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    Apparatus for drying batches of disks
    1.
    发明授权
    Apparatus for drying batches of disks 有权
    用于干燥批次的盘的装置

    公开(公告)号：US06477786B1

    公开(公告)日：2002-11-12

    申请号：US09579837

    申请日：2000-05-26

    申请人： Oliver David Jones ,  Kenneth C. McMahon ,  Jonathan Borkowski ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    发明人： Oliver David Jones ,  Kenneth C. McMahon ,  Jonathan Borkowski ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    IPC分类号： F26B1900

    CPC分类号： H01L21/67057 ,  H01L21/67034 ,  H01L21/67046 ,  H01L21/6776

    摘要： Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates . The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath. The thermal energy transferred to the substrates in the volume evaporates the thin layer from the substrates without decreasing the rate of separation of the substrates and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of one of the substrates during such separation. Relative humidity in the volume is controlled by sensing the relative humidity and regulating the speed of a fan that draws gas from the volume.

    摘要翻译： 通过用于干燥在细长液体浴中润湿的基底的装置和方法从批次的基底中除去液体。 衬底相对于浴移动，并且根据衬底批次在浴中的位置或体积选择移动速率的细长气体填充体积。 作为示例，基板和浴以受控的速率分离，以在每个基板进入气体填充体积时在每个基板上形成薄层的液体。 气体填充体积由细长的热室和引导到体积中并跨过衬底的热气体限定，并且在体积之外连续地将热能传递到衬底。 进入体积的气体的流速与将基底引入浴中以避免干扰浴中的液体有关。 在体积中转移到基底的热能从衬底中蒸发薄层，而不会降低衬底和浴的分离速率低于这种分离的最大速率，其中在浴和表面之间形成弯液面 在这种分离过程中。 通过感测相对湿度并调节从体积吸取气体的风扇的速度来控制体积中的相对湿度。

    Disk drying apparatus and method
    2.
    发明授权
    Disk drying apparatus and method 有权
    盘式干燥装置及方法

    公开(公告)号：US06446355B1

    公开(公告)日：2002-09-10

    申请号：US09579841

    申请日：2000-05-26

    申请人： Oliver David Jones ,  Kenneth C. McMahon ,  Jonathan Borkowski ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    发明人： Oliver David Jones ,  Kenneth C. McMahon ,  Jonathan Borkowski ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    IPC分类号： F26B334

    CPC分类号： H01L21/67057 ,  H01L21/67034 ,  H01L21/67046 ,  H01L21/6776

    摘要： Liquid is removed from disks by apparatus and methods for drying a disk that has been wet in a liquid bath. The disk and the bath are separated at a controlled rate to form a monolayer of liquid on the disk as the disk is positioned in a gas-filled volume. The separation may be by moving the disk out of the liquid bath, and the controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the disk when the liquid bath and the disk are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the disk in the gas-filled volume. Hot gas directed into the volume and across the disk and out of the volume continuously transfers thermal energy to the disk. The directing of the gas out of the volume is independent of the separation of the bath and the disk. The thermal energy transferred to the disk in the volume evaporates the monolayer from the disk without decreasing the rate of separation of the disk and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of the disk during such separation. In addition to such separation, and directing of the hot gas across the disk and out of the volume, the relative humidity in the volume is kept low to inhibit recondensation of the liquid on the disks.

    摘要翻译： 通过用于干燥已经在液浴中润湿的盘的装置和方法将液体从盘上除去。 当盘被定位在充气体积中时，盘和浴以受控的速率分离以在盘上形成单层液体。 分离可以是通过将液体槽移出液槽，并且控制速率通常不低于当液体浴和盘是液体槽时在液体浴和盘表面之间形成弯液面的最大速率 分开 充气体积由热室确定，其在气体填充体积中将热能连续传递到盘。 引导到体积中并跨越盘并且离开体积的热气体将热能连续传递到盘。 将气体引导到体积中是与浴和盘的分离无关的。 在体积中传递到盘的热能从盘中蒸发单层而不降低盘和浴的分离速率低于在浴和表面之间形成弯液面的最大速率的最大速率 在这种分离过程中。 除了这种分离之外，还引导热气体穿过盘并离开体积，体积中的相对湿度保持较低，以防止液体在盘上的再冷凝。

    Apparatus for drying batches of wafers
    3.
    发明授权
    Apparatus for drying batches of wafers 有权
    用于干燥批次的晶片的装置

    公开(公告)号：US06430841B1

    公开(公告)日：2002-08-13

    申请号：US09580825

    申请日：2000-05-26

    申请人： Jonathan Borkowski ,  Oliver David Jones ,  Kenneth C. McMahon ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    发明人： Jonathan Borkowski ,  Oliver David Jones ,  Kenneth C. McMahon ,  Scott Petersen ,  Donald Stephens ,  Yassin Mehmandoust ,  James M. Olivas

    IPC分类号： F26B2108

    CPC分类号： H01L21/67057 ,  H01L21/67034 ,  H01L21/67046 ,  H01L21/6776

    摘要： Liquid is removed from batches of substrates by apparatus and methods for drying substrates that have been wet in an elongated liquid bath. The substrates are moved relative to the bath and an elongated gas-filled volume at rates of movement selected according to the location of the batches of substrates in the bath or the volume. As an example, the substrates and the bath are separated at a controlled rate to form a thin layer of liquid on each substrate as each substrate enters the gas-filled volume. The gas-filled volume is defined by an elongated hot chamber and hot gas directed into the volume and across the substrates and out of the volume continuously transfers thermal energy to the substrates. The flow rate of the gas into the volume is related to introduction of the substrates into the bath to avoid disturbing the liquid in the bath. The thermal energy transferred to the substrates in the volume evaporates the thin layer from the substrates without decreasing the rate of separation of the substrates and the bath below the maximum rate of such separation at which a meniscus will form between the bath and the surface of one of the substrates during such separation. Relative humidity in the volume is controlled by sensing the relative humidity and regulating the speed of a fan that draws gas from the volume.

    摘要翻译： 通过用于干燥在细长液体浴中润湿的基底的装置和方法从批次的基底中除去液体。 衬底相对于浴移动，并且根据衬底批次在浴中的位置或体积选择移动速率的细长气体填充体积。 作为示例，基板和浴以受控的速率分离，以在每个基板进入气体填充体积时在每个基板上形成薄层的液体。 气体填充体积由细长的热室和引导到体积中并跨过衬底的热气体限定，并且在体积之外连续地将热能传递到衬底。 进入体积的气体的流速与将基底引入浴中以避免干扰浴中的液体有关。 在体积中转移到基底的热能从衬底中蒸发薄层，而不会降低衬底和浴的分离速率低于这种分离的最大速率，其中在浴和表面之间形成弯液面 在这种分离过程中。 通过感测相对湿度并调节从体积吸取气体的风扇的速度来控制体积中的相对湿度。

    Integrated megasonic cascade scrubber module and process
    5.
    发明授权
    Integrated megasonic cascade scrubber module and process 失效
    集成式超声波级联洗涤器模块和过程

    公开(公告)号：US07516507B1

    公开(公告)日：2009-04-14

    申请号：US10984321

    申请日：2004-11-08

    申请人： Michael Oxsen ,  Scott Petersen ,  Yassin Mehmandoust

    发明人： Michael Oxsen ,  Scott Petersen ,  Yassin Mehmandoust

    IPC分类号： B08B11/02

    CPC分类号： B08B1/04 ,  B08B3/12 ,  G11B23/505 ,  H01L21/67046

    摘要： Substrate preparation systems comprising multi-zone cascade brush scrubbers having sonic assemblies disposed between one or more of the scrubber zones for cleaning of disk-shaped substrates, including silicon wafers and disks for data storage devices, such as hard disk drives (HDD), compact discs (CD) and digital video discs (DVD). The system method combines a sonic particle dislodgement/removal assembly into a cascade brush scrubber line comprising a longi-tudinal array of brush pairs in which the substrates process through preparation zones defined by each pair of brushes, the substrates being transited longitudinally through the zones while rotating on an axis normal to their faces. Piezoelectric transducer arrays transmit sound energy to one or both face(s) of the substrate to dislodge and/or remove particles, and the scrubber simultaneously or thereafter sweeps away the particulates. The sonic energy may be ultrasonic, megasonic, or both, applied to the substrate surface(s) in alternating or sequential process steps.

    摘要翻译： 衬底制备系统包括多区级联刷洗涤器，其具有设置在一个或多个洗涤器区域之间的用于清洁盘形基底的声波组件，包括用于数据存储设备的硅晶片和盘，例如硬盘驱动器（HDD），紧凑型 光盘（CD）和数字视频光盘（DVD）。 系统方法将声波粒子移动/移除组件组合成级联刷洗涤器管线，其包括刷子对的纵向阵列，其中衬底通过由每对刷子限定的制备区域进行处理，衬底沿纵向穿过区域，而 在垂直于其脸部的轴上旋转。 压电换能器阵列将声能传递到衬底的一个或两个面，以移除和/或去除颗粒，并且洗涤器同时或此后扫除颗粒。 声波能量可以是超声波，兆声波或两者，以交替或顺序的工艺步骤施加到衬底表面。

    POST SPUTTER WASH PROCESS MODULE
    6.
    发明申请
    POST SPUTTER WASH PROCESS MODULE 审中-公开
    POST SPUTTER洗衣流程模块

    公开(公告)号：US20110030733A1

    公开(公告)日：2011-02-10

    申请号：US12139383

    申请日：2008-06-13

    申请人： Dave Frost ,  Mike Rogowski ,  Yassin Mehmandoust ,  Tom Poplawski ,  Stan Young

    发明人： Dave Frost ,  Mike Rogowski ,  Yassin Mehmandoust ,  Tom Poplawski ,  Stan Young

    IPC分类号： B08B3/10 ,  B08B13/00

    CPC分类号： H01L21/6719 ,  H01L21/67028 ,  H01L21/67051

    摘要： In one embodiment, a method for cleaning a substrate in a cleaning module is disclosed. The method includes an operation that receives the substrate into a first level of the cleaning module. In another operation, the substrate is spun while contemporaneously applying a cleaning fluid to top and bottom surfaces of the substrate. In yet another operation, the substrate is spun at a second level of the cleaning module. The method also includes an operation to dry the substrate in an enclosed cavity at a third level of the cleaning module.

    摘要翻译： 在一个实施例中，公开了一种用于清洁清洁模块中的基板的方法。 该方法包括将衬底接收到清洁模块的第一级中的操作。 在另一种操作中，将基材同时喷涂到基材的顶表面和底表面上。 在另一个操作中，衬底在清洁模块的第二级旋转。 该方法还包括在清洁模块的第三级别的封闭空腔中干燥基板的操作。

    Method for texturing a magnetic disc substrate
    7.
    发明授权
    Method for texturing a magnetic disc substrate 失效
    磁盘基板的纹理化方法

    公开(公告)号：US5167096A

    公开(公告)日：1992-12-01

    申请号：US485278

    申请日：1990-02-26

    申请人： Atef Eltoukhy ,  Yassin Mehmandoust ,  Shiro Murakami

    发明人： Atef Eltoukhy ,  Yassin Mehmandoust ,  Shiro Murakami

    IPC分类号： B24B7/16 ,  B24B37/04 ,  G11B5/84

    CPC分类号： G11B5/84 ,  B24B37/04 ,  B24B7/16 ,  Y10S977/724 ,  Y10S977/932

    摘要： Method and apparatus for texturing a substrate for use in a magnetic recording disc. A texturing pad used in the invention has inner and outer coaxial regions, with the outer region being more compressible. When the pad and a substrate are rotated about parallel, offset axes, and pressed against one another in the presence of a particle slurry, the inner, less compressible region of the pad produces a deeper-groove texturing on an inner annular surface region of the disc.

    摘要翻译： 用于纹理化用于磁记录盘的衬底的方法和装置。 本发明中使用的纹理衬垫具有内部和外部同轴区域，外部区域是更可压缩的。 当衬垫和衬底围绕平行的，偏移的轴线旋转并且在存在颗粒浆料时彼此压靠时，衬垫的内部不太可压缩的区域在衬垫的内部环形表面区域上产生更深的槽纹理 光盘。

    Texturing slurry and method
    10.
    发明授权
    Texturing slurry and method 失效
    纹理浆和方法

    公开(公告)号：US5207759A

    公开(公告)日：1993-05-04

    申请号：US763228

    申请日：1991-09-20

    申请人： Yassin Mehmandoust ,  Atef H. Eltoukhy ,  Abdoul H. Riahi-Samani

    发明人： Yassin Mehmandoust ,  Atef H. Eltoukhy ,  Abdoul H. Riahi-Samani

    IPC分类号： B24B37/04 ,  G11B5/84

    CPC分类号： B24B37/04

    摘要： A method for texturing a disc substrate, and a particle slurry for use in the method. The slurry includes two populations of different-size particles, preferably one population containing particles in a 3 micron size range, and a second population containing particles in a 1 micron size range. The particles, when used to abrade the surface of a disc, create a surface texture characterized by a low peak/peak-to-valley ratio.

    摘要翻译： 一种盘基片的纹理化方法和用于该方法的颗粒浆料。 浆料包括两个不同大小的颗粒群，优选一个含有3微米尺寸范围的颗粒的群体，以及含有1微米尺寸范围的颗粒的第二群体。 当用于研磨盘表面时，颗粒产生以峰值/峰谷比低的特征的表面纹理。