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公开(公告)号：US08248617B2
公开(公告)日：2012-08-21
申请号：US12427079
申请日：2009-04-21
IPC分类号： G01B11/02
CPC分类号： G01B9/02084 , G01B9/02057 , G01B9/0209 , G01B2290/70 , G01N21/95607 , G03F7/70633 , Y10T29/49004
摘要： In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.
摘要翻译： 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。
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2.发明申请DATA INTERPOLATION METHODS FOR METROLOGY OF SURFACES, FILMS AND UNDERRESOLVED STRUCTURES 审中-公开表面，薄膜和底层结构体系的数据插值方法公开(公告)号：US20120089365A1
公开(公告)日：2012-04-12
申请号：US13267408
申请日：2011-10-06
CPC分类号： G01B11/2441 , G01B9/02011 , G01B9/02029 , G01B9/0203 , G01B9/02043 , G01B9/02083 , G01B9/0209 , G01B11/0675 , G01B2210/56 , G01B2290/70
摘要： A method includes fitting a function to a subset of reflectivity data comprising values for the reflectivity of a test object for different wavelengths, different scattering angles, and/or different polarization states; determining values for the function at certain wavelengths and scattering angles and/or polarization states; and determining information about the test object based on the determined values.
摘要翻译： 一种方法包括将功能拟合到包括不同波长，不同散射角和/或不同极化状态的测试对象的反射率的值的反射率数据子集; 确定在某些波长和散射角度和/或偏振状态下的功能的值; 以及基于所确定的值来确定关于所述测试对象的信息。
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公开(公告)号：US20110032535A1
公开(公告)日：2011-02-10
申请号：US12535357
申请日：2009-08-04
IPC分类号： G01B11/02
CPC分类号： G01B9/02043 , G01B9/02057 , G01B9/02083 , G01B9/0209 , G01B2290/70 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
摘要翻译： 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。
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公开(公告)号：US20090262362A1
公开(公告)日：2009-10-22
申请号：US12427079
申请日：2009-04-21
CPC分类号： G01B9/02084 , G01B9/02057 , G01B9/0209 , G01B2290/70 , G01N21/95607 , G03F7/70633 , Y10T29/49004
摘要： In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.
摘要翻译： 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。
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公开(公告)号：US08189202B2
公开(公告)日：2012-05-29
申请号：US12535357
申请日：2009-08-04
IPC分类号： G01B11/02
CPC分类号： G01B9/02043 , G01B9/02057 , G01B9/02083 , G01B9/0209 , G01B2290/70 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Systems are disclosed that include an interferometer configured to direct test light to an overlay test pad and subsequently combine it with reference light, the test and reference light being derived from a common source, one or more optics configured to direct at least a portion of the combined light to a multi-element detector so that different regions of the detector correspond to different illumination angles of the overlay test pad by the test light, the detector being configured to produce an interference signal based on the combined light, and an electronic processor in communication with the multi-element detector. The overlay test pad comprises a first patterned structure and a second patterned structure and the electronic processor is configured to determine information about the relative alignment between the first and second patterned structures based on the interference signal.
摘要翻译： 公开了一种系统，其包括被配置为将测试光引导到覆盖测试焊盘并随后将其与参考光组合的干涉仪，测试和参考光源自公共源，一个或多个光学器件被配置为引导至少一部分 将光组合到多元件检测器，使得检测器的不同区域对应于测试光的覆盖测试垫的不同照明角度，检测器被配置为基于组合的光产生干涉信号，以及电子处理器 与多元素检测器通信。 覆盖测试焊盘包括第一图案化结构和第二图案化结构，并且电子处理器被配置为基于干扰信号来确定关于第一和第二图案化结构之间的相对对准的信息。
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公开(公告)号：US07978338B2
公开(公告)日：2011-07-12
申请号：US12541325
申请日：2009-08-14
IPC分类号： G01B11/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.
摘要翻译： 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。
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公开(公告)号：US20100128276A1
公开(公告)日：2010-05-27
申请号：US12541325
申请日：2009-08-14
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.
摘要翻译： 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。
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8.发明授权公开(公告)号：US08379218B2
公开(公告)日：2013-02-19
申请号：US12551308
申请日：2009-08-31
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system, that includes a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between a first portion and a second portion of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the first and second portions of the light to provide output light, a detector configured to detect the output light from the interferometric sensor, a fiber waveguide configured to direct light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity in a path of the light from the sensor light source and the interferometric sensor, and an electronic controller in communication with the detector, the electronic controller being configured to determine information related to the OPD based on the detected output light.
摘要翻译： 装置包括显微镜，其包括物镜和用于相对于物镜定位测试对象的台，该台可相对于物镜移动;以及传感器系统，其包括传感器光源，干涉测量传感器，其被配置为从 所述传感器光源在所述光的第一部分和所述第二部分之间引入光程差（OPD），所述OPD与所述物镜与所述台之间的距离有关，并且将所述第一和第二部分 提供输出光的光，被配置为检测来自干涉测量传感器的输出光的检测器，配置成在传感器光源，干涉测量传感器和检测器之间引导光的光纤波导，在光的路径中的可调光学腔 来自传感器光源和干涉测量传感器以及与检测器通信的电子控制器，该电子控制器是共同的 根据检测到的输出光确定与OPD相关的信息。
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公开(公告)号：US08004688B2
公开(公告)日：2011-08-23
申请号：US12509098
申请日：2009-07-24
IPC分类号： G01B11/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.
摘要翻译： 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描台，被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的所述干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。
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公开(公告)号：US20100128280A1
公开(公告)日：2010-05-27
申请号：US12509098
申请日：2009-07-24
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.
摘要翻译： 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描级，其被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。
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