Abstract:
An RAMO4 substrate that includes an RAMO4 monocrystalline substrate formed of a single crystal represented by general formula RAMO4, wherein R represents one or more trivalent elements selected from the group consisting of Sc, In, Y, and lanthanoid elements, A represents one or more trivalent elements selected from the group consisting of Fe(III), Ga, and Al, and M represents one or more divalent elements selected from the group consisting of Mg, Mn, Fe(II), Co, Cu, Zn, and Cd. The RAMO4 monocrystalline substrate has a principal surface with a plurality of grooves. The principal surface has an off-angle θ with respect to a cleaving surface of the single crystal. The RAMO4 monocrystalline substrate satisfies tan θ≤Wy/Wx, where Wx is the width at the top surface of a raised portion between the grooves, and Wy is the height of the raised portion.
Abstract:
A method and apparatus for producing a Group III nitride in which the thermal decomposition of the nitrogen element-containing gas is suppressed to enhance the productivity. The method for producing a Group III nitride crystal, comprising: reacting an oxide or a metal of a Group III element under a heated atmosphere to form a compound gas of the Group III element; mixing a nitrogen element-containing gas at a temperature that is lower than that of the compound gas, with the compound gas; and reacting the nitrogen element-containing gas with the compound gas to form a Group III nitride crystal.
Abstract:
A light emitting device includes a light source and a waveguide structure. The light source emits light having a directionality. The waveguide structure includes an optical waveguide and an exterior part. The optical waveguide has an incident end surface and an emission end surface, converts a wavelength of the light incident from the incident end surface, and emits the light from the emission end surface. The exterior part is optically transparent and covers the optical waveguide such that the incident end surface and the emission end surface are exposed from the exterior part. The optical waveguide is elongated in a length direction. The length direction of the optical waveguide is inclined at a predetermined angle with respect to an optical axis of the light in a predetermined plane including the length direction of the optical waveguide and the optical axis of the light. The predetermined angle is set to allow the light to propagate in the optical waveguide with total internal reflection at a boundary surface between the optical waveguide and the exterior part.
Abstract:
Apparatus and method for producing a Group III nitride crystal are to be provided. The apparatus for producing a Group III nitride crystal, contains: a chamber; a nitrogen element-containing gas supplying port for supplying a nitrogen element-containing gas to the chamber; a compound gas supplying port for supplying a compound gas of the Group III element to the chamber, so as to mix the compound gas with the nitrogen element-containing gas; a discharging port for discharging the compound gas and the nitrogen element-containing gas thus mixed, outside the chamber; a holder for holding a seed substrate at a position that is on a downstream side of a mixing point of the compound gas and the nitrogen element-containing gas and is an upstream side of the discharging port; a first heater for heating the seed substrate; and a second heater for heating a space between the mixing point and the seed substrate to a temperature that is higher than a temperature heated by the first heater.
Abstract:
A light emitting device includes a light source that emits light having a directivity from a light emitting surface of the light source, a waveguide structure that includes an optical waveguide having an inlet facing the light emitting surface, and a peripheral wall protruding from the inlet toward the light emitting surface, and a lens that is provided between the light emitting surface and the inlet. The peripheral wall has an inner surface surrounding the inlet. The peripheral wall has a first opening closer to the light emitting surface and a second opening closer to the inlet. The first opening is larger than the second opening. The peripheral wall includes a narrow opening portion in which an internal space of the peripheral wall is smaller than the lens when viewed from a direction of an optical axis of the light. The inner surface of the peripheral wall includes an inclined surface that inclines so that the internal space becomes narrower as approaching the inlet, at least in the narrow opening portion. The lens is disposed in contact with the narrow opening portion in the internal space of the peripheral wall.
Abstract:
A method for producing a Group III nitride crystal including preparing an RAMgO4 substrate containing a single crystal represented by the general formula RAMgO4 (wherein R represents one or a plurality of trivalent elements selected from the group consisting of Sc, In, Y, and a lanthanoid element, and A represents one or a plurality of trivalent elements selected from the group consisting of Fe(III), Ga, and Al); and growing a Group III nitride crystal containing Mg on the RAMgO4 substrate.
Abstract:
A method for producing a Group III nitride crystal, includes: preparing an RAMO4 substrate containing a single crystal represented by the general formula RAMO4 (wherein R represents one or a plurality of trivalent elements selected from a group consisting of Sc, In, Y, and a lanthanoid element, A represents one or a plurality of trivalent elements selected from a group consisting of Fe(III), Ga, and Al, and M represents one or a plurality of divalent elements selected from a group consisting of Mg, Mn, Fe(II), Co, Cu, Zn, and Cd) and having a notch on a side portion thereof; growing a Group III nitride crystal on the RAMO4 substrate; and cleaving the RAMO4 substrate from the notch.
Abstract:
A RAMO4 substrate includes a single crystal represented by a formula of RAMO4 (in the formula, R indicates one or a plurality of trivalent elements selected from a group consisting of Sc, In, Y, and a lanthanoid element, A indicates one or a plurality of trivalent elements selected from a group consisting of Fe(III), Ga, and Al, and M indicates one or a plurality of bivalent elements selected from a group consisting of Mg, Mn, Fe(II), Co, Cu, Zn, and Cd). An epitaxially-grown surface is provided on at least one surface of the RAMO4 substrate. An unevenness having a height of 500 nm or more is not provided on the epitaxially-grown surface.
Abstract:
Light-emitting device (1) includes waveguide structure (5) and exterior part (4). Waveguide structure (5) includes light receiving surface (51) including incident end surface (31) and first surface (41), and radiation surface (52) including emission end surface (32) and second surface (42). A position of waveguide structure (5) with respect to light source (2) is determined to cause light (L1) to be incident on light receiving surface (51). Incident range (R) on which light (L1) is incident on light receiving surface (51) includes at least a part of incident end surface (31) and at least a part of first surface (41) such that a part of light (L1) is incident on incident end surface (31) and another part of light (L1) is incident on first surface (41), passes through exterior part (4), and is emitted from second surface (42).
Abstract:
A Group III nitride substrate contains a base material part of a Group III nitride having a front surface and a back surface, the front surface of the base material part and the back surface of the base material part having different Mg concentrations from each other.