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公开(公告)号：US20210395106A1
公开(公告)日：2021-12-23
申请号：US17285671
申请日：2019-10-17
申请人： ORGANO CORPORATION
发明人： Yukinari YAMASHITA , Daisaku YANO , Kyohei TSUTANO
摘要： A water quality management method for managing the concentration of impurity ions contained in the water to be analyzed includes connecting the ion adsorption device in which the ion adsorbent and the accumulated flow rate meter are provided to the blanch pipe, passing the water being analyzed from the blanch pipe to the ion adsorbent for a predetermined period of time to the ion adsorption device and adsorbing ions contained in the water being analyzed an ion adsorbent sample. In the ion adsorption device, an accumulated flow rate meter is provided on the downstream side of the flow direction of the water being analyzed of the ion adsorbent.
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公开(公告)号：US20210033581A1
公开(公告)日：2021-02-04
申请号：US16966631
申请日：2018-09-12
申请人： ORGANO CORPORATION
摘要： Provided are a method and system for measuring hydrogen peroxide concentration in sample water collected from a prescribed position in a water treatment process and includes: collecting the sample water; measuring a concentration of a dissolved oxygen in the sample water or a treated water obtained by treating the sample water with the hydrogen peroxide decomposing device by first and second dissolved oxygen concentration measuring analyzers to obtain a corrected value that is a difference between the two dissolved oxygen concentration values; measuring the concentration of the dissolved oxygen in the sample and treated water by the first and second dissolved oxygen concentration measuring analyzers, respectively, and obtaining a measured value that is a difference between the dissolved oxygen concentration values; and calculating a corrected concentration of hydrogen peroxide from the measured value obtained during the measured value obtaining and the corrected value obtained during the corrected value obtaining.
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公开(公告)号：US20210249259A1
公开(公告)日：2021-08-12
申请号：US17241522
申请日：2021-04-27
申请人： ORGANO CORPORATION
摘要： Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.
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公开(公告)号：US20240328843A1
公开(公告)日：2024-10-03
申请号：US18602241
申请日：2024-03-12
申请人： ORGANO CORPORATION
发明人： Noriko TAKADA , Yukinari YAMASHITA
CPC分类号： G01F1/661 , B01D15/00 , B01D61/145 , B01D61/147 , B01D61/22 , B01D69/02 , B01D2311/04 , B01D2313/60 , B01D2325/42
摘要： Liquid purification unit includes purification device that purifies a flammable liquid, liquid storage tank that stores the liquid supplied to purification device, at least one non-energized sensor that detects the presence or absence of liquid flowing out from liquid storage tank, and housing that accommodates purification device, liquid storage tank, and the at least one non-energized sensor.
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公开(公告)号：US20190388857A1
公开(公告)日：2019-12-26
申请号：US16528993
申请日：2019-08-01
申请人： ORGANO CORPORATION
摘要： A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.
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公开(公告)号：US20160361693A1
公开(公告)日：2016-12-15
申请号：US15118992
申请日：2015-01-06
申请人： ORGANO CORPORATION
CPC分类号： B01F3/04985 , B01F3/04439 , B01F3/2057 , B01F5/106 , B01F15/0022 , B01F15/00344 , B01F15/0408 , B01F2003/04886 , C01B13/11 , C01B2201/64 , C01B2201/90 , C02F1/78 , C02F2103/04 , C02F2201/782 , C02F2209/23
摘要： An ozonated water supply method includes: feeding dissolving water contained in a circulation tank to an ozonation device at a given feed rate while feeding ultrapure water to the circulation tank, and returning ozonated water that has not been used at a use point to the circulation tank, dissolving ozone in the dissolving water using the ozonation device to obtain ozonated water, and feeding the ozonated water to the use point; feeding oxygen gas having a nitrogen gas content of 0.01 vol % or less to a discharge-type ozone gas-producer, and feeding the resulting ozone-containing gas to the ozonation device; adjusting the feed rate of the ultrapure water to the circulation tank; and adjusting the dissolved ozone concentration in the ozonated water. The method can reduce or suppress the accumulation of nitric acid in the recirculation system when a discharge-type ozone gas-producer is used as the ozone gas-producer.
摘要翻译： 臭氧水供给方法包括：以给定的进料速率将包含在循环罐中的溶解水加入到臭氧装置中，同时向循环罐供给超纯水，并将循环罐中未使用的臭氧水返回到循环罐 使用臭氧化装置将臭氧溶解在溶解水中，得到臭氧化水，将臭氧水供给到使用点; 向放电型臭氧气体生产器供给氮气含量为0.01体积％以下的氧气，并将得到的含臭氧气体供给到臭氧化装置中; 调节超纯水进入循环罐的进料速度; 并调节臭氧水中溶解的臭氧浓度。 当使用排放型臭氧气体生产者作为臭氧气体生产者时，该方法可以减少或抑制再循环系统中硝酸的积聚。
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公开(公告)号：US20190381539A1
公开(公告)日：2019-12-19
申请号：US16556633
申请日：2019-08-30
申请人： ORGANO CORPORATION
摘要： The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 μg/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 MΩ·cm.
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公开(公告)号：US20170259234A1
公开(公告)日：2017-09-14
申请号：US15509047
申请日：2015-08-04
申请人： ORGANO CORPORATION
CPC分类号： B01F15/0408 , B01F3/0865 , B01F3/088 , B01F5/0403 , B01F15/00149 , B01F15/0022 , B01F15/00227 , B01F15/00285 , B01F15/00344 , B01F15/00357 , B01F15/0238 , B01F15/0416 , B01F2003/0896 , B01F2005/0028 , B01F2215/004 , B01F2215/0096 , B01F2215/0431 , C11D7/04 , G05D11/131 , H01L21/02052
摘要： A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid to a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.
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公开(公告)号：US20160233082A1
公开(公告)日：2016-08-11
申请号：US15023161
申请日：2014-09-17
申请人： ORGANO CORPORATION
IPC分类号： H01L21/02 , B08B3/08 , C02F9/00 , C02F1/68 , C23F1/16 , C02F1/20 , C02F1/70 , B01J19/24 , C11D7/08 , H01L21/67 , C02F1/44
CPC分类号： H01L21/02068 , C02F1/20 , C02F9/00 , C23G1/24 , C23G5/00 , H01L21/02071 , H01L21/67017 , H01L21/67051 , H01L21/6708 , H01L21/67086
摘要： Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.
摘要翻译： 提供了能够更好地抑制暴露在基板表面上的金属配线的腐蚀或氧化的基板处理方法和基板处理设备。 本发明涉及具有处理室的基板处理设备，其中设置有基板，并且提供用于处理基板的基板处理溶液。 该设备设置有惰性气体填充机构，用于在其中设置基板的处理室的内部填充惰性气体，并且在处理室的附近或内部，填充有铂族金属催化剂的催化单元，其中通过 包含加入超纯水中的氢的氢溶解水通过。 通过使氢溶解的水通过铂族金属催化剂而获得，通过设备将作为基板处理溶液的氢溶解处理液供给到处理室。
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公开(公告)号：US20160059273A1
公开(公告)日：2016-03-03
申请号：US14783253
申请日：2014-04-17
申请人： ORGANO CORPORATION
CPC分类号： B08B3/08 , C02F1/20 , C02F1/32 , C02F1/42 , C02F1/44 , C02F1/68 , C02F9/00 , C02F2103/04 , C11D7/02 , C23G1/103 , C23G1/20 , H01L21/02068 , H01L21/6704
摘要： The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 μg/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 MΩ·cm.
摘要翻译： 包括紫外线氧化装置和每个基板处理装置的进水口的子系统的出水口通过主管相互连接。 在子系统的紫外氧化装置和非再生离子交换装置之间安装过氧化氢去除装置。 此外，二氧化碳供应装置安装在从子系统的出水口分支到达基板处理装置的管的中间。 根据一方面，用铂族金属催化剂填充过氧化氢去除装置。 因此，使用通过紫外线氧化装置的超纯水作为碱，生成其中溶解有过氧化氢的浓度限制在2μg/ L以下的碳酸水，并且添加二氧化碳以将电阻率调节在 范围为0.03至5.0 M＆OHgr;·cm。
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