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1.发明授权公开(公告)号：US07645494B2
公开(公告)日：2010-01-12
申请号：US12056798
申请日：2008-03-27
申请人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard R. Malen , Prabhat Kumar , John Shields , Robert Desberg
发明人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard R. Malen , Prabhat Kumar , John Shields , Robert Desberg
CPC分类号： C23C2/02 , C23C4/02 , C23C26/00 , C23C28/321 , C23C28/322 , C23C28/345 , C25D5/34 , C25D5/54 , H05K1/056 , Y10T428/12625 , Y10T428/12736 , Y10T428/24132 , Y10T428/249927 , Y10T428/30 , Y10T428/31678
摘要： The invention relates to a method that involves (a) removing graphite from at least one surface of a metal graphite composite material; (b) chemically cleaning or plasma etching the surface of the metal graphite composite material; (c) applying a metal-containing material to the surface of the chemically cleaned or plasma etched metal graphite composite material, and thereby forming an intermediate layer; (d) applying a metal coating on the intermediate layer, and thereby forming a composite material. The invention also relates to a composite material comprising (a) a metal graphite composite substrate having at least one surface that is substantially free of graphite; (b) a metal-containing intermediate layer located on a surface of the substrate; and (c) a metal coating on the intermediate layer.
摘要翻译： 本发明涉及一种方法，涉及（a）从金属石墨复合材料的至少一个表面去除石墨; （b）化学清洗或等离子体蚀刻金属石墨复合材料的表面; （c）将金属含有材料施加到化学清洁或等离子体蚀刻的金属石墨复合材料的表面上，从而形成中间层; （d）在中间层上涂覆金属涂层，从而形成复合材料。 本发明还涉及一种复合材料，其包括（a）具有至少一个基本上不含石墨的表面的金属石墨复合基材; （b）位于所述基板的表面上的含金属的中间层; 和（c）中间层上的金属涂层。
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2.发明申请公开(公告)号：US20080176005A1
公开(公告)日：2008-07-24
申请号：US12056798
申请日：2008-03-27
申请人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
发明人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
CPC分类号： C23C2/02 , C23C4/02 , C23C26/00 , C23C28/321 , C23C28/322 , C23C28/345 , C25D5/34 , C25D5/54 , H05K1/056 , Y10T428/12625 , Y10T428/12736 , Y10T428/24132 , Y10T428/249927 , Y10T428/30 , Y10T428/31678
摘要： The invention relates to a method that involves (a) removing graphite from at least one surface of a metal graphite composite material; (b) chemically cleaning or plasma etching the surface of the metal graphite composite material; (c) applying a metal-containing material to the surface of the chemically cleaned or plasma etched metal graphite composite material, and thereby forming an intermediate layer; (d) applying a metal coating on the intermediate layer, and thereby forming a composite material. The invention also relates to a composite material comprising (a) a metal graphite composite substrate having at least one surface that is substantially free of graphite; (b) a metal-containing intermediate layer located on a surface of the substrate; and (c) a metal coating on the intermediate layer.
摘要翻译： 本发明涉及一种方法，涉及（a）从金属石墨复合材料的至少一个表面去除石墨; （b）化学清洗或等离子体蚀刻金属石墨复合材料的表面; （c）将金属含有材料施加到化学清洁或等离子体蚀刻的金属石墨复合材料的表面上，从而形成中间层; （d）在中间层上涂覆金属涂层，从而形成复合材料。 本发明还涉及一种复合材料，其包括（a）具有至少一个基本上不含石墨的表面的金属石墨复合基材; （b）位于所述基板的表面上的含金属的中间层; 和（c）中间层上的金属涂层。
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3.发明申请公开(公告)号：US20060234055A1
公开(公告)日：2006-10-19
申请号：US10542945
申请日：2004-01-14
申请人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
发明人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
CPC分类号： C23C2/02 , C23C4/02 , C23C26/00 , C23C28/321 , C23C28/322 , C23C28/345 , C25D5/34 , C25D5/54 , H05K1/056 , Y10T428/12625 , Y10T428/12736 , Y10T428/24132 , Y10T428/249927 , Y10T428/30 , Y10T428/31678
摘要： The invention relates to a method that involves (a) removing graphite from at least one surface of a metal graphite composite material; (b) chemically cleaning or plasma etching the surface of the metal graphite composite material; (c) applying a metal-containing material to the surface of the chemically cleaned or plasma etched metal graphite composite material, and thereby forming an intermediate layer; (d) applying a metal coating on the intermediate layer, and thereby forming a composite material. The invention also relates to a composite material comprising (a) a metal graphite composite substrate having at least one surface that is substantially free of graphite; (b) a metal-containing intermediate layer located on a surface of the substrate; and (c) a metal coating on the intermediate layer.
摘要翻译： 本发明涉及一种方法，涉及（a）从金属石墨复合材料的至少一个表面去除石墨; （b）化学清洗或等离子体蚀刻金属石墨复合材料的表面; （c）将金属含有材料施加到化学清洁或等离子体蚀刻的金属石墨复合材料的表面上，从而形成中间层; （d）在中间层上涂覆金属涂层，从而形成复合材料。 本发明还涉及一种复合材料，其包括（a）具有至少一个基本上不含石墨的表面的金属石墨复合基材; （b）位于所述基板的表面上的含金属的中间层; 和（c）中间层上的金属涂层。
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4.发明授权公开(公告)号：US07368176B2
公开(公告)日：2008-05-06
申请号：US10542945
申请日：2004-01-14
申请人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
发明人： Richard Wu , James Cornie , Stephen Cornie , Hank Breit , Larry Ballard , Richard Malen , Prabhat Kumar , John Shields , Robert Desberg
CPC分类号： C23C2/02 , C23C4/02 , C23C26/00 , C23C28/321 , C23C28/322 , C23C28/345 , C25D5/34 , C25D5/54 , H05K1/056 , Y10T428/12625 , Y10T428/12736 , Y10T428/24132 , Y10T428/249927 , Y10T428/30 , Y10T428/31678
摘要： The invention relates to a method that involves (a) removing graphite from at least one surface of a metal graphite composite material; (b) chemically cleaning or plasma etching the surface of the metal graphite composite material; (c) applying a metal-containing material to the surface of the chemically cleaned or plasma etched metal graphite composite material, and thereby forming an intermediate layer; (d) applying a metal coating on the intermediate layer, and thereby forming a composite material. The invention also relates to a composite material comprising (a) a metal graphite composite substrate having at least one surface that is substantially free of graphite; (b) a metal-containing intermediate layer located on a surface of the substrate; and (c) a metal coating on the intermediate layer.
摘要翻译： 本发明涉及一种方法，涉及（a）从金属石墨复合材料的至少一个表面去除石墨; （b）化学清洗或等离子体蚀刻金属石墨复合材料的表面; （c）将金属含有材料施加到化学清洁或等离子体蚀刻的金属石墨复合材料的表面上，从而形成中间层; （d）在中间层上涂覆金属涂层，从而形成复合材料。 本发明还涉及一种复合材料，其包括（a）具有至少一个基本上不含石墨的表面的金属石墨复合基材; （b）位于所述基板的表面上的含金属的中间层; 和（c）中间层上的金属涂层。
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公开(公告)号：US20080314737A1
公开(公告)日：2008-12-25
申请号：US12090919
申请日：2006-10-16
申请人： Mark Gaydos , Prabhat Kumar , Steven A. Miller , Norman G. Mills , Gary Rozak , John Shields , Rong-Chein Richard Wu
发明人： Mark Gaydos , Prabhat Kumar , Steven A. Miller , Norman G. Mills , Gary Rozak , John Shields , Rong-Chein Richard Wu
IPC分类号： C23C14/00
CPC分类号： C23C14/3414 , B22F3/15 , B22F2998/00 , B22F2998/10 , C22C1/045 , B22F5/006 , B22F1/0003 , B22F3/02 , B22F3/1208 , B22F3/04
摘要： Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
摘要翻译： 提供钼钛溅射靶。 在一个方面，靶基本上不含β（Ti，Mo）合金相。 另一方面，靶基本上由单相β（Ti，Mo）合金组成。 在这两个方面，溅射中的颗粒发射减少。 还提供了制备目标的方法，将靶标结合在一起以产生大面积溅射靶的方法，以及由靶产生的膜。
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公开(公告)号：US20070089984A1
公开(公告)日：2007-04-26
申请号：US11255018
申请日：2005-10-20
申请人： Mark Gaydos , Prabhat Kumar , Steve Miller , Norman Mills , Gary Rozak , John Shields , Rong-Chein Wu
发明人： Mark Gaydos , Prabhat Kumar , Steve Miller , Norman Mills , Gary Rozak , John Shields , Rong-Chein Wu
CPC分类号： C23C14/3414 , B22F3/15 , B22F2998/00 , B22F2998/10 , C22C1/045 , B22F5/006 , B22F1/0003 , B22F3/02 , B22F3/1208 , B22F3/04
摘要： Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
摘要翻译： 提供钼钛溅射靶。 在一个方面，靶基本上不含β（Ti，Mo）合金相。 另一方面，靶基本上由单相β（Ti，Mo）合金组成。 在这两个方面，溅射中的颗粒发射减少。 还提供了制备目标的方法，将靶标结合在一起以产生大面积溅射靶的方法，以及由靶产生的膜。
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公开(公告)号：US09926623B2
公开(公告)日：2018-03-27
申请号：US15061566
申请日：2016-03-04
申请人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
发明人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwartz
IPC分类号： C23C14/34 , B22F3/16 , C22C1/04 , C22C27/04 , C23C14/35 , C23C14/46 , B22F1/00 , B22F5/00 , C21D8/02 , C22F1/18 , C23C14/14 , B22F3/24
CPC分类号： C23C14/3414 , B22F1/0003 , B22F3/16 , B22F3/162 , B22F3/24 , B22F5/006 , B22F2003/248 , B22F2301/20 , B22F2998/00 , B22F2998/10 , C21D8/0221 , C21D8/0247 , C22C1/045 , C22C27/04 , C22F1/18 , C23C14/14 , C23C14/3478 , C23C14/3485 , C23C14/35 , C23C14/46 , B22F3/172 , B22F3/20 , B22F3/04 , B22F3/10
摘要： In various embodiments, sputtering targets are formed by introducing molybdenum powder into a sheet bar mold, pressing the powder to form a sheet bar, sintering the sheet bar to form an ingot having a density of at least 90% of a theoretical density, preheating the ingot, rolling the ingot to form a plate, and heat treating the plate.
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公开(公告)号：US08784729B2
公开(公告)日：2014-07-22
申请号：US11653816
申请日：2007-01-16
申请人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
发明人： Prabhat Kumar , Charles Wood , Gary Rozak , Steven A. Miller , Glen Zeman , Rong-Chein Richard Wu
CPC分类号： C23C14/3414 , B22F3/1017 , B22F2003/241 , B22F2003/247 , B22F2998/10 , C22C1/045 , B22F3/04 , B22F3/24
摘要： The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.
摘要翻译： 本发明涉及一种通过压制/烧结方法生产高密度难熔金属产品的方法。 本发明还涉及一种用于制造溅射靶和如此制造的溅射靶的方法。
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公开(公告)号：US20130224059A1
公开(公告)日：2013-08-29
申请号：US13849918
申请日：2013-03-25
申请人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Peter R. Jepson , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwarz
发明人： Brad Lemon , Joseph Hirt , Timothy Welling , James G. Daily, III , David Meendering , Gary Rozak , Jerome O'Grady , Peter R. Jepson , Prabhat Kumar , Steven A. Miller , Rong-chein Richard Wu , David G. Schwarz
IPC分类号： C23C14/34
CPC分类号： C23C14/3414 , B22F1/0003 , B22F3/16 , B22F3/162 , B22F3/24 , B22F5/006 , B22F2003/248 , B22F2301/20 , B22F2998/00 , B22F2998/10 , C21D8/0221 , C21D8/0247 , C22C1/045 , C22C27/04 , C22F1/18 , C23C14/14 , C23C14/3478 , C23C14/3485 , C23C14/35 , C23C14/46 , B22F3/172 , B22F3/20 , B22F3/04 , B22F3/10
摘要： In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet.
摘要翻译： 在各种实施例中，平面溅射靶通过至少通过在模具中压制钼粉末并烧结压粉，加工坯料以形成加工的坯料，热处理加工的坯料，加工加工的坯料以形成 最终坯料，并对最终坯料进行热处理。
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公开(公告)号：US08197894B2
公开(公告)日：2012-06-12
申请号：US11937164
申请日：2007-11-08
申请人： Steven A. Miller , Olaf Schmidt-Park , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann
发明人： Steven A. Miller , Olaf Schmidt-Park , Prabhat Kumar , Richard Wu , Shuwei Sun , Stefan Zimmermann
IPC分类号： B05D1/12
CPC分类号： C23C14/3414 , B22F1/0014 , C22C1/045 , C23C4/134 , C23C14/0057 , C23C14/0089 , C23C14/0641 , C23C14/08 , C23C14/14 , C23C24/04 , H01J37/3426 , H01J2237/332
摘要： In various embodiments, sputter-target formation includes application of a layer having an intermediate coefficient of thermal expansion between the backing plate and the target material.
摘要翻译： 在各种实施例中，溅射靶的形成包括在背板和目标材料之间施加具有中间热膨胀系数的层。
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