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24 条记录 (耗时 0.034 秒)

    Accurate small-spot spectrometry systems and methods
    2.
    发明授权
    Accurate small-spot spectrometry systems and methods 有权
    精确的小光谱分析系统和方法

    公开(公告)号：US06870617B2

    公开(公告)日：2005-03-22

    申请号：US10796322

    申请日：2004-03-09

    申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

    发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

    IPC分类号： G01J3/08 ,  G01J3/42 ,  G01N21/55

    CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/08 ,  G01J3/42 ,  G01N21/55

    摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

    摘要翻译： 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。 因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

    Accurate small-spot spectrometry instrument
    3.
    发明授权
    Accurate small-spot spectrometry instrument 失效
    精确的小光谱光谱仪

    公开(公告)号：US06738136B2

    公开(公告)日：2004-05-18

    申请号：US10290730

    申请日：2002-11-07

    申请人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

    发明人： Adam Norton ,  Abdurrahman Sezginer ,  Fred E. Stanke ,  Rodney Smedt

    IPC分类号： G01J308

    CPC分类号： G01J3/02 ,  G01J3/0218 ,  G01J3/08 ,  G01J3/42 ,  G01N21/55

    摘要： The invention is a method and apparatus for determining characteristics of a sample. The system and method provide for detecting a monitor beam reflected off a mirror, where the monitor beam corresponds to the intensity of light incident upon the sample. The system and method also provide for detecting a measurement beam, where the measurement beam has been reflected off the sample being characterized. Both the monitor beam and the measurement beam are transmitted through the same transmission path, and detected by the same detector. Thus, potential sources of variations between the monitor beam and the measurement beam which are not due to the characteristics of the sample are minimized. Reflectivity information for the sample can be determined by comparing data corresponding to the measurement beam relative to data corresponding the monitor beam.

    摘要翻译： 本发明是用于确定样品特性的方法和装置。 该系统和方法提供用于检测从反射镜反射的监视光束，其中监视光束对应于入射在样本上的光的强度。 该系统和方法还提供了用于检测测量光束，其中测量光束已经从被表征的样品反射出来。 监测光束和测量光束都通过相同的传输路径传输，并由相同的检测器检测。 因此，监测光束和测量光束之间不是由于样品特性引起的变化的潜在来源被最小化。 可以通过将与测量光束相对应的数据相对于监视光束对应的数据进行比较来确定样本的反射率信息。

    Backside contamination inspection device
    7.
    发明申请
    Backside contamination inspection device 有权

    公开(公告)号：US20060187445A1

    公开(公告)日：2006-08-24

    申请号：US11408124

    申请日：2006-04-19

    申请人： Rodney Smedt

    发明人： Rodney Smedt

    IPC分类号： G01N21/88

    CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503

    摘要： A system for simultaneously inspecting the frontsides and backsides of semiconductor wafers for defects is disclosed. The system rotates the semiconductor wafer while the frontside and backside surfaces are generally simultaneously optically scanned for defects. Rotation is induced by providing contact between the beveled edges of the semiconductor wafer and roller bearings rotationally driven by a motor. The wafer is supported in a tilted or semi-upright orientation such that support is provided by gravity. This tilted supporting orientation permits both the frontside and the backside of the wafer to be viewed simultaneously by a frontside inspection device and a backside inspection device.

    System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy
    8.
    发明授权
    System and method for characterizing a film by X-ray photoelectron and low-energy X-ray fluorescence spectroscopy 有权
    通过X射线光电子和低能X射线荧光光谱表征膜的系统和方法

    公开(公告)号：US09240254B2

    公开(公告)日：2016-01-19

    申请号：US13246488

    申请日：2011-09-27

    申请人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

    发明人： Bruno W. Schueler ,  David A. Reed ,  Jeffrey Thomas Fanton ,  Rodney Smedt

    IPC分类号： G01N23/223 ,  G21K1/00 ,  G21K1/06 ,  G01N23/227

    CPC分类号： G21K1/06 ,  G01N23/223 ,  G01N23/2273 ,  G01N2223/61 ,  G21K2201/062 ,  G21K2201/064

    摘要： Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy below the k-edge of silicon. A sample holder may be included for positioning a sample in a pathway of the X-ray beam. A first detector may be included for collecting an XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting an X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring/estimation of the primary X-ray flux at the analysis site may be provided by X-ray flux detectors near and at the analysis site. Both XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurement without the need to employ signal intensity ratios.

    摘要翻译： 公开了通过X射线光电子能谱（XPS）表征膜的系统和方法。 例如，用于表征胶片的系统可以包括用于产生具有低于硅的k边缘的能量的X射线束的X射线源。 可以包括样品保持器以将样品定位在X射线束的通路中。 可以包括第一检测器以收集通过用X射线束轰击样品而产生的XPS信号。 可以包括第二检测器，用于收集通过用X射线束轰击样品而产生的X射线荧光（XRF）信号。 在分析现场的X射线通量探测器附近和分析现场可以提供监测/估计分析现场的主要X射线通量。 XRF和XPS信号都可以归一化为（估计的）初级X射线通量，以实现膜厚度或剂量测量，而不需要使用信号强度比。

    System for Measuring Periodic Structures
    9.
    发明申请
    System for Measuring Periodic Structures 有权

    公开(公告)号：US20060290931A1

    公开(公告)日：2006-12-28

    申请号：US11458934

    申请日：2006-07-20

    申请人： Guoheng Zhao ,  Kenneth Gross ,  Rodney Smedt ,  Mehrdad Nikoonahad

    发明人： Guoheng Zhao ,  Kenneth Gross ,  Rodney Smedt ,  Mehrdad Nikoonahad

    IPC分类号： G01J4/00

    CPC分类号： G01N21/21 ,  G01B11/00 ,  G01N21/4788 ,  G01N21/956

    摘要： A periodic structure is illuminated by polychromatic electromagnetic radiation. Radiation from the structure is collected and divided into two rays having different polarization states. The two rays are detected from which one or more parameters of the periodic structure may be derived. In another embodiment, when the periodic structure is illuminated by a polychromatic electromagnetic radiation, the collected radiation from the structure is passed through a polarization element having a polarization plane. The element and the polychromatic beam are controlled so that the polarization plane of the element are at two or more different orientations with respect to the plane of incidence of the polychromatic beam. Radiation that has passed through the element is detected when the plane of polarization is at the two or more positions so that one or more parameters of the periodic structure may be derived from the detected signals. At least one of the orientations of the plane of polarization is substantially stationary when the detection takes place. To have as small a footprint as possible, one employs an optical device that includes a first element directing a polychromatic beam of electromagnetic radiation to the structure and a second optical element collecting radiation from the structure where the two elements form an integral unit or are attached together to form an integrated unit. To reduce the footprint, the measurement instrument and the wafer are both moved. In one embodiment, both the apparatus and the wafer undergo translational motion transverse to each other. In a different arrangement, one of the two motions is translational and the other is rotational. Any one of the above-described embodiments may be included in an integrated processing and detection apparatus which also includes a processing system processing the sample, where the processing system is responsive to the output of any one of the above embodiments for adjusting a processing parameter.