Method and apparatus for verifying proper substrate positioning
    1.
    发明授权
    Method and apparatus for verifying proper substrate positioning 有权
    用于验证适当的基板定位的方法和装置

    公开(公告)号:US07933009B2

    公开(公告)日:2011-04-26

    申请号:US11829748

    申请日:2007-07-27

    IPC分类号: G01J1/00 G01B11/14

    CPC分类号: H01L21/681 H01L21/67259

    摘要: Embodiments of methods and apparatus for detecting the proper position of a substrate in a chamber are provided herein. In some embodiments, a substrate position detection apparatus includes a substrate support having a plurality of lift pins for supporting a substrate in an elevated position thereover; a light source for directing a beam of light upon a reflective upper surface of the substrate; and a light sensor for detecting a reflected beam of light from the upper surface of the substrate upon the substrate being aligned in a predetermined elevated position.

    摘要翻译: 本文提供了用于检测腔室中基底的适当位置的方法和装置的实施例。 在一些实施例中,基板位置检测装置包括具有多个提升销的基板支撑件,用于将基板支撑在其上的升高位置; 用于将光束引导到所述基板的反射上表面上的光源; 以及光传感器,用于在基板在预定的升高位置对准时检测来自基板的上表面的反射光束。

    METHOD AND APPARATUS FOR VERIFYING PROPER SUBSTRATE POSITIONING
    2.
    发明申请
    METHOD AND APPARATUS FOR VERIFYING PROPER SUBSTRATE POSITIONING 有权
    用于验证适当的基板定位的方法和装置

    公开(公告)号:US20090027657A1

    公开(公告)日:2009-01-29

    申请号:US11829748

    申请日:2007-07-27

    IPC分类号: G01N21/00 G01N21/55

    CPC分类号: H01L21/681 H01L21/67259

    摘要: Embodiments of methods and apparatus for detecting the proper position of a substrate in a chamber are provided herein. In some embodiments, a substrate position detection apparatus includes a substrate support having a plurality of lift pins for supporting a substrate in an elevated position thereover; a light source for directing a beam of light upon a reflective upper surface of the substrate; and a light sensor for detecting a reflected beam of light from the upper surface of the substrate upon the substrate being aligned in a predetermined elevated position.

    摘要翻译: 本文提供了用于检测腔室中基底的适当位置的方法和装置的实施例。 在一些实施例中,基板位置检测装置包括具有多个提升销的基板支撑件,用于将基板支撑在其上的升高位置; 用于将光束引导到所述基板的反射上表面上的光源; 以及光传感器,用于在基板在预定的升高位置对准时检测来自基板的上表面的反射光束。

    Apparatus and method for measuring radiation energy during thermal processing
    3.
    发明授权
    Apparatus and method for measuring radiation energy during thermal processing 有权
    热处理过程中测量辐射能的装置和方法

    公开(公告)号:US08452166B2

    公开(公告)日:2013-05-28

    申请号:US12483084

    申请日:2009-06-11

    IPC分类号: A21B2/00

    摘要: Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum.

    摘要翻译: 本发明的实施例提供了用于在热处理期间减少加热源辐射对温度测量的影响的装置和方法。 在本发明的一个实施例中,将背景辐射能(例如热处理室的能量源)标记在所选择的光谱内,然后通过测量所选光谱内的参考波长的辐射能来确定背景的特性 以及刚好在所选频谱之外的比较波长。

    APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING
    5.
    发明申请
    APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING 有权
    用于在热处理过程中测量辐射能量的装置和方法

    公开(公告)号:US20100003020A1

    公开(公告)日:2010-01-07

    申请号:US12483084

    申请日:2009-06-11

    IPC分类号: A21B2/00

    摘要: Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum.

    摘要翻译: 本发明的实施例提供了用于在热处理期间减少加热源辐射对温度测量的影响的装置和方法。 在本发明的一个实施例中,将背景辐射能(例如热处理室的能量源)标记在所选择的光谱内,然后通过测量所选光谱内的参考波长的辐射能来确定背景的特性 以及刚好在所选频谱之外的比较波长。

    System for non radial temperature control for rotating substrates
    6.
    发明授权
    System for non radial temperature control for rotating substrates 有权
    用于旋转基板的非径向温度控制系统

    公开(公告)号:US08249436B2

    公开(公告)日:2012-08-21

    申请号:US12434239

    申请日:2009-05-01

    IPC分类号: A21B2/00

    摘要: Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.

    摘要翻译: 本发明的实施例提供了用于降低热处理期间的不均匀性的装置和方法。 一个实施例提供了一种用于处理衬底的装置,其包括限定处理体积的室主体,设置在处理容积中的衬底支撑件,其中衬底支撑件被配置为使衬底旋转;传感器组件,被配置为测量衬底的温度 多个位置,以及一个或多个脉冲加热元件,其配置成向处理体积提供脉冲能量。

    SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES
    7.
    发明申请
    SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES 有权
    用于旋转基板的非径向温度控制系统

    公开(公告)号:US20120276660A1

    公开(公告)日:2012-11-01

    申请号:US13548858

    申请日:2012-07-13

    IPC分类号: H01L21/66

    摘要: Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.

    摘要翻译: 本发明的实施例提供了用于降低热处理期间的不均匀性的装置和方法。 一个实施例提供了一种用于处理衬底的装置,其包括限定处理体积的室主体,设置在处理容积中的衬底支撑件,其中衬底支撑件被配置为使衬底旋转;传感器组件,被配置为测量衬底的温度 多个位置,以及一个或多个脉冲加热元件,其配置成向处理体积提供脉冲能量。

    SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES
    8.
    发明申请
    SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES 有权
    用于旋转基板的非径向温度控制系统

    公开(公告)号:US20090274454A1

    公开(公告)日:2009-11-05

    申请号:US12434239

    申请日:2009-05-01

    IPC分类号: F27B5/14

    摘要: Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume.

    摘要翻译: 本发明的实施例提供了用于降低热处理期间的不均匀性的装置和方法。 一个实施例提供了一种用于处理衬底的装置,其包括限定处理体积的室主体,设置在处理容积中的衬底支撑件,其中衬底支撑件被配置为使衬底旋转;传感器组件,被配置为测量衬底的温度 多个位置,以及一个或多个脉冲加热元件,其配置成向处理体积提供脉冲能量。

    Apparatus temperature control and pattern compensation
    10.
    发明授权
    Apparatus temperature control and pattern compensation 有权
    设备温度控制和模式补偿

    公开(公告)号:US08372203B2

    公开(公告)日:2013-02-12

    申请号:US11242299

    申请日:2005-09-30

    摘要: A film formation system 10 includes a processing chamber 15 bounded by sidewalls 18 and a top cover 11. In one embodiment, a susceptor 16 is rotatably disposed in the system 10, and overlaps with a first peripheral member 205 disposed around the sidewalls 18. A radiant heating system 313 is disposed under the susceptor 305 to heat the substrate 19. In another embodiment, the top cover 11 has equally spaced pyrometers 58 for measuring the temperature of the substrate 19 across a number of zones. The temperature of the substrate 19 is obtained from pyrometric data from the pyrometers 58.

    摘要翻译: 成膜系统10包括由侧壁18和顶盖11限定的处理室15.在一个实施例中,基座16可旋转地设置在系统10中,并且与设置在侧壁18周围的第一周边构件205重叠。 辐射加热系统313设置在基座305下方以加热基板19.在另一个实施例中,顶盖11具有相等间隔的高温计58,用于测量跨越多个区域的基板19的温度。 基板19的温度由来自高温计58的高温测量数据获得。