Embedded vertical inductor in laminate stacked substrates

    公开(公告)号:US11817239B2

    公开(公告)日:2023-11-14

    申请号:US16210594

    申请日:2018-12-05

    Abstract: A vertical inductor structure includes a first laminate substrate forming a first portion of the vertical inductor structure and a second laminate substrate forming a second portion. Each laminate substrate includes a plurality of first traces embedded in a layer of the laminate substrate, a plurality of first vertical columns, and a plurality of second vertical columns. Each first vertical columns is coupled to a first end of a respective first trace, and each second vertical column is coupled to a second end of a respective first trace. The second laminate substrate is mounted on the first laminate substrate such that each first vertical column of the first laminate substrate is coupled to a respective first vertical column of the second laminate substrate, and each second vertical column of the first laminate substrate is coupled to a respective second vertical column of the second laminate substrate.

    Wire bond inductor structures for flip chip dies

    公开(公告)号:US11239158B1

    公开(公告)日:2022-02-01

    申请号:US17066154

    申请日:2020-10-08

    Abstract: An integrated circuit (IC) package comprising a first die, including an active layer opposite a backside surface of the first die supporting a plurality of backside pads is provided. The IC package also incorporates a package substrate coupled to the active layer. The package pads on the package substrate correspond to the plurality of backside pads. A passive device comprising a plurality of wire bonds is coupled to the plurality of backside pads and the plurality of package pads. The passive device may also comprise a plurality of wire bonds coupled to the package pads by through silicon vias (TSVs). Multiple dies may be coupled with die-to-die wire bonds coupled to backside pads on each die.

    Capacitance fine tuning by fin capacitor design

    公开(公告)号:US11515247B2

    公开(公告)日:2022-11-29

    申请号:US17149006

    申请日:2021-01-14

    Abstract: A device includes a main capacitor composed of a first plate of a first back-end-of-line (BEOL) metallization layer, a main insulator layer on the first plate, and a second plate on the main insulator layer. The second plate is composed of a second BEOL metallization layer. The device includes a first tuning capacitor of a first portion of a first BEOL interconnect trace coupled to the first plate of the main capacitor through first BEOL sideline traces. The first tuning capacitor is composed of a first insulator layer on a surface and sidewalls of the first portion of the first BEOL interconnect trace. The first tuning capacitor includes a second BEOL interconnect trace on a surface and sidewalls of the first insulator layer. The device includes a first via capture pad coupled to the second BEOL interconnect trace of the first tuning capacitor.

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