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公开(公告)号：US20100128276A1
公开(公告)日：2010-05-27
申请号：US12541325
申请日：2009-08-14
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.
摘要翻译： 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。
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公开(公告)号：US07978338B2
公开(公告)日：2011-07-12
申请号：US12541325
申请日：2009-08-14
IPC分类号： G01B11/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Interferometry system are disclosed that include a detector sub-system including a monitor detector, interferometer optics for combining test light from a test object with primary reference light from a first reference interface and secondary reference light from a second reference interface to form a monitor interference pattern on a monitor detector, wherein the first and second reference interfaces are mechanically fixed with respect to each other and the test light, a scanning stage configured to scan an optical path difference (OPD) between the test light and the primary and secondary reference light to the monitor detector while the detector sub-system records the monitor interference pattern for each of a series of OPD increments, and an electronic processor electronically coupled to the detector sub-system and the scanning stage, the electronic processor being configured to determine information about the OPD increments based on the detected monitor interference pattern.
摘要翻译： 公开了一种干涉测量系统，其包括检测器子系统，该检测器子系统包括监视器检测器，用于将来自测试对象的测试光与来自第一参考接口的主要参考光组合的来自第二参考接口的第二参考光组合的干涉仪光学元件，以形成监视器干涉图案 在监视器检测器上，其中所述第一参考接口和所述第二参考接口相对于彼此和所述测试光机械地固定;扫描台，被配置为扫描所述测试光和所述主参考光与所述次参考光之间的光程差（OPD） 监视器检测器，同时检测器子系统记录用于一系列OPD增量中的每一个的监视器干涉图案，以及电子处理器，电子耦合到检测器子系统和扫描级，电子处理器被配置为确定关于 OPD根据检测到的监视器干扰模式递增。
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3.发明授权公开(公告)号：US08379218B2
公开(公告)日：2013-02-19
申请号：US12551308
申请日：2009-08-31
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system, that includes a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between a first portion and a second portion of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the first and second portions of the light to provide output light, a detector configured to detect the output light from the interferometric sensor, a fiber waveguide configured to direct light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity in a path of the light from the sensor light source and the interferometric sensor, and an electronic controller in communication with the detector, the electronic controller being configured to determine information related to the OPD based on the detected output light.
摘要翻译： 装置包括显微镜，其包括物镜和用于相对于物镜定位测试对象的台，该台可相对于物镜移动;以及传感器系统，其包括传感器光源，干涉测量传感器，其被配置为从 所述传感器光源在所述光的第一部分和所述第二部分之间引入光程差（OPD），所述OPD与所述物镜与所述台之间的距离有关，并且将所述第一和第二部分 提供输出光的光，被配置为检测来自干涉测量传感器的输出光的检测器，配置成在传感器光源，干涉测量传感器和检测器之间引导光的光纤波导，在光的路径中的可调光学腔 来自传感器光源和干涉测量传感器以及与检测器通信的电子控制器，该电子控制器是共同的 根据检测到的输出光确定与OPD相关的信息。
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公开(公告)号：US08004688B2
公开(公告)日：2011-08-23
申请号：US12509098
申请日：2009-07-24
IPC分类号： G01B11/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： In general, in one aspect, the invention features apparatus that includes a broadband scanning interferometry system including interferometer optics for combining test light from a test object with reference light from a reference object to form an interference pattern on a detector, wherein the test and reference light are derived from a common light source. The interferometry system further includes a scanning stage configured to scan an optical path difference (OPD) between the test and reference light from the common source to the detector and a detector system including the detector for recording the interference pattern for each of a series of OPD increments, wherein the frequency of each OPD increment defines a frame rate. The interferometer optics are configured to produce at least two monitor interferometry signals each indicative of changes in the OPD as the OPD is scanned, wherein the detector system is further configured to record the monitor interferometry signals. The apparatus also includes an electronic processor electronically coupled to the detection system and scanning stage and configured to determine information about the OPD increments with sensitivity to perturbations to the OPD increments at frequencies greater than the frame rate.
摘要翻译： 一般来说，一方面，本发明的特征在于，包括宽带扫描干涉测量系统的装置，其包括用于将来自测试对象的测试光与来自参考物体的参考光组合在一起的干涉仪光学元件，以在检测器上形成干涉图案，其中测试和参考 光源自普通光源。 所述干涉测量系统还包括扫描台，被配置为扫描来自所述公共源的所述测试参考光与所述检测器之间的光程差（OPD）;以及检测器系统，包括用于记录一系列OPD中的每一个的所述干涉图案的检测器 增量，其中每个OPD增量的频率定义帧速率。 干涉仪光学器件被配置为产生至少两个监视器干涉测量信号，每个监视器干涉测量信号指示当OPD被扫描时OPD的变化，其中检测器系统还被配置为记录监视器干涉测量信号。 该装置还包括电子处理器，其电耦合到检测系统和扫描级，并且被配置为以大于帧速率的频率灵敏地确定对OPD增量的扰动的OPD增量的信息。
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5.发明申请公开(公告)号：US20100128278A1
公开(公告)日：2010-05-27
申请号：US12551308
申请日：2009-08-31
IPC分类号： G01B9/02
CPC分类号： G01B9/0209 , G01B9/02007 , G01B9/0201 , G01B9/02027 , G01B9/02039 , G01B9/02057 , G01B9/02068 , G01B9/02077 , G01B11/2441 , G01B2290/45 , G01B2290/70 , Y10T29/49002
摘要： Apparatus include a microscope including an objective and a stage for positioning a test object relative to the objective, the stage being moveable with respect to the objective, and a sensor system, that includes a sensor light source, an interferometric sensor configured to receive light from the sensor light source, to introduce an optical path difference (OPD) between a first portion and a second portion of the light, the OPD being related to a distance between the objective lens and the stage, and to combine the first and second portions of the light to provide output light, a detector configured to detect the output light from the interferometric sensor, a fiber waveguide configured to direct light between the sensor light source, the interferometric sensor and the detector, a tunable optical cavity in a path of the light from the sensor light source and the interferometric sensor, and an electronic controller in communication with the detector, the electronic controller being configured to determine information related to the OPD based on the detected output light.
摘要翻译： 装置包括显微镜，其包括物镜和用于相对于物镜定位测试对象的台，该台可相对于物镜移动;以及传感器系统，其包括传感器光源，被配置为从 所述传感器光源在所述光的第一部分和所述第二部分之间引入光程差（OPD），所述OPD与所述物镜与所述台之间的距离有关，并且将所述第一和第二部分 提供输出光的光，被配置为检测来自干涉测量传感器的输出光的检测器，配置成在传感器光源，干涉测量传感器和检测器之间引导光的光纤波导，在光的路径中的可调光学腔 来自传感器光源和干涉测量传感器以及与检测器通信的电子控制器，该电子控制器是共同的 根据检测到的输出光确定与OPD相关的信息。
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公开(公告)号：US06195168B1
公开(公告)日：2001-02-27
申请号：US09514215
申请日：2000-02-25
IPC分类号： G01B0902
CPC分类号： G01B9/02039 , G01B9/02024 , G01B9/02082 , G01B9/0209 , G01B11/2441
摘要： The invention features an interferometry system for a measuring a surface profile or thickness of a measurement object. In one aspect, the interferometry system includes: a broadband infrared source which during operation generates broadband infrared radiation including central wavelengths greater than about 1 micron; a scanning interferometer which during operation directs a first infrared wavefront along a reference path and a second infrared wavefront along a measurement path contacting the measurement object, and, after the second wavefront contacts the measurement object, combines the wavefronts to produce an optical interference pattern, the first and second infrared wavefronts being derived from the broadband infrared radiation; a detector producing data in response to the optical interference pattern; and a controller which during operation causes the scanning interferometer to vary the optical path difference between the reference and measurement paths over a range larger than the coherence length of the broadband source and analyzes the data as a function of the varying optical path difference to determine the surface profile.
摘要翻译： 本发明的特征在于用于测量测量对象的表面轮廓或厚度的干涉测量系统。 在一个方面，干涉测量系统包括：宽带红外光源，其在操作期间产生包括大于约1微米的中心波长的宽带红外辐射; 扫描干涉仪，其在操作期间沿着参考路径引导第一红外波前沿，并沿着与所述测量对象接触的测量路径引导第二红外波前，并且在所述第二波前接触所述测量对象之后，组合所述波前以产生光学干涉图案， 第一和第二红外波前是从宽带红外辐射得到的; 响应于光学干涉图案产生数据的检测器; 以及控制器，其在操作期间使得扫描干涉仪在大于宽带源的相干长度的范围上改变参考和测量路径之间的光程差，并且根据变化的光程差分析数据以确定 表面轮廓。
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7.发明授权Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum 有权用于确定物体相对于基准的绝对位置和表面轮廓的高度扫描干涉仪公开(公告)号：US06597460B2
公开(公告)日：2003-07-22
申请号：US09769891
申请日：2001-01-25
IPC分类号： G01B902
CPC分类号： G01B11/30 , G01B9/02058 , G01B9/02078 , G01B9/02083 , G01B9/0209
摘要： The invention features a surface profiling method including: collecting interferometric data related to a surface profile of a measurement object; and calculating the surface profile based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object. The invention also features a surface profiling system including: an interferometry system which during operation provides interferometric data related to a surface profile of a measurement object; and an electronic processor coupled the interferometry system, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and at least one parameter indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.
摘要翻译： 本发明的特征在于一种表面分析方法，包括：收集与测量对象的表面轮廓相关的干涉测量数据; 以及基于所收集的干涉测量数据和指示测量对象的成型表面的反射相位变化（PCOR）中的色散的至少一个值来计算表面轮廓。 本发明还具有表面分布系统，其包括：干涉测量系统，其在操作期间提供与测量对象的表面轮廓相关的干涉测量数据; 以及耦合所述干涉测量系统的电子处理器，其中在操作期间，所述电子处理器基于所述干涉测量数据和指示所述测量对象的成型表面的反射相位变化（PCOR）上的色散的至少一个参数来计算所述表面轮廓。
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公开(公告)号：US08248617B2
公开(公告)日：2012-08-21
申请号：US12427079
申请日：2009-04-21
IPC分类号： G01B11/02
CPC分类号： G01B9/02084 , G01B9/02057 , G01B9/0209 , G01B2290/70 , G01N21/95607 , G03F7/70633 , Y10T29/49004
摘要： In general, in a first aspect, the invention features a system including an interferometer configured to direct test light to an overlay target and subsequently combine it with reference light to form an interference pattern, the test and reference light being derived from a common source, a multi-element detector, one or more optics to image the overlay target on the multi-element detector; and an electronic processor in communication with the multi-element detector. The overlay target includes a first pattern and a second pattern and the electronic processor is configured to determine information about the relative alignment between the first and second patterns.
摘要翻译： 通常，在第一方面，本发明的特征在于一种包括干涉仪的系统，该干涉仪被配置为将测试光引导到覆盖目标，并随后将其与参考光组合以形成干涉图案，测试和参考光源自公共源， 多元素检测器，用于对多元件检测器上的覆盖目标进行成像的一个或多个光学元件; 以及与多元件检测器通信的电子处理器。 覆盖目标包括第一图案和第二图案，并且电子处理器被配置为确定关于第一图案和第二图案之间的相对对准的信息。
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公开(公告)号：US07978337B2
公开(公告)日：2011-07-12
申请号：US12267077
申请日：2008-11-07
CPC分类号： G02B21/0004
摘要： In one aspect, the disclosure features methods that include using a microscope to direct light to a test object and to direct the light reflected from the test object to a detector, where the light includes components having orthogonal polarization states, varying an optical path length difference (OPD) between the components of the light, acquiring an interference signal from the detector while varying the OPD between the components, and determining information about the test object based on the acquired interference signal.
摘要翻译： 在一个方面，本发明的特征在于包括使用显微镜将光引导到测试对象并将从测试对象反射的光引导到检测器的方法，其中光包括具有正交偏振态的分量，改变光路长度差 （OPD），在改变组件之间的OPD的同时获取来自检测器的干扰信号，并且基于所获取的干扰信号确定关于测试对象的信息。
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10.发明授权Interferometer and method for measuring characteristics of optically unresolved surface features 有权用于测量光学未解析表面特征的干涉仪和方法公开(公告)号：US07948636B2
公开(公告)日：2011-05-24
申请号：US12701690
申请日：2010-02-08
IPC分类号： G01B11/02
CPC分类号： G01B11/0675 , G01B9/02057 , G01B9/02084 , G01B9/02088 , G01B9/0209 , G01B2290/50 , G01B2290/70 , G01N21/8422 , G03F7/70625
摘要： Disclosed is an interferometry analysis method that includes comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object to information corresponding to multiple models of the test object, wherein the multiple models are parametrized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature based on the comparison.
摘要翻译： 公开了一种干涉测量分析方法，其包括将可对应于测试对象的不同表面位置的多个干涉测量信号的信息与对应于测试对象的多个模型的信息进行比较，其中多个模型由一系列特征参数化 或更多的未解决的测试对象的横向特征; 并基于该比较输出关于未解决的表面特征的信息。
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