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公开(公告)号：US20070298349A1
公开(公告)日：2007-12-27
申请号：US11425813
申请日：2006-06-22
申请人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
发明人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
IPC分类号： G03C1/00
CPC分类号： C09D183/04 , G03F7/038 , G03F7/0757 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
摘要翻译： 本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团， 其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合 包括将环醚与聚合物的硅连接的脂环族连接基团。 本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。 本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。
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公开(公告)号：US08026201B2
公开(公告)日：2011-09-27
申请号：US11619208
申请日：2007-01-03
申请人： Ruzhi Zhang , Ping-Hung Lu
发明人： Ruzhi Zhang , Ping-Hung Lu
摘要： The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.
摘要翻译： 本发明涉及去除硅基抗反射涂层/硬掩模层的组合物和方法。
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公开(公告)号：US20080161217A1
公开(公告)日：2008-07-03
申请号：US11619208
申请日：2007-01-03
申请人： Ruzhi Zhang , Ping-Hung Lu
发明人： Ruzhi Zhang , Ping-Hung Lu
IPC分类号： G03F7/00
摘要： The invention relates to compositions and methods of removing silicon-based anti-reflective coatings/hardmask layers.
摘要翻译： 本发明涉及去除硅基抗反射涂层/硬掩模层的组合物和方法。
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公开(公告)号：US08017296B2
公开(公告)日：2011-09-13
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , WooKyu Kim , Ping-Hung Lu
IPC分类号： G03F7/04
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
摘要翻译： 本发明涉及一种有机可旋涂的抗反射涂料组合物，其包含聚合物，该聚合物包含至少一个在聚合物主链中具有3个或更多个稠合芳环的单元和至少一个在聚合物主链中具有脂族摩尔的单元。 本发明还涉及用于对本发明组合物进行成像的方法。
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公开(公告)号：US20080292995A1
公开(公告)日：2008-11-27
申请号：US11872962
申请日：2007-10-16
申请人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
发明人： Francis Houlihan , David Abdallah , M. Dalil Rahman , Douglas McKenzie , Ruzhi Zhang , Allen G. Timko , Wookyu Kim , Ping-Hung Lu
CPC分类号： C09D165/00 , G03F7/091 , H01L21/0276
摘要： The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer comprising at least one unit with 3 or more fused aromatic rings in the backbone of the polymer and at least one unit with an aliphatic moeity in the backbone of the polymer. The invention further relates to a process for imaging the present composition.
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公开(公告)号：US08026040B2
公开(公告)日：2011-09-27
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
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公开(公告)号：US20080196626A1
公开(公告)日：2008-08-21
申请号：US11676673
申请日：2007-02-20
申请人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
发明人： Hengpeng Wu , WooKyu Kim , Hong Zhuang , PingHung Lu , Mark Neisser , David Abdallah , Ruzhi Zhang
CPC分类号： C09D183/04 , C08G77/06
摘要： The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.
摘要翻译： 本发明涉及一种组合物，其包含：（a）具有至少一个下式的重复单元的聚合物，其中R 1是不可水解基团，n是1至3的整数; 和（b）交联催化剂。 该组合物可用于形成低k介电常数材料，以及具有用于光刻工业的抗反射特性的硬掩模和底层材料。
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8.发明申请Spin On Organic Antireflective Coating Composition Comprising Polymer with Fused Aromatic Rings 审中-公开旋转有机抗反射涂料组合物包含聚合物与熔融芳香环公开(公告)号：US20100316949A1
公开(公告)日：2010-12-16
申请号：US12482189
申请日：2009-06-10
申请人： M. Dalil Rahman , Douglas McKenzie , Guanyang Lin , Jianhui Shan , Ruzhi Zhang , Mark Neisser
发明人： M. Dalil Rahman , Douglas McKenzie , Guanyang Lin , Jianhui Shan , Ruzhi Zhang , Mark Neisser
CPC分类号： H01L21/0276 , C08G61/02 , C08G2261/94 , C09D165/00 , G03F7/091 , G03F7/094
摘要： The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition.
摘要翻译： 本发明涉及一种在硬掩模抗反射涂料组合物上的有机旋涂，其包含聚合物，该聚合物包含聚合物主链中的至少一个稠合芳环单元和至少一个在聚合物主链中具有脂环族部分的单元。 本发明还涉及制备聚合物的方法和用于对本发明组合物进行成像的方法。
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公开(公告)号：US20080008954A1
公开(公告)日：2008-01-10
申请号：US11425817
申请日：2006-06-22
申请人： David J. Abdallah , Ruzhi Zhang
发明人： David J. Abdallah , Ruzhi Zhang
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , C09D183/04 , G03F7/0752 , G03F7/0757 , Y10S430/114
摘要： High silicon-content resin composition that can be used to form thin film thermosets, useful in forming low k dielectric constant materials and as well as hard mask materials with anti-reflective properties for the photolithography industry are disclosed.
摘要翻译： 公开了可用于形成薄膜热固性材料的高含硅树脂组合物，其可用于形成低k介电常数材料以及具有用于光刻工业的抗反射性能的硬掩模材料。
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10.发明授权Low dielectric photoimageable compositions and electronic devices made therefrom 有权低介电可光成像组合物和由其制成的电子器件公开(公告)号：US08871425B2
公开(公告)日：2014-10-28
申请号：US13369809
申请日：2012-02-09
CPC分类号： C08L83/04 , G03F7/038 , G03F7/0757 , G03F7/0758 , H01L21/02126 , H01L21/02282 , H01L23/5329 , H01L2924/0002 , Y10T428/24802 , H01L2924/00
摘要： This invention relates generally to silicon based photoresist compositions that can be used in forming low k dielectric constant materials suitable for use in electronic devices, methods of their use and the electronic devices made therefrom.
摘要翻译： 本发明一般涉及可用于形成适用于电子设备的低k介电常数材料的硅基光致抗蚀剂组合物，其使用方法和由其制成的电子器件。
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