公开(公告)号：US20060103033A1

公开(公告)日：2006-05-18

申请号：US10986179

申请日：2004-11-12

申请人： Richard Johannes Van Haren ,  Arie Den Boef ,  Jacobus Burghoorn ,  Maurits Van Der Schaar ,  Bartolomeus Rijpers

发明人： Richard Johannes Van Haren ,  Arie Den Boef ,  Jacobus Burghoorn ,  Maurits Van Der Schaar ,  Bartolomeus Rijpers

IPC分类号： H01L23/544

CPC分类号： H01L23/544 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7076 ,  G03F9/7092 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.

公开(公告)号：US20070222960A1

公开(公告)日：2007-09-27

申请号：US11384836

申请日：2006-03-21

申请人： Maurits Van Der Schaar ,  Arie Den Boef ,  Richard Johannes Van Haren ,  Everhardus Mos

发明人： Maurits Van Der Schaar ,  Arie Den Boef ,  Richard Johannes Van Haren ,  Everhardus Mos

IPC分类号： G03B27/54

CPC分类号： G03F7/70433 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084

摘要： In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.

摘要翻译： 在其中将图案从图案形成装置转印到基板上的装置制造方法和光刻设备中，在能够使用第一波长的辐射执行基板测量的处理中，在基板上提供测量目标。 随后，将测量目标变换为导电材料的栅格，栅格具有比第一波长小的栅格开口。 测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。

公开(公告)号：US20060139592A1

公开(公告)日：2006-06-29

申请号：US11269881

申请日：2005-11-09

申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Mircea Dusa ,  Antoine Kiers ,  Maurits Van Der Schaar

发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Mircea Dusa ,  Antoine Kiers ,  Maurits Van Der Schaar

IPC分类号： G03B27/42

CPC分类号： G03F9/708 ,  G03F7/70633 ,  G03F7/70675 ,  G03F7/70991 ,  G03F9/7084

摘要： An apparatus and method for improved latent overlay metrology is disclosed. In an embodiment, a scatterometer and an overexposed overlay target are used to obtain more robust overlay measurement. Overlay metrology and exposure may be done in parallel.

摘要翻译： 公开了一种用于改进潜重叠计量的装置和方法。 在一个实施例中，使用散射仪和曝光过度的覆盖目标来获得更坚固的覆盖测量。 叠加计量和曝光可以并行进行。

公开(公告)号：US20070003840A1

公开(公告)日：2007-01-04

申请号：US11170747

申请日：2005-06-30

申请人： Maurits Van Der Schaar ,  Arie Den Boef ,  Mircea Dusa ,  Antoine Marie Kiers

发明人： Maurits Van Der Schaar ,  Arie Den Boef ,  Mircea Dusa ,  Antoine Marie Kiers

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： G03F7/70641 ,  G03F7/70683

摘要： One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings and using a scatterometer, e.g. off-line, to measure a property of the target markers that is indicative of focus.

摘要翻译： 通过在不同焦点设置下打印多个目标标记并使用散射仪，例如，用于在设备制造方法中使用的一个或多个焦点设置来确定。 离线，以测量指示焦点的目标标记的属性。

公开(公告)号：US07084955B2

公开(公告)日：2006-08-01

申请号：US10803104

申请日：2004-03-18

申请人： Cheng-Qun Gui ,  Henricus Van Buel ,  Maurits Van Der Schaar ,  Arie Den Boef

发明人： Cheng-Qun Gui ,  Henricus Van Buel ,  Maurits Van Der Schaar ,  Arie Den Boef

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70216 ,  G03F9/7084

摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.

公开(公告)号：US20060279718A1

公开(公告)日：2006-12-14

申请号：US11441348

申请日：2006-05-26

申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

IPC分类号： G03B27/52

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

公开(公告)号：US20070279742A1

公开(公告)日：2007-12-06

申请号：US11802257

申请日：2007-05-21

申请人： Reinder Plug ,  Arie Den Boef ,  Karel Van Der Mast

发明人： Reinder Plug ,  Arie Den Boef ,  Karel Van Der Mast

IPC分类号： G02B27/64

CPC分类号： G03F7/70758 ,  G03F7/70766

摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.

摘要翻译： 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括基架，构造和布置成保持基板的基板台，构造和布置成测量基板的参数的传感器，构造成将基板台或传感器相对于彼此移位的位移系统 第一方向，平衡块和轴承，其构造成可移动地支撑所述第一平衡块，以便在与所述第一方向相反的方向上基本上自由地平移，以抵消所述第一平衡块中的所述基板台或传感器在所述第一方向 方向。

公开(公告)号：US20070132979A1

公开(公告)日：2007-06-14

申请号：US11482122

申请日：2006-07-07

申请人： Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

发明人： Joeri Lof ,  Erik Maria Bijlaart ,  Roelof Aeilko Ritsema ,  Frank Schaik ,  Timotheus Sengers ,  Klaus Simon ,  Joannes De Smit ,  Arie Den Boef ,  Hans Butler ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Marcus Van De Kerkhof ,  Aleksey Kolesnychenko ,  Mark Kroon ,  Erik Loopstra ,  Hendricus Maria Meijer ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Joost Ottens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Santen

IPC分类号： G03B27/72

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20060256324A1

公开(公告)日：2006-11-16

申请号：US11125322

申请日：2005-05-10

申请人： Arie Den Boef ,  Mircea Dusa

发明人： Arie Den Boef ,  Mircea Dusa

IPC分类号： G01N21/88

CPC分类号： G01N21/956 ,  G01N21/4788

摘要： An inspection apparatus, comprising; an illumination system configured to provide an illumination beam for irradiating a target; a first detection system configured to detect radiation scattered from the target in a non-zero order diffraction direction; and the detection system comprises a dispersive element for dispersion of the radiation scattered from the target in the non-zero order diffraction direction and a radiation sensitive device constructed and arranged to measure the intensity of the radiation dispersed by the dispersive element.

摘要翻译： 一种检查装置，包括： 照明系统，被配置为提供用于照射目标的照明光束; 第一检测系统，被配置为检测在非零级衍射方向上从所述目标物散射的辐射; 并且所述检测系统包括用于在非零次衍射方向上从所述目标物散射的辐射分散的色散元件和构造和布置成测量由所述色散元件分散的辐射的强度的辐射敏感器件。

公开(公告)号：US20070229785A1

公开(公告)日：2007-10-04

申请号：US11390416

申请日：2006-03-28

申请人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

发明人： Arie Den Boef ,  Everhardus Mos ,  Maurits Schaar ,  Stefan Carolus Keij

IPC分类号： G03B27/68

CPC分类号： G03B27/42 ,  G03F7/70633

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one reference grating having line elements in a second, perpendicular, direction. A measurement set of gratings is provided on top of the reference set of gratings, the measurement set comprising three measurement gratings similar to the reference gratings. Two of the measurement gratings are oppositely biased in the second direction relative to the respective reference gratings. An overlay measurement device is provided to measure asymmetry of the three gratings in the reference set and the measurement set, and to derive from the measured asymmetry the overlay in both the first and second direction.

摘要翻译： 布置成将图案从图案形成装置转印到衬底上的光刻设备包括设置在衬底中的参考光栅组，该参考组包括在第一方向上具有线元件的两个参考光栅和在第二方向上具有线元件的一个参考光栅 ，垂直，方向。 光栅的测量组提供在参考光栅组的顶部，测量组包括与参考光栅相似的三个测量光栅。 两个测量光栅相对于各个参考光栅在第二方向上相反地偏置。 提供覆盖测量装置以测量参考组和测量组中的三个光栅的不对称性，并且从第一和第二方向上的测量的不对称性导出覆盖。