摘要:
A compound comprising Formula I, or a mixture thereof, Rf—OCFHCF2O—[CH2CH2O]x—[C3H7O]y-A Formula I wherein Rf is CnF2n+1, n is 1 to about 6, x is a mixture of positive integers and is 4 or greater, y is 0 to about 4, provided that the ratio of y to x is equal to or less than 0.25, A is RfOCHFCF2 or CmH2m+1, and m is 1 to about 24 and its use in lowering surface tension and imparting improved surface effects is disclosed.
摘要翻译:包含式I或其混合物的化合物Rf-OCFHCF 2 O - [CH 2 CH 2 O] x - [C 3 H 7 O] y A式I其中R f为C n F 2n + 1,n为1至约6,x为正整数的混合物,为4 或更大,y为0至约4,条件是y与x的比例等于或小于0.25,A为RfOCHFCF2或CmH2m + 1,m为1至约24,并且其用于降低表面张力和赋予 公开了改善的表面效果。
摘要:
A compound comprising Formula I, or a mixture thereof, Rf—OCFHCF2O—[CH2CH2O]x—[C3H7O]y-A Formula I wherein Rf is CnF2n+1, n is 1 to about 6, x is a mixture of positive integers and is 4 or greater, y is 0 to about 4, provided that the ratio of y to x is equal to or less than 0.25, A is RfOCHFCF2 or CmH2m+1, and m is 0 to about 24 and its use in lowering surface tension and imparting improved surface effects is disclosed.
摘要翻译:包含式I或其混合物的化合物<?在线公式描述=“在线式”末端=“铅”→Rf-OCFHCF 2 O- [CH 2 CH 2 O] x - [C 3 H 7 O] y A式I < in-line-formula description =“In-line Formulas”end =“tail”?>其中Rf为CnF2n + 1,n为1至约6,x为正整数的混合物,为4或更大,y为0 至约4,条件是y与x的比例等于或小于0.25,A为RfOCHFCF2或CmH2m + 1,m为0至约24,并且其用于降低表面张力并赋予改善的表面效果。
摘要:
A compound comprising Formula I, or a mixture thereof, wherein Y is a bond or CmH2m−p(OA)p wherein m is 0 to 4, and p is 0 or 1, X′ is X or H, X is CH2CH2OA, CH(CH2OA)2, C(CH2OA)3, or X and X′ combine to form (CH2CH2)2NCH2CH2OA or (CH2CH2)2O, provided that when X and X′ combine to form (CH2CH2)2O then Y is CH2CH(OA)CH2, A is CF2CFHO—Rf or H, Rf is CnF2n+1 wherein n is an integer of 1 to about 6, M is a cation having a charge equal to a, and a is a positive integer equal to 1 or 2, provided that at least one of X, X′, or Y contains A equal to CF2CFHO—Rf, and its use in lowering surface tension and imparting improved surface effects.
摘要翻译:包含式I或其混合物的化合物,其中Y是键或C m H 2 m-p(OA)p p其中m 为0〜4,p为0或1,X'为X或H,X为CH 2 CH 2 OA,CH(CH 2) C(CH 2 OA)3,或X和X'结合形成(CH 2)2, 2/2个2或2个或2个或更多个(CH 2)2 其中X和X'组合形成(CH 2 CH 2 CH 2)2 O, )2 O,则Y是CH 2 CH(OA)CH 2,A是CF 2 CO 2 -OR 2 或H,R f是C n H 2n + 1,其中n是1至约的整数 如图6所示,M是电荷等于a的阳离子,a是等于1或2的正整数,条件是X,X'或Y中的至少一个包含等于CF 2 CFHO-R f的A, / SUB>,其用于降低表面张力并赋予改善的表面效果。
摘要:
The present invention relates to compositions comprising at least one fluoroolefin and an effective amount of stabilizer that may be an epoxide, fluorinated epoxide or oxetane, or a mixture thereof with other stabilizers. The stabilized compositions may be useful in cooling apparatus, such as refrigeration, air-conditioning, chillers, and heat pumps, as well as in applications as foam blowing agents, solvents, aerosol propellants, fire extinguishants, and sterilants.
摘要:
The present invention relates to compositions comprising at least one fluoroolefin and an effective amount of stabilizer that may be a terpene, terpenoid or fullerene; or a mixture of a terpene, terpenoid or fullerene with other stabilizers. The stabilized compositions may be useful in cooling apparatus, such as refrigeration, air-conditioning, chillers, and heat pumps, as well as in applications as foam blowing agents, solvents, aerosol propellants, fire extinguishants, and sterilants.
摘要:
The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
摘要:
Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic and at least one ethylenically unsaturated compound contains at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer comprising a repeat unit derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group selected from the group consisting of fluorine atom, perfluoroalkyl group, and perfluoroalkoxy group, characterized in that the at least one atom or group is covalently attached to a carbon atom which is contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom. The photoresists have high transparency in the extreme/far UV as well as the near UV, high plasma etch resistance, and are useful for microlithography in the extreme, far, and near ultraviolet (UV) region, particularly at wavelengths ≦365 nm. Novel fluorine-containing copolymers are also disclosed.
摘要:
Disclosed herein are partially fluorinated (co)polymers containing sulfonic acid or sulfonate salt groups, processes for making those polymers, and intermediates for those (co)polymers. The (co)polymers are useful as ion-exchange resins and (in the sulfonic acid form) acid catalysts.
摘要:
Disclosed herein is a process in which fluorine containing olefins are polymerized using an initiation system which is a combination of a fluoroaliphatic sulfinate or sulfinic acid and chlorate, bromate or hypochlorite ions. The resulting polymer contains fewer deleterious end groups and is more stable and/or easier to process. The polymers produced are useful as thermoplastics and elastomers.
摘要:
Aromatic compounds containing an .alpha.-fluoroalkyl or .alpha.,.alpha.-difluoroalkyl side chain are prepared by reacting selected aromatic compounds with a mixture of HF and a metal oxide which is PbO.sub.2 or NiO.sub.2 at -30.degree. to +80.degree. C. Exemplary is the conversion of 4-nitrotoluene to 4-(fluoromethyl)nitrobenzene and 4-(difluoromethyl)nitrobenzene.