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    Lithographic apparatus and device manufacturing method
    5.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号：US08654311B2

    公开(公告)日：2014-02-18

    申请号：US12419819

    申请日：2009-04-07

    申请人： Harry Sewell ,  Jozef Petrus Henricus Benschop

    发明人： Harry Sewell ,  Jozef Petrus Henricus Benschop

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70283 ,  G03F7/70208

    摘要： A lithographic apparatus and method for simultaneously exposing two patterning devices onto a substrate is disclosed. In an embodiment, a lithographic apparatus includes a plurality of illumination systems for receiving and conditioning a pulsed radiation beam, a beam director arranged between a source of the pulsed radiation and the illumination systems for alternately directing pulses of the radiation beam to the respective illumination systems, a support table for holding a plurality of patterning devices, each of the patterning devices being capable of imparting a respective conditioned radiation beam with a pattern in its cross-section to form a plurality of patterned radiation beams, and a projection system configured to project each of the plurality of patterned radiation beams coincidentally onto a target portion of a substrate. In an embodiment, the substrate is covered with a phase change material.

    摘要翻译： 公开了一种用于将两个图案形成装置同时曝光到基板上的光刻设备和方法。 在一个实施例中，光刻设备包括用于接收和调理脉冲辐射束的多个照明系统，布置在脉冲辐射源和用于将辐射束的脉冲交替地指向各个照明系统的照明系统之间的光束导向器 ，用于保持多个图案形成装置的支撑台，每个图案形成装置能够在其横截面中赋予具有图案的各个经调节的辐射束以形成多个图案化的辐射束，以及投影系统，其被配置为投影 多个图案化的辐射束中的每一个巧合地放置在基板的目标部分上。 在一个实施例中，衬底被相变材料覆盖。

    Dual stage lithographic apparatus and device manufacturing method
    6.
    再颁专利
    Dual stage lithographic apparatus and device manufacturing method 有权
    双级光刻设备和器件制造方法

    公开(公告)号：USRE43576E1

    公开(公告)日：2012-08-14

    申请号：US12318821

    申请日：2009-01-08

    申请人： Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erik Roelof Loopstra

    发明人： Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erik Roelof Loopstra

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

    CPC分类号： G03F7/70733 ,  G03F7/70341

    摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

    摘要翻译： 本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。 联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间 由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。

    Dual stage lithographic apparatus and device manufacturing method
    7.
    发明授权
    Dual stage lithographic apparatus and device manufacturing method 有权
    双级光刻设备和器件制造方法

    公开(公告)号：US07161659B2

    公开(公告)日：2007-01-09

    申请号：US11135655

    申请日：2005-05-24

    申请人： Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erik Roelof Loopstra

    发明人： Marinus Aart Van Den Brink ,  Jozef Petrus Henricus Benschop ,  Erik Roelof Loopstra

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

    CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/70725

    摘要： The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.

    摘要翻译： 本发明涉及一种双级光刻设备，其中构造和布置两个基板台以进行相互配合以进行联合扫描运动。 联合扫描运动使平版印刷设备从第一配置中获得，其中将浸没液体限制在由第一级保持的第一基板和设备的投影系统之间，其中浸没液体被限制在第二配置之间 由两级的第二级保持的第二衬底和投影系统，使得在联合扫描运动期间，液体基本上被限制在相对于投影系统的空间内。

    Level sensor, lithographic apparatus, and substrate surface positioning method
    9.
    发明授权
    Level sensor, lithographic apparatus, and substrate surface positioning method 有权
    液位传感器，光刻设备和基板表面定位方法

    公开(公告)号：US08675210B2

    公开(公告)日：2014-03-18

    申请号：US13603168

    申请日：2012-09-04

    申请人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    发明人： Arie Jeffrey Den Boef ,  Jozef Petrus Henricus Benschop ,  Ralph Brinkhof ,  Willem Jurrianus Venema ,  Lukasz Jerzy Macht ,  Laurent Khuat Duy ,  Dimitra Sarri

    IPC分类号： G01B11/14

    CPC分类号： G03F9/7034 ,  G01B11/0625 ,  G03F9/7088

    摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.

    摘要翻译： 用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束 被分为测量辐射束和捕获辐射束。 液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。 检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。