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公开(公告)号:US20170181292A1
公开(公告)日:2017-06-22
申请号:US15375592
申请日:2016-12-12
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Qin Tang , Kit Ho Tong , Chit Yiu Chan , Kowk-Wai Yee
CPC classification number: H05K3/282 , C09D5/08 , C23C18/1637 , C23C18/168 , C23C18/1834 , C23C22/58 , C23F11/08 , C23F11/149 , H05K2203/0591 , H05K2203/0703
Abstract: A method for forming an organic coating on a surface of nickel or nickel alloy is disclosed. The method includes contacting the nickel surface with a composition comprising a specific pyrazine derived compound to prevent corrosion of nickel without forming known gold emersion film on the surface of the nickel.
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公开(公告)号:US20180073149A1
公开(公告)日:2018-03-15
申请号:US15263655
申请日:2016-09-13
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Hung Tat Chan , Ka Ming Yip , Chit Yiu Chan , Kwok Wai Yee
CPC classification number: C23C18/1612 , B05D1/02 , B05D1/18 , B05D3/007 , B05D3/06 , B05D5/068 , B05D5/08 , B05D2201/02 , B05D2505/00 , C08J7/045 , C08J2379/02 , C23C18/1605 , C23C18/1641 , C23C18/165 , C23C18/2013 , C23C18/204 , C23C18/2086 , C23C18/22 , C23C18/30 , C23C18/38
Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain polyamines and the top coat contains hydrophobic alky organic compounds.
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公开(公告)号:US09850578B1
公开(公告)日:2017-12-26
申请号:US15263645
申请日:2016-09-13
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Hung Tat Chan , Ka Ming Yip , Chit Yiu Chan , Kwok Wai Yee
CPC classification number: C23C18/1641 , C09K13/00 , C23C18/1605 , C23C18/2013 , C23C18/204 , C23C18/2086 , C23C18/22 , C23C18/30 , C23C18/38
Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain five-membered heterocyclic nitrogen compounds and the top coat contains hydrophobic alky organic compounds.
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公开(公告)号:US09797043B1
公开(公告)日:2017-10-24
申请号:US15263640
申请日:2016-09-13
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Hung Tat Chan , Ka Ming Yip , Chit Yiu Chan , Kwok Wai Yee
CPC classification number: C23C18/38 , C23C18/1605 , C23C18/1641 , C23C18/2006 , C23C18/2013 , C23C18/204 , C23C18/22 , C23C18/285 , C23C18/30 , C23C18/40
Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain aromatic heterocyclic compounds and the top coat contains hydrophobic alky organic compounds.
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公开(公告)号:US08961678B2
公开(公告)日:2015-02-24
申请号:US13722768
申请日:2012-12-20
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Qin Tang , Kit Ho Tong , Chit Yiu Chan , Martin W. Bayes
CPC classification number: C09D7/1233 , C09D7/63 , C23C22/52 , C23F11/08 , C23F11/149 , H01L21/02304 , H05K3/282 , H05K2203/124
Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.
Abstract translation: 有机可焊性防腐剂溶液包括抑制金属腐蚀的吡嗪衍生物。 该解决方案被应用于用于电子设备的部件的金属表面,以改善电子设备中部件之间的电连接的可焊性。
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公开(公告)号:US09970114B2
公开(公告)日:2018-05-15
申请号:US15263655
申请日:2016-09-13
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Hung Tat Chan , Ka Ming Yip , Chit Yiu Chan , Kwok Wai Yee
IPC: H01B13/00 , C23C18/16 , C23C18/38 , C23C18/18 , C09K13/00 , C23C18/22 , C23C18/20 , B05D5/06 , C08J7/04 , B05D1/02 , B05D1/18 , B05D3/00 , B05D3/06 , B05D5/08
CPC classification number: C23C18/1612 , B05D1/02 , B05D1/18 , B05D3/007 , B05D3/06 , B05D5/068 , B05D5/08 , B05D2201/02 , B05D2505/00 , C08J7/045 , C08J2379/02 , C23C18/1605 , C23C18/1641 , C23C18/165 , C23C18/2013 , C23C18/204 , C23C18/2086 , C23C18/22 , C23C18/30 , C23C18/38
Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain polyamines and the top coat contains hydrophobic alky organic compounds.
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公开(公告)号:US20170183783A1
公开(公告)日:2017-06-29
申请号:US15375612
申请日:2016-12-12
Applicant: Rohm and Haas Electronic Materials LLC
Inventor: Qin Tang , Kit Ho Tong , Chit Yiu Chan , Kwok Wai Yee
CPC classification number: C23F11/00 , C09D5/086 , C09D7/48 , C23C22/52 , C23F11/08 , C23F11/149 , H05K1/0346 , H05K1/09 , H05K3/282 , H05K2203/0392 , H05K2203/0591 , H05K2203/124
Abstract: A method for selective deposition of an organic solderability preservative coating on a copper surface of an article is disclosed. The method includes two steps of organic coatings by two solutions; the first step contains contacting the copper surface with a first solution including azole compound and the second step contains contacting the copper surface treated by the first solution with a second solution including a specific pyrazine derived compound.
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