:2014-03-20

    申请号:US14122624

    申请日:2012-05-25

    IPC分类号: F24H3/04 B60H1/22

    摘要: An electric heating device suitable for heating an electric vehicle and having a novel structure is provided. The electric heating device includes: an electric motor that includes a stator having a plurality of stator coils arranged along the circumferential direction to generate a rotating magnetic field and a disk-shaped rotor that includes a plurality of one-turn coils disposed correspondingly to the stator coils and a soft magnetic metal plate supporting the one-turn coils; and a fan secured to the soft magnetic metal plate on a side thereof opposite from the one-turn coils and including a vane wheel that has a plurality of vanes and rotates integrally with the rotor.

    摘要翻译: 提供一种适用于加热电动车辆并具有新颖结构的电加热装置。 电加热装置包括:电动机,其包括定子,该定子具有沿圆周方向布置的多个定子线圈以产生旋转磁场;以及盘形转子,其包括相应于定子设置的多个单匝线圈 线圈和支撑单匝线圈的软磁金属板; 以及在与所述单匝线圈相对的一侧固定到所述软磁金属板的风扇,并且包括具有多个叶片并与所述转子一体旋转的叶轮。

    Receiver and receiving method of the receiver
    6.
    发明授权
    Receiver and receiving method of the receiver 失效
    接收机的接收和接收方法

    公开(公告)号:US08301208B2

    公开(公告)日:2012-10-30

    申请号:US12472741

    申请日:2009-05-27

    IPC分类号: H04M1/00 H04B1/38

    摘要: The receiver includes a low noise amplifier, a local signal generator, a first mixer, a second mixer, a first amplifier, a second amplifier, a first A/D converter, a second A/D converter, and a signal level detection unit. A detection signal from at least one terminal of the first A/D converter is supplied to an input terminal of the signal level detection unit, thereby generating a reception start signal from the output terminal. Before an RF reception signal is received, a first signal processing unit containing the first mixer, the first amplifier, and the first A/D converter is controlled to an active state, and a second signal processing unit containing the second mixer, the second amplifier, and the second A/D converter is controlled to a low power consumption state. After the RF reception signal is received, the second signal processing unit is controlled to the active state.

    摘要翻译: 接收机包括低噪声放大器,本地信号发生器,第一混频器,第二混频器,第一放大器,第二放大器,第一A / D转换器,第二A / D转换器和信号电平检测单元。 来自第一A / D转换器的至少一个端子的检测信号被提供给信号电平检测单元的输入端,从而从输出端产生接收开始信号。 在接收到RF接收信号之前,将包含第一混频器,第一放大器和第一A / D转换器的第一信号处理单元控制为有效状态,以及包含第二混频器的第二信号处理单元,第二放大器 并且第二A / D转换器被控制到低功耗状态。 在RF接收信号被接收之后,第二信号处理单元被控制到活动状态。

    Method for pattern formation and resin composition for use in the method
    8.
    发明授权
    Method for pattern formation and resin composition for use in the method 有权
    用于图案形成的方法和用于该方法的树脂组合物

    公开(公告)号:US08211624B2

    公开(公告)日:2012-07-03

    申请号:US12601011

    申请日:2008-05-21

    摘要: A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern.

    摘要翻译: 图案形成方法包括:(1)选择性地暴露第一抗蚀剂层,以及使曝光的第一抗蚀剂层显影以形成第一图案;(2)将含有羟基的树脂和溶剂的树脂组合物施加到第一图案, 烘烤所施加的树脂组合物,并显影所述烘焙的树脂组合物以形成第二图案,所述含羟基的树脂在烘烤时变得不溶或几乎不溶于显影剂,以及(3)全部或选择性地暴露所述第二图案以制备第二图案 图案部分地溶解在显影剂中,并且显影第二图案以形成第三图案,其中至少在第二图案中形成孔或凹槽。

    Interference exclusion capability testing apparatus
    9.
    发明授权
    Interference exclusion capability testing apparatus 失效
    干扰排除能力检测仪

    公开(公告)号:US07999560B2

    公开(公告)日:2011-08-16

    申请号:US12084451

    申请日:2006-10-26

    IPC分类号: G01R27/28 H01Q13/00

    CPC分类号: G01R31/001 G01R29/0821

    摘要: An interference exclusion capability testing apparatus is provided for use in testing interference exclusion capability of a specimen by radiating an electromagnetic wave toward the specimen from a radiating antenna. The radiating antenna includes an electromagnetic horn, and a waveguide plate that guides an electromagnetic wave radiated from the electromagnetic horn to the specimen.

    摘要翻译: 提供一种干扰排除能力测试装置,用于通过从辐射天线向样本辐射电磁波来测试样本的干扰排除能力。 辐射天线包括电磁喇叭和将从电磁喇叭辐射的电磁波引导到样本的波导板。

    POLYMER CLAD OPTICAL FIBER
    10.
    发明申请
    POLYMER CLAD OPTICAL FIBER 有权
    聚合物光纤

    公开(公告)号:US20090196560A1

    公开(公告)日:2009-08-06

    申请号:US12439376

    申请日:2008-03-14

    IPC分类号: G02B6/036

    摘要: A polymer clad optical fiber is provided in which, if the diameter of an inner core is taken as a1, and the diameter of an outer core is taken as a2, and if a ratio X (which=a22/a12) between a cross-sectional area of the inner core and a cross-sectional area of the outer core is within a range of 1.8≦X≦2.2, and if a relative refractive index difference between the inner core and the outer core is taken as Δ1, and if a relative refractive index difference between the outer core and a cladding is taken as Δ2, then for a parameter Y which is defined as Y=Δ1/Δ2, when a high temperature is taken as Ymax and a low temperature is taken as Ymin, a relationship is established in which, when X is within a range of 1.8≦X≦2.0, then 0.25≦Ymin≦0.84X−0.68, and Ymax is 0.25≦Ymax≦0.84X−0.68, and, when X is within a range of 2.0≦X≦2.2, Ymin is 0.48X−0.71≦Ymin≦−2/9X+13/9, and Ymax is 0.48X−0.71≦Ymax≦−2/9X+13/9.

    摘要翻译: 提供一种聚合物包覆光纤,其中如果将内芯的直径取为a1,将外芯的直径作为a2,并且如果将内芯的直径作为a的比例X(= a22 / a12) 内芯的截面面积和外芯的横截面面积在1.8 <= X <= 2.2的范围内,并且如果将内芯和外芯之间的相对折射率差作为Delta1,并且 如果将外芯和包层之间的相对折射率差作为Δ2,则对于定义为Y = Delta1 / Delta2的参数Y,当将高温作为Ymax,将低温作为Ymin时, 建立了当X在1.8 <= X <= 2.0的范围内时,0.25 <= Ymin <= 0.84X-0.68,Ymax为0.25 <= Ymax <= 0.84×-0.68的关系, 当X在2.0 <= X <= 2.2的范围内时,Ymin为0.48X-0.71 <= Ymin <= - 2 / 9X + 13/9,Ymax为0.48X-0.71 <= Ymax <= -2 / 9X + 13/9。