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公开(公告)号:US4637342A
公开(公告)日:1987-01-20
申请号:US705522
申请日:1985-02-26
IPC分类号: C23C16/50 , B01J3/00 , C23C14/56 , C23C16/54 , C23F4/00 , G03G5/08 , G03G5/082 , H01J37/18 , C23C13/08
摘要: A vacuum processing apparatus for applying a vacuum working process to a substrate to be processed by a plurality of processing steps comprises vacuum containers exclusively for use for processing disposed in place for each of the processing steps, and a vacuum container exclusively for use for conveyance movable between the vacuum containers exclusively for use for processing. The vacuum containers are provided with opening-closing gates which can be connected to each other. The substrate to be processed is transferably movable between the vacuum containers exclusively for use for processing and the vacuum container exclusively for use for conveyance.
摘要翻译: 一种用于通过多个处理步骤将真空加工过程施加到待加工基板的真空处理设备包括专门用于每个处理步骤所设置的处理的真空容器和专门用于可移动的输送的真空容器 在专用于加工的真空容器之间。 真空容器设置有彼此连接的开闭门。 待处理的基材可以在专门用于加工的真空容器和专门用于输送的真空容器之间转移。
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公开(公告)号:US4666734A
公开(公告)日:1987-05-19
申请号:US491799
申请日:1983-05-05
CPC分类号: C23C14/566 , C23C14/568 , C23C16/54
摘要: An apparatus and a process for mass production of films by vacuum deposition comprise a substrate charging stage which is evacuated, an interconnecting stage which is positioned adjacent to said substrate charging stage and is evacuated, and a film forming stage which is removably attached to the interconnecting stage and is evacuated independently of the interconnecting stage.
摘要翻译: 通过真空沉积大量生产膜的装置和方法包括抽真空的基板充电阶段,与所述基板充电阶段相邻并被抽真空的互连级,以及可移除地连接到互连的成膜台 并且独立于互连级排空。
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公开(公告)号:US4909183A
公开(公告)日:1990-03-20
申请号:US358510
申请日:1989-05-30
申请人: Osamu Kamiya , Yasutomo Fujiyama
发明人: Osamu Kamiya , Yasutomo Fujiyama
IPC分类号: H01L31/0248 , C23C16/455 , C23C16/509 , H01L21/205
CPC分类号: C23C16/455 , C23C16/509 , H01L21/02425 , H01L21/02532 , H01L21/0262
摘要: An apparatus for Plasma CVD process comprises a vacuum chamber in which a plural number of substrates being placed along a circle and separately from each other, and means for passing a starting gas or an evacuating gas through gaps between the adjacent substrates.
摘要翻译: 用于等离子体CVD工艺的装置包括:真空室,其中多个基板沿着圆形并且彼此分开放置,以及用于使起始气体或抽空气体通过相邻基板之间的间隙的装置。
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公开(公告)号:US4529474A
公开(公告)日:1985-07-16
申请号:US574989
申请日:1984-01-30
申请人: Yasutomo Fujiyama , Osamu Kamiya
发明人: Yasutomo Fujiyama , Osamu Kamiya
CPC分类号: C23F4/00 , C23C16/4405
摘要: A method of cleaning an apparatus for forming deposited film on a substrate to remove the substances attached to the inside walls of a reaction chamber in the course of the formation of deposited film on the substrate by etching with plasma reaction comprises using a gas mixture of carbon tetrafluoride and oxygen as etchant.
摘要翻译: 在通过用等离子体反应蚀刻在基板上形成沉积膜的过程中清洗用于在基板上形成沉积膜的装置以除去附着到反应室的内壁的物质的方法包括使用碳的气体混合物 四氟化物和氧气作为蚀刻剂。
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公开(公告)号:US4526644A
公开(公告)日:1985-07-02
申请号:US596804
申请日:1984-04-04
申请人: Yasutomo Fujiyama , Osamu Kamiya
发明人: Yasutomo Fujiyama , Osamu Kamiya
IPC分类号: C23C16/509 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号: H01J37/32477 , C23C16/5093 , H01L21/02532 , H01L21/0262 , H01L21/3065 , Y10S156/914
摘要: A treatment device utilizing plasma performs treatment by exposing a material to be treated to a plasma atmosphere formed by converting at least either one of fluorine and a fluorine compound into gas plasma, and said device comprises a structural member for forming the space for maintaining said plasma atmosphere, which is constituted of a stainless steel structure member coated on its surface exposed to said plasma atmosphere with a metal film which can difficultly form a fluoride.
摘要翻译: 利用等离子体的处理装置通过将待处理材料暴露于通过将氟和氟化合物中的至少一种转化为气体等离子体而形成的等离子体气氛进行处理,并且所述装置包括用于形成用于保持所述等离子体的空间的结构部件 气氛由其表面暴露于所述等离子体气氛的不锈钢结构构件与可能难以形成氟化物的金属膜构成。
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公开(公告)号:US4958185A
公开(公告)日:1990-09-18
申请号:US206987
申请日:1988-06-07
申请人: Osamu Kamiya , Yasutomo Fujiyama
发明人: Osamu Kamiya , Yasutomo Fujiyama
IPC分类号: G03B7/099 , G03B7/0997 , G03B7/28
CPC分类号: G03B7/099
摘要: In a photographing apparatus such as a single lens reflex camera, metering photoelectric conversion elements are provided in the optical path of an imaging optical system or a finder optical system and the line width of the pattern forming the elements is set to a width undiscernable by the human eye. Thus, with such metering photoelectric conversion elements, no irregularity of the quantity of amount is caused in the image observed through the finder or the image photographed.
摘要翻译: 在诸如单镜头反射照相机的拍摄设备中,在成像光学系统或取景器光学系统的光路中设置计量光电转换元件,并且将形成元件的图案的线宽设置为不可忽视的宽度 人类的眼睛。 因此,通过这样的计量光电转换元件,在通过取景器或所拍摄的图像观察到的图像中不会引起量的不均匀。
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公开(公告)号:US4991541A
公开(公告)日:1991-02-12
申请号:US443862
申请日:1989-11-30
申请人: Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
发明人: Hiroyuki Sugata , Masao Sugata , Noriko Kurihara , Tohru Den , Kenji Ando , Osamu Kamiya
IPC分类号: C23C14/24 , B01J4/00 , B01J12/00 , B01J12/02 , B01J19/08 , B22F1/00 , B22F1/02 , B22F9/12 , C23C16/48 , C23C16/54
CPC分类号: B01J4/001 , B01J12/00 , B01J12/02 , B22F1/0088 , B22F1/02 , B22F9/12 , C23C16/54 , B22F2999/00
摘要: A device for treating fine particles is provided which comprises a plural number of reaction chambers for providing reaction fields different from each other provided along the flow pathway on the downstream side of a nozzle which jets out fine particles in a beam. The device may be provided with a chamber for a starting material for forming fine particles. The nozzle may be a convergent-divergent nozzle.
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公开(公告)号:US4248166A
公开(公告)日:1981-02-03
申请号:US44954
申请日:1979-06-04
申请人: Osamu Kamiya
发明人: Osamu Kamiya
CPC分类号: D05B81/00
摘要: Disclosed is a sewing machine attachment which is adapted to be detachably attached, after opening a part of a machine bed, to the portion of the machine bed in the vicinity of the opened part, and to be operatively connected to a motion mechanism in the machine bed through the opened part of the machine bed. The attachment actuating mechanism includes a connection arm which is adapted to extend through the opened part of the machine bed into engagement with the motion mechanism in the machine bed, when a lock lever is moved to a position for locking the attachment to the machine bed. The connection arm is further adapted to be disengaged from the motion mechanism in the machine bed, as the lock lever is moved back to a position for releasing the attachment from the machine bed.
摘要翻译: 公开了一种缝纫机附件,其适于在将机床的一部分打开到打开部分附近的机床部分之后可拆卸地附接并且可操作地连接到机器中的运动机构 床通过机床的开放部分。 附接致动机构包括连接臂,当锁定杆移动到用于将附件锁定到机床的位置时,连接臂适于延伸通过机床的打开部分与机床中的运动机构接合。 连接臂还适于在机床中与运动机构分离,因为锁定杆被移回到用于从机床释放附件的位置。
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公开(公告)号:US4244310A
公开(公告)日:1981-01-13
申请号:US80806
申请日:1979-10-01
申请人: Toshio Sasaki , Osamu Kamiya
发明人: Toshio Sasaki , Osamu Kamiya
CPC分类号: D05B3/02
摘要: Disclosed is a zigzag sewing machine in which a trimming device for trimming the marginal edge of a work fabric is removably disposed at a predetermined position on a machine bed so that the trimming device is driven in relation to the operation of the sewing machine. The zigzag sewing machine comprises a switching device for changing the field position of the needle oscillation and an operated member for actuating the switching device in relation to the disposition of the trimming device at the predetermined position. In this zigzag sewing machine, while overedge stitching is performed by using the trimming device, the field position of the needle oscillation is set so that zigzag stitches having a desired stitch width are always placed along and over the marginal edge of the work fabric trimmed by the trimming device.
摘要翻译: 公开了一种锯齿缝纫机,其中用于修整工作织物的边缘的修剪装置可拆卸地设置在机床上的预定位置,使得修剪装置相对于缝纫机的操作被驱动。 锯齿缝纫机包括用于改变针振荡的场位置的开关装置和用于相对于修整装置在预定位置处的布置来致动切换装置的操作构件。 在这种之字形缝纫机中,通过使用修剪装置进行封边缝合时,针摆动的位置被设定为使得具有期望的针迹宽度的锯齿形针迹总是沿着工作织物的边缘边缘并且越过由 修剪装置。
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公开(公告)号:US3960441A
公开(公告)日:1976-06-01
申请号:US583969
申请日:1975-06-05
申请人: Osamu Kamiya , Susumu Itoh
发明人: Osamu Kamiya , Susumu Itoh
CPC分类号: G02B1/115
摘要: A coating for reducing unwanted reflection off a surface of a substrate. The coating is made up of an inner layer, and outer layer subsequently deposited in that order from the substrate, at least one of these layers being an inhomogeneous layer having a moderate distribution of refractive index in the direction of thickness. Desired different gradients of the refractive index distribution are effected by the superposition of sublayers of materials having a high index of refraction and a low index of refraction deposited by vacuum evaporation one upon the other and having different combinations of thicknesses thereof.
摘要翻译: 用于减少衬底表面的不希望的反射的涂层。 涂层由内层和随后从衬底依次沉积的外层组成,这些层中的至少一层是在厚度方向上具有适度的折射率分布的不均匀层。 期望的折射率分布的不同梯度通过叠加具有高折射率的折射率和通过真空蒸发沉积的低折射率并具有不同厚度的组合的材料的叠层来实现。
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