Integrated Switching Device with Parallel Rectifier Element
    1.
    发明申请
    Integrated Switching Device with Parallel Rectifier Element 审中-公开
    具有并联整流元件的集成开关器件

    公开(公告)号:US20130264654A1

    公开(公告)日:2013-10-10

    申请号:US13441038

    申请日:2012-04-06

    IPC分类号: H01L27/06

    摘要: An integrated circuit includes a semiconductor body with a first semiconductor layer and a second semiconductor layer arranged adjacent the first semiconductor layer in a vertical direction of the semiconductor body. The integrated circuit further includes a switching device with a control terminal and a load path between a first load terminal and a second load terminal, and a rectifier element connected in parallel with at least one section of the load path. The switching device is integrated in the first semiconductor layer and the rectifier element is integrated in the second semiconductor layer.

    摘要翻译: 集成电路包括具有第一半导体层的半导体本体和在半导体本体的垂直方向上与第一半导体层相邻布置的第二半导体层。 集成电路还包括具有控制端子和第一负载端子和第二负载端子之间的负载路径的开关装置,以及与负载路径的至少一个部分并联连接的整流元件。 开关器件集成在第一半导体层中,并且整流元件集成在第二半导体层中。

    Circuit arrangement with a first semiconductor device and with a plurality of second semiconductor devices
    2.
    发明授权
    Circuit arrangement with a first semiconductor device and with a plurality of second semiconductor devices 有权
    具有第一半导体器件和多个第二半导体器件的电路布置

    公开(公告)号:US09035690B2

    公开(公告)日:2015-05-19

    申请号:US13599946

    申请日:2012-08-30

    申请人: Rolf Weis

    发明人: Rolf Weis

    摘要: A circuit arrangement includes a first semiconductor device having a load path and a number of second semiconductor devices. Each second semiconductor device has a control terminal and a load path between a first load terminal and a second load terminal. The second semiconductor devices have their load paths connected in series and connected in series with the load path of the first semiconductor device. Each of the second semiconductor devices has a load terminal of one of the first semiconductor device and of one of the second semiconductor devices associated thereto and a voltage limiting element coupled between the control terminal of one of the second semiconductor devices and the load terminal associated with that one of the second semiconductor devices.

    摘要翻译: 电路装置包括具有负载路径和多个第二半导体器件的第一半导体器件。 每个第二半导体器件具有在第一负载端子和第二负载端子之间的控制端子和负载路径。 第二半导体器件的负载路径串联连接并与第一半导体器件的负载路径串联连接。 每个第二半导体器件具有第一半导体器件中的一个和与其相关联的第二半导体器件中的一个的负载端子,以及耦合在第二半导体器件中的一个的控制端子与与之相关联的负载端子之间的电压限制元件 那个第二个半导体器件之一。

    Circuit arrangement with a rectifier circuit
    3.
    发明授权
    Circuit arrangement with a rectifier circuit 有权
    电路布置与整流电路

    公开(公告)号:US08971080B2

    公开(公告)日:2015-03-03

    申请号:US13546510

    申请日:2012-07-11

    IPC分类号: H02M7/217

    摘要: A circuit arrangement includes a rectifier circuit having a first and a second load terminal, a first semiconductor device having a load path and a control terminal and a plurality of n, with n>1, second semiconductor devices, each having a load path between a first load terminal and a second load terminal and a control terminal. The second semiconductor devices have their load paths connected in series and connected in series to the load path of the first semiconductor device. The series circuit with the first semiconductor device and the second semiconductor devices are connected between the load terminals of the rectifier circuit. Each of the second semiconductor devices has its control terminal connected to the load terminal of one of the other second semiconductor devices. One of the second semiconductor devices has its control terminal connected to one of the load terminals of the first semiconductor device.

    摘要翻译: 一种电路装置包括具有第一和第二负载端子的整流电路,具有负载路径的第一半导体器件和具有n≥1的多个n,第二半导体器件具有负载路径 第一负载端子和第二负载端子和控制端子。 第二半导体器件的负载路径串联连接并与第一半导体器件的负载路径串联连接。 具有第一半导体器件和第二半导体器件的串联电路连接在整流器电路的负载端子之间。 每个第二半导体器件的控制端子连接到其它第二半导体器件之一的负载端子。 第二半导体器件中的一个具有连接到第一半导体器件的负载端子之一的控制端子。

    Circuit Arrangement with a Rectifier Circuit
    4.
    发明申请
    Circuit Arrangement with a Rectifier Circuit 有权
    整流电路的电路布置

    公开(公告)号:US20140016386A1

    公开(公告)日:2014-01-16

    申请号:US13546510

    申请日:2012-07-11

    IPC分类号: H02M7/00 H02M7/217 H02M7/06

    摘要: A circuit arrangement includes a rectifier circuit having a first and a second load terminal, a first semiconductor device having a load path and a control terminal and a plurality of n, with n>1, second semiconductor devices, each having a load path between a first load terminal and a second load terminal and a control terminal. The second semiconductor devices have their load paths connected in series and connected in series to the load path of the first semiconductor device. The series circuit with the first semiconductor device and the second semiconductor devices are connected between the load terminals of the rectifier circuit. Each of the second semiconductor devices has its control terminal connected to the load terminal of one of the other second semiconductor devices. One of the second semiconductor devices has its control terminal connected to one of the load terminals of the first semiconductor device.

    摘要翻译: 一种电路装置包括具有第一和第二负载端子的整流电路,具有负载路径的第一半导体器件和具有n≥1的多个n,第二半导体器件具有负载路径 第一负载端子和第二负载端子和控制端子。 第二半导体器件的负载路径串联连接并与第一半导体器件的负载路径串联连接。 具有第一半导体器件和第二半导体器件的串联电路连接在整流器电路的负载端子之间。 每个第二半导体器件的控制端子连接到其它第二半导体器件之一的负载端子。 第二半导体器件中的一个具有连接到第一半导体器件的负载端子之一的控制端子。

    Integrated memory cell array
    7.
    发明授权
    Integrated memory cell array 失效
    集成存储单元阵列

    公开(公告)号:US07642586B2

    公开(公告)日:2010-01-05

    申请号:US11517634

    申请日:2006-09-08

    申请人: Rolf Weis

    发明人: Rolf Weis

    IPC分类号: H01L27/108

    摘要: The present invention provides an integrated memory cell array comprising: a semiconductor substrate; a plurality of cell transistor devices including: a pillar formed in said semiconductor substrate; a gate trench surrounding said pillar; a first source/drain region formed in an upper region of said pillar; a gate dielectric formed on the bottom of said gate trench and surrounding a lower region of said pillar; a gate formed on said gate dielectric in said gate trench and surrounding a lower region of said pillar; and a second source/drain region formed in an upper region of said semiconductor substrate adjoining said gate trench; a plurality of bitlines being connected to respective first groups of first source/drain regions of said cell transistor devices; a plurality of wordlines connecting the respective gates of second groups said cell transistor devices; and a plurality of cell capacitor devices being connected to the second source/drain regions of said cell transistor devices.

    摘要翻译: 本发明提供一种集成存储单元阵列,包括:半导体衬底; 多个单元晶体管器件,包括:形成在所述半导体衬底中的柱; 围绕所述支柱的栅极沟槽; 形成在所述柱的上部区域中的第一源极/漏极区域; 形成在所述栅极沟槽的底部并围绕所述柱的下部区域的栅极电介质; 形成在所述栅极沟槽中的所述栅极电介质上并围绕所述柱的下部区域的栅极; 以及形成在与所述栅极沟槽相邻的所述半导体衬底的上部区域中的第二源极/漏极区域; 多个位线连接到所述单元晶体管器件的第一源/漏区的相应第一组; 连接第二组的各个栅极的多个字线,所述单元晶体管器件; 并且多个单元电容器器件连接到所述单元晶体管器件的第二源极/漏极区域。

    Integrated circuit having a memory cell array and method of forming an integrated circuit
    8.
    发明授权
    Integrated circuit having a memory cell array and method of forming an integrated circuit 失效
    具有存储单元阵列的集成电路和形成集成电路的方法

    公开(公告)号:US07642572B2

    公开(公告)日:2010-01-05

    申请号:US11735164

    申请日:2007-04-13

    IPC分类号: H01L27/108

    摘要: An integrated circuit having a memory cell array and a method of forming an integrated circuit is disclosed. One embodiment provides bitlines running along a first direction, wordlines running along a second direction substantially perpendicular to the first direction, active areas and bitline contacts. The bitline contacts are arranged in columns extending in the second direction and in rows extending in the first direction. A distance between neighboring bitlines is DL, and a distance between neighboring bitline contacts is DC, DC being measured parallel to the first direction. The following relation holds: 1/2.25≦DL/DC≦1/1.75.

    摘要翻译: 公开了一种具有存储单元阵列的集成电路和形成集成电路的方法。 一个实施例提供沿着第一方向行进的位线,沿着基本上垂直于第一方向的第二方向行进的字线,有效区域和位线接触。 位线触点被布置成沿着第二方向延伸的列,并且以沿第一方向延伸的列布置。 相邻位线之间的距离为DL,相邻位线触点之间的距离为DC,DC平行于第一方向测量。 以下关系成立:1 / 2.25 <= DL / DC <= 1 / 1.75。

    Transistor, memory cell array and method of manufacturing a transistor
    9.
    发明授权
    Transistor, memory cell array and method of manufacturing a transistor 失效
    晶体管,存储单元阵列及制造晶体管的方法

    公开(公告)号:US07635893B2

    公开(公告)日:2009-12-22

    申请号:US11128782

    申请日:2005-05-13

    IPC分类号: H01L29/772

    摘要: A transistor, memory cell array and method of manufacturing a transistor are disclosed. In one embodiment, the invention refers to a transistor, which is formed at least partially in a semiconductor substrate, comprising a first and a second source/drain regions, a channel region connecting said first and second source/drain regions, said channel region being disposed in said semiconductor substrate, and a gate electrode disposed along said channel region and being electrically insulated from said channel region, for controlling an electrical current flowing between said first and second source/drain regions, wherein said channel region comprises a fin-region in which the channel has the shape of a ridge, said ridge comprising a top side and two lateral sides in a cross section perpendicular to a line connecting said first and second source/drain regions, wherein said top side is disposed beneath a surface of said semiconductor substrate and said gate electrode is disposed along said top side and said two lateral sides.

    摘要翻译: 公开了晶体管,存储单元阵列和制造晶体管的方法。 在一个实施例中,本发明涉及至少部分地形成在半导体衬底中的晶体管,包括第一和第二源极/漏极区域,连接所述第一和第二源极/漏极区域的沟道区域,所述沟道区域是 设置在所述半导体衬底中的栅电极以及沿着所述沟道区设置并与所述沟道区电绝缘的栅极,用于控制在所述第一和第二源/漏区之间流动的电流,其中所述沟道区包括 所述通道具有脊的形状,所述脊包括垂直于连接所述第一和第二源极/漏极区的线的横截面中的顶侧和两个侧边,其中所述顶侧设置在所述半导体的表面下方 基板和所述栅电极沿着所述顶侧和所述两个横向侧面设置。

    INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT
    10.
    发明申请
    INTEGRATED CIRCUIT AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT 审中-公开
    集成电路及制造集成电路的方法

    公开(公告)号:US20090127608A1

    公开(公告)日:2009-05-21

    申请号:US11943482

    申请日:2007-11-20

    申请人: Rolf Weis

    发明人: Rolf Weis

    IPC分类号: H01L27/108 H01L21/8242

    摘要: An integrated circuit including a memory cell array is shown. The memory cell array comprises word lines extending in a first direction and bit lines extending in a second direction intersecting the first direction and memory cells. The memory cells may include storage elements, bit line contacts for coupling a corresponding memory cell to a corresponding bit line. The bit line contacts are arranged in a checkerboard pattern with respect to the first direction, and the storage elements are arranged in a regular grid along the first and second directions, respectively.

    摘要翻译: 示出了包括存储单元阵列的集成电路。 存储单元阵列包括沿第一方向延伸的字线和沿与第一方向相交的第二方向延伸的位线和存储单元。 存储器单元可以包括存储元件,用于将相应的存储器单元耦合到对应的位线的位线触点。 位线触点相对于第一方向布置成棋盘图案,并且存储元件分别沿着第一和第二方向排列成规则的格栅。