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    Single substrate processing CVD procedure for depositing a metal film using first and second CVD processes in first and second process chambers
    2.
    发明授权
    Single substrate processing CVD procedure for depositing a metal film using first and second CVD processes in first and second process chambers 有权
    用于在第一和第二处理室中使用第一和第二CVD工艺沉积金属膜的单衬底处理CVD程序

    公开(公告)号：US06387444B1

    公开(公告)日：2002-05-14

    申请号：US09511698

    申请日：2000-02-23

    申请人： Osamu Okada ,  Atsushi Sekiguchi

    发明人： Osamu Okada ,  Atsushi Sekiguchi

    IPC分类号： C23C1606

    CPC分类号： C23C16/18 ,  C23C16/54

    摘要： In the field of depositing a metal film for wiring purposes on a substrate by means of single-substrate processing CVD, a procedure for depositing a copper film on a substrate is carried out by utilizing a first CVD module in which film deposition is carried out under first film deposition conditions where the film deposition rate is low and the filling characteristics are good, and a second CVD module in which film deposition is carried out under second film deposition conditions where the film deposition rate is high and the filling characteristics are poor. One CVD film deposition process in which a metal film for wiring purposes is deposited is carried out with sub-processes based on two different sets of film deposition conditions.

    摘要翻译： 在通过单基板处理CVD在衬底上沉积用于配线的金属膜的领域中，通过利用其中进行膜沉积的第一CVD模块来进行在衬底上沉积铜膜的步骤 成膜速度低，填充特性良好的第一膜沉积条件以及在成膜速度高，填充特性差的第二膜沉积条件下进行成膜的第二CVD模块。 用于布线目的的金属膜沉积的一个CVD膜沉积工艺是基于两组不同的膜沉积条件的子工艺进行的。

    Method of depositing titanium nitride thin film and CVD deposition apparatus
    5.
    发明授权
    Method of depositing titanium nitride thin film and CVD deposition apparatus 失效
    沉积氮化钛薄膜和CVD沉积设备的方法

    公开(公告)号：US6080446A

    公开(公告)日：2000-06-27

    申请号：US63274

    申请日：1998-04-21

    申请人： Ryoki Tobe ,  Yasuaki Tanaka ,  Atsushi Sekiguchi ,  Hitoshi Jimba ,  So Won Kim

    发明人： Ryoki Tobe ,  Yasuaki Tanaka ,  Atsushi Sekiguchi ,  Hitoshi Jimba ,  So Won Kim

    IPC分类号： C23C16/34 ,  C23C16/44 ,  C23C16/455 ,  H01L21/285 ,  C23C16/00

    CPC分类号： C23C16/45565 ,  C23C16/34 ,  C23C16/45502 ,  C23C16/45561 ,  C23C16/45576 ,  H01L21/28568

    摘要： A method for fabricating a titanium nitride thin film in a reaction vessel on a surface of a substrate heated to a prescribed temperature, includes the steps of mixing tetrakis(dialkylamino)titanium (TDAAT) and a first carrier gas to create a first mixed gas; feeding the first mixed gas into the reaction vessel through a first set of nozzles; mixing an added gas reactive with the tetrakis(dialkylamino)titanium with a second carrier gas to create a second mixed gas; feeding the second mixed gas into the reaction vessel through a second set of nozzles; while controlling the flow rates of the TDAAT, added gas, firt and second carrier gases; and depositing a titanium nitride thin film by the first mixed gas and the second mixed gas while confining the pressure inside the reaction vessel to a range of 0.1-15 Pa.

    摘要翻译： 在加热到规定温度的基板的表面上的反应容器中制造氮化钛薄膜的方法，包括将四（二烷基氨基）钛（TDAAT）和第一载气混合以产生第一混合气体的步骤; 通过第一组喷嘴将第一混合气体进料到反应容器中; 将与四（二烷基氨基）钛反应的添加气体与第二载气混合以产生第二混合气体; 通过第二组喷嘴将第二混合气体进料到反应容器中; 同时控制TDAAT，添加气体，细丝和第二载气的流速; 以及通过第一混合气体和第二混合气体沉积氮化钛薄膜，同时将反应容器内的压力限制在0.1-15Pa的范围内。

    Titanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gas
    6.
    发明授权
    Titanium nitride film-MOCVD method incorporating use of tetrakisdialkylaminotitanium as a source gas 失效
    氮化钛膜-MOCVD方法结合使用四氮杂烷基氨基钛作为源气体

    公开(公告)号：US5672385A

    公开(公告)日：1997-09-30

    申请号：US611678

    申请日：1996-03-06

    申请人： Hitoshi Jimba ,  So Won Kim ,  Atsushi Sekiguchi

    发明人： Hitoshi Jimba ,  So Won Kim ,  Atsushi Sekiguchi

    IPC分类号： C01B21/076 ,  C23C16/34 ,  C30B29/28 ,  H01L21/285 ,  H01L21/31 ,  H01L21/318 ,  C23C16/18

    CPC分类号： C23C16/34

    摘要： The present invention provides a method of depositing a titanium nitride thin film with good coverage even in a hole with a high aspect ratio by using tetrakisdialkylaminotitanium. In this method, a raw material gas of tetrakisdialkylaminotitanium is introduced into a reactor through a raw material gas introduction system. When the raw material gas is supplied to a substrate which is previously heated by a holder temperature control mechanism, predetermined thermally chemical reaction takes place to deposit a thin film consisting of titanium nitride as a main component. The pressure in the reactor is controlled by an exhaust system so as to be maintained at a predetermined value in the range of about 0.1 to 15 Pa.

    摘要翻译： 本发明提供一种通过使用四烷基氨基钛，即使在具有高纵横比的孔中沉积具有良好覆盖率的氮化钛薄膜的方法。 在该方法中，通过原料气体导入系统将四烷基氨基钛的原料气体引入反应器。 当原料气体被供给到由保持器温度控制机构预先加热的基板时，发生预定的热化学反应以沉积由氮化钛组成的薄膜作为主要成分。 反应器中的压力由排气系统控制，以便保持在约0.1至15Pa的范围内的预定值。

    Hologram and method of and apparatus for producing the same
    7.
    发明授权
    Hologram and method of and apparatus for producing the same 失效

    公开(公告)号：US5660954A

    公开(公告)日：1997-08-26

    申请号：US370179

    申请日：1995-01-09

    申请人： Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

    发明人： Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

    IPC分类号： G03H1/02 ,  G03H1/18 ,  G03H1/20 ,  G03H1/04 ,  G03H1/00

    CPC分类号： G03H1/202 ,  G03H1/0256 ,  G03H1/18 ,  G03H1/0248 ,  G03H1/0252 ,  G03H2223/25 ,  G03H2227/04 ,  G03H2240/55 ,  G03H2250/10 ,  G03H2250/12 ,  G03H2250/32

    摘要： A duplicating photosensitive material film is brought into close contact with an ND glass reduced in thickness so as to become flexible or a flexible sheet or an ND glass coated with a cushioning layer through an optical contacting liquid containing a surface active agent. In addition, a spacer is interposed between a hologram original plate and a duplicating photosensitive material, and a space defined by the spacer is filled with an optical contacting liquid, thereby regulating the thickness of the optical contacting liquid layer with the spacer. Therefore, when pressure is applied, the optical contacting liquid is uniformly pressed, so that it can be made uniform and thin in thickness. Accordingly, it is possible to prevent a failure of duplication of a hologram image due to undesirable flow of the optical contacting liquid. In addition, the wettability of the optical contacting liquid improves, so that it is possible to prevent trapping of air and foaming and to make the optical contacting liquid uniform and thin in thickness. Thus, it becomes possible to duplicate a hologram image excellently. In addition, a cushioning layer is provided on the inner side of an AR coated ND glass or on the upper side of a photosensitive material film, and another cushioning layer is provided on the side of an original plate protecting glass which is closer to the optical contacting liquid or on the lower side of the photosensitive material film. With this arrangement, even if dust enters, it can be effectively held inside the cushioning layers. Thus, it is possible to prevent undesirable flow of the optical contacting liquid and lifting of the film due to dust and hence possible to perform duplication effectively without any hindrance. Also disclosed is a hologram producing apparatus which includes mechanisms for feeding and taking up a duplicating photosensitive material film, and a contacting liquid dropping mechanism. The apparatus further includes a mechanism for nipping an excess of contacting liquid dropped, a mechanism for drying the contacting liquid attached to the exposed duplicating photosensitive material film, a mechanism for positioning the film, etc.

    Hologram and method of and apparatus for producing the same
    9.
    发明授权
    Hologram and method of and apparatus for producing the same 失效
    全息图及其制造方法和装置

    公开(公告)号：US5453338A

    公开(公告)日：1995-09-26

    申请号：US39854

    申请日：1993-03-30

    申请人： Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

    发明人： Kazuhiro Suga ,  Atsushi Sekiguchi ,  Kenji Ueda ,  Hiroyuki Nishimura

    IPC分类号： G03H1/02 ,  G03H1/18 ,  G03H1/20 ,  G03H1/04 ,  G03H1/00

    CPC分类号： G03H1/202 ,  G03H1/0256 ,  G03H1/18 ,  G03H1/0248 ,  G03H1/0252 ,  G03H2223/25 ,  G03H2227/04 ,  G03H2240/55 ,  G03H2250/10 ,  G03H2250/12 ,  G03H2250/32

    摘要： A duplicating photosensitive material film is placed into close contact with a thin flexible ND glass or an ND glass coated with a cushioning layer through an optical contacting liquid containing a surface active agent. A spacer is interposed between a hologram original plate and the duplication photosensitive material, and the space defined by the spacer is filled with an optical contacting liquid, the spacer thereby regulating the thickness of the optical contacting liquid layer. In addition, a cushioning layer is provided on the inner side of an AR coated ND glass or on the upper side of the photosensitive material film, and another cushioning layer is provided on the side of an original plate protecting glass of the hologram original plate which is closer to the optical contacting liquid or on the lower side of the photosensitive material film. With this arrangement, even if dust enters, it can be effectively held inside the cushioning layers. Thus, it is possible to prevent undesirable flow of the optical contacting liquid and lifting of the film due to dust and hence possible to perform duplication effectively without any hindrance.

    摘要翻译： 将复制的感光材料膜通过含有表面活性剂的光学接触液体与薄的柔性ND玻璃或涂有缓冲层的ND玻璃紧密接触。 在全息图原版和复制感光材料之间插入间隔物，并且由间隔物限定的空间填充有光学接触液体，间隔物由此调节光学接触液体层的厚度。 此外，在AR涂覆的ND玻璃的内侧或感光材料膜的上侧上设置缓冲层，在全息原版的原版保护玻璃的侧面设置另一缓冲层， 更靠近光学接触液体或感光材料膜的下侧。 通过这种布置，即使灰尘进入，也可以有效地保持在缓冲层内。 因此，可以防止光学接触液体的不期望的流动和由于灰尘而导致的膜的提升，从而可能在没有任何障碍的情况下有效地进行重复。