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公开(公告)号：US4958185A
公开(公告)日：1990-09-18
申请号：US206987
申请日：1988-06-07
申请人： Osamu Kamiya , Yasutomo Fujiyama
发明人： Osamu Kamiya , Yasutomo Fujiyama
IPC分类号： G03B7/099 , G03B7/0997 , G03B7/28
CPC分类号： G03B7/099
摘要： In a photographing apparatus such as a single lens reflex camera, metering photoelectric conversion elements are provided in the optical path of an imaging optical system or a finder optical system and the line width of the pattern forming the elements is set to a width undiscernable by the human eye. Thus, with such metering photoelectric conversion elements, no irregularity of the quantity of amount is caused in the image observed through the finder or the image photographed.
摘要翻译： 在诸如单镜头反射照相机的拍摄设备中，在成像光学系统或取景器光学系统的光路中设置计量光电转换元件，并且将形成元件的图案的线宽设置为不可忽视的宽度 人类的眼睛。 因此，通过这样的计量光电转换元件，在通过取景器或所拍摄的图像观察到的图像中不会引起量的不均匀。
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公开(公告)号：US4637342A
公开(公告)日：1987-01-20
申请号：US705522
申请日：1985-02-26
IPC分类号： C23C16/50 , B01J3/00 , C23C14/56 , C23C16/54 , C23F4/00 , G03G5/08 , G03G5/082 , H01J37/18 , C23C13/08
摘要： A vacuum processing apparatus for applying a vacuum working process to a substrate to be processed by a plurality of processing steps comprises vacuum containers exclusively for use for processing disposed in place for each of the processing steps, and a vacuum container exclusively for use for conveyance movable between the vacuum containers exclusively for use for processing. The vacuum containers are provided with opening-closing gates which can be connected to each other. The substrate to be processed is transferably movable between the vacuum containers exclusively for use for processing and the vacuum container exclusively for use for conveyance.
摘要翻译： 一种用于通过多个处理步骤将真空加工过程施加到待加工基板的真空处理设备包括专门用于每个处理步骤所设置的处理的真空容器和专门用于可移动的输送的真空容器 在专用于加工的真空容器之间。 真空容器设置有彼此连接的开闭门。 待处理的基材可以在专门用于加工的真空容器和专门用于输送的真空容器之间转移。
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公开(公告)号：US4526644A
公开(公告)日：1985-07-02
申请号：US596804
申请日：1984-04-04
申请人： Yasutomo Fujiyama , Osamu Kamiya
发明人： Yasutomo Fujiyama , Osamu Kamiya
IPC分类号： C23C16/509 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/306 , B44C1/22 , C03C15/00 , C03C25/06
CPC分类号： H01J37/32477 , C23C16/5093 , H01L21/02532 , H01L21/0262 , H01L21/3065 , Y10S156/914
摘要： A treatment device utilizing plasma performs treatment by exposing a material to be treated to a plasma atmosphere formed by converting at least either one of fluorine and a fluorine compound into gas plasma, and said device comprises a structural member for forming the space for maintaining said plasma atmosphere, which is constituted of a stainless steel structure member coated on its surface exposed to said plasma atmosphere with a metal film which can difficultly form a fluoride.
摘要翻译： 利用等离子体的处理装置通过将待处理材料暴露于通过将氟和氟化合物中的至少一种转化为气体等离子体而形成的等离子体气氛进行处理，并且所述装置包括用于形成用于保持所述等离子体的空间的结构部件 气氛由其表面暴露于所述等离子体气氛的不锈钢结构构件与可能难以形成氟化物的金属膜构成。
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公开(公告)号：US4666734A
公开(公告)日：1987-05-19
申请号：US491799
申请日：1983-05-05
CPC分类号： C23C14/566 , C23C14/568 , C23C16/54
摘要： An apparatus and a process for mass production of films by vacuum deposition comprise a substrate charging stage which is evacuated, an interconnecting stage which is positioned adjacent to said substrate charging stage and is evacuated, and a film forming stage which is removably attached to the interconnecting stage and is evacuated independently of the interconnecting stage.
摘要翻译： 通过真空沉积大量生产膜的装置和方法包括抽真空的基板充电阶段，与所述基板充电阶段相邻并被抽真空的互连级，以及可移除地连接到互连的成膜台 并且独立于互连级排空。
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公开(公告)号：US4909183A
公开(公告)日：1990-03-20
申请号：US358510
申请日：1989-05-30
申请人： Osamu Kamiya , Yasutomo Fujiyama
发明人： Osamu Kamiya , Yasutomo Fujiyama
IPC分类号： H01L31/0248 , C23C16/455 , C23C16/509 , H01L21/205
CPC分类号： C23C16/455 , C23C16/509 , H01L21/02425 , H01L21/02532 , H01L21/0262
摘要： An apparatus for Plasma CVD process comprises a vacuum chamber in which a plural number of substrates being placed along a circle and separately from each other, and means for passing a starting gas or an evacuating gas through gaps between the adjacent substrates.
摘要翻译： 用于等离子体CVD工艺的装置包括：真空室，其中多个基板沿着圆形并且彼此分开放置，以及用于使起始气体或抽空气体通过相邻基板之间的间隙的装置。
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公开(公告)号：US4529474A
公开(公告)日：1985-07-16
申请号：US574989
申请日：1984-01-30
申请人： Yasutomo Fujiyama , Osamu Kamiya
发明人： Yasutomo Fujiyama , Osamu Kamiya
CPC分类号： C23F4/00 , C23C16/4405
摘要： A method of cleaning an apparatus for forming deposited film on a substrate to remove the substances attached to the inside walls of a reaction chamber in the course of the formation of deposited film on the substrate by etching with plasma reaction comprises using a gas mixture of carbon tetrafluoride and oxygen as etchant.
摘要翻译： 在通过用等离子体反应蚀刻在基板上形成沉积膜的过程中清洗用于在基板上形成沉积膜的装置以除去附着到反应室的内壁的物质的方法包括使用碳的气体混合物 四氟化物和氧气作为蚀刻剂。
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公开(公告)号：US4599971A
公开(公告)日：1986-07-15
申请号：US731334
申请日：1985-05-06
申请人： Yasutomo Fujiyama , Shotaro Okabe
发明人： Yasutomo Fujiyama , Shotaro Okabe
IPC分类号： C23C16/50 , C23C16/505 , G03G5/08 , G03G5/082 , H01J37/32 , H01L21/205 , H01L31/0248
CPC分类号： H01J37/32082 , C23C16/505
摘要： In a vapor deposition film forming apparatus having a plurality of reactors each having a substrate and an electrode oppositely arranged in a vacuum chamber and means for applying a voltage thereacross to react or decompose reaction gas introduced into the vacuum chamber, the reactors are arranged on a circumference of a circle and coaxial cables having substantially equal impedance radially extend to the reactors from a matching circuit located at the center of the circle.
摘要翻译： 在具有多个反应器的蒸镀膜形成装置中，每个反应器具有基板和相对布置在真空室中的电极，以及用于在其间施加电压以反应或分解引入真空室的反应气体的装置，反应器设置在 圆周和具有基本相同阻抗的同轴电缆径向延伸到位于圆心中心的匹配电路的电抗器。
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8.发明授权Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process 失效具有分层微波窗的装置用于微波等离子体化学气相沉积工艺
公开(公告)号：US5038712A
公开(公告)日：1991-08-13
申请号：US449054
申请日：1989-12-18
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
IPC分类号： C23C16/511 , G03G5/082 , H01J37/32
CPC分类号： H01J37/32238 , C23C16/511 , G03G5/082 , H01J37/32192 , H01J37/32284
摘要： An improved apparatus for the formation of a functional deposited film using a microwave plasma chemical vapor deposition process characterized in that a microwave transmissible dielectric material is used for the microwave introducing window, and the window has a structure wherein the dielectric material is divided into blocks of the same or different dielectric materials having a specific inductive capacity of more than 1.0. In this way it is possible to adjust not only the resonant frequency characteristics but also the electromagnetic resonant mode of the window to resonate with the microwave oscillation frequency so as to enhance microwave transmission.
摘要翻译： 一种用于使用微波等离子体化学气相沉积工艺形成功能沉积膜的改进装置，其特征在于微波可传导电介质材料用于微波引入窗口，并且窗口具有这样的结构，其中介电材料被分成 相同或不同的介电材料具有大于1.0的电感率。 以这种方式，不仅可以调节谐振频率特性，而且可以调节窗口的电磁谐振模式以与微波振荡频率谐振，从而增强微波传输。
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9.发明授权Method for treating surface of construction material for vacuum apparatus, and the material treated thereby and vacuum treatment apparatus having the treated material 失效用于处理真空装置的建筑材料的表面的方法，以及由此处理的材料和具有处理过的材料的真空处理装置
公开(公告)号：US4732792A
公开(公告)日：1988-03-22
申请号：US783478
申请日：1985-10-03
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
摘要： The surface of an element of a vacuum apparatus is coated with a film formed by a flame spraying method.
摘要翻译： 真空装置的元件的表面涂覆有通过火焰喷涂法形成的膜。
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公开(公告)号：US4633812A
公开(公告)日：1987-01-06
申请号：US699870
申请日：1985-02-08
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
IPC分类号： H01L21/302 , C23C16/44 , C23C16/509 , H01J37/32 , H01L21/205 , C23C13/08
CPC分类号： H01J37/32467 , C23C16/4401 , C23C16/5093 , H01J37/32504 , Y10S156/914 , Y10S156/917
摘要： An improvement in a vacuum plasma treating apparatus having a reaction chamber partly formed of electric insulating material subject to corrosion by a fluorine or chlorine containing gas plasma, which improvement being that the electric insulating material subject to corrosion comprises a sintered ceramic material containing alumina as a primary ingredient.
摘要翻译： 一种真空等离子体处理装置的改进，其具有部分地由受含氟或含氯气体等离子体腐蚀的电绝缘材料形成的反应室，这是因为受到腐蚀的电绝缘材料的改进包括含有氧化铝作为 主要成分。
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