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    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position
    1.
    发明授权
    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
    包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置

    公开(公告)号：US5861952A

    公开(公告)日：1999-01-19

    申请号：US984509

    申请日：1992-12-02

    申请人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

    发明人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

    IPC分类号： G01N21/94 ,  G01B9/02 ,  G01N21/88

    CPC分类号： G01N21/94

    摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

    摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。

    Exposure state detecting system and exposure apparatus using the same
    8.
    发明授权
    Exposure state detecting system and exposure apparatus using the same 失效
    曝光状态检测系统及使用其的曝光装置

    公开(公告)号：US5777744A

    公开(公告)日：1998-07-07

    申请号：US648417

    申请日：1996-05-15

    申请人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

    发明人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

    IPC分类号： G03F7/20 ,  G01B11/00

    CPC分类号： G03F7/70558 ,  G03F7/70641 ,  G03F7/70675

    摘要： A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.

    摘要翻译： 一种用于检测通过曝光光形成的周期性图案的形成状态的状态检测系统，包括用于将输入光投射到周期性图案上的投光装置，以及 确定装置，用于接收来自周期性图案的信号光并用于检测输入光的变化，以基于输入光的变化确定周期性图案的形成状态。

    Foreign particle inspecting system
    9.
    发明授权
    Foreign particle inspecting system 失效
    国外颗粒检测系统

    公开(公告)号：US5585918A

    公开(公告)日：1996-12-17

    申请号：US494539

    申请日：1995-06-26

    申请人： Seiji Takeuchi ,  Kyoichi Miyazaki ,  Toshihiko Tsuji

    发明人： Seiji Takeuchi ,  Kyoichi Miyazaki ,  Toshihiko Tsuji

    IPC分类号： G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  H01L21/00 ,  H01L21/027 ,  H05B37/00

    CPC分类号： H01L21/67253 ,  G01N21/94 ,  G03F1/84 ,  G01N2021/95676

    摘要： An inspecting system includes a light source, an irradiating optical system for irradiating a surface of an object such as a reticle or photomask with light from the light source, a detection optical system for detecting scattered light from the surface of the object, and a light blocking device provided substantially parallel to the surface of the object, the light blocking device having a first light transmitting portion for passing light coming from the light source toward the surface of the object and a second light transmitting portion for passing light coming from an irradiated position on the surface of the object toward the detection optical system.

    摘要翻译： 一种检查系统，包括光源，用于从光源的光照射诸如掩模版或光掩模的物体的表面的照射光学系统，用于检测来自物体的表面的散射光的检测光学系统，以及光 遮光装置设置成基本上平行于物体的表面，遮光装置具有用于使来自光源的光朝向物体的表面通过的第一透光部分和用于使来自照射位置的光通过的第二透光部分 在物体的表面上朝向检测光学系统。

    Phase measurement apparatus for measuring characterization of optical thin films
    10.
    发明授权
    Phase measurement apparatus for measuring characterization of optical thin films 失效
    用于测量光学薄膜表征的相位测量装置

    公开(公告)号：US07030998B2

    公开(公告)日：2006-04-18

    申请号：US10356231

    申请日：2003-01-31

    申请人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

    发明人： Seiji Takeuchi ,  Akiyoshi Suzuki ,  Minoru Yoshii

    IPC分类号： G01B9/02

    CPC分类号： G03F7/706 ,  G01J9/0215

    摘要： A phase measuring apparatus for measuring phase characteristics of a film applied onto an object to be measured includes a shearing interference system for providing incident light onto the object or light reflected on the object with shearing interference, a detector for detecting shearing interference information, and a computing unit for calculating the phase characteristics of the film based on the shearing interference information.

    摘要翻译： 用于测量施加到待测物体上的膜的相位特性的相位测量装置包括用于将入射光提供到物体上的剪切干涉系统或者具有剪切干涉的物体上反射的光，用于检测剪切干扰信息的检测器和 计算单元，用于基于剪切干扰信息计算胶片的相位特性。