ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF
    7.
    发明申请
    ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF 审中-公开
    抗反射涂料组合物及其工艺

    公开(公告)号:US20120251943A1

    公开(公告)日:2012-10-04

    申请号:US13075749

    申请日:2011-03-30

    IPC分类号: G03F7/20 G03F7/004 C09K3/00

    CPC分类号: G03F7/091

    摘要: The invention relates to an antireflective coating composition comprising a crosslinker and a crosslinkable polymer capable of being crosslinked by the crosslinker, where the crosslinkable polymer comprises a unit represented by structure (1): A-B—C  (1) where A is a fused aromatic ring, B has a structure (2), and C is a hydroxybiphenyl of structure (3) where R1 is C1-C4alkyl and R2 is C1-C4alkyl.The invention further relates to a process for forming an image using the composition.

    摘要翻译: 本发明涉及一种抗反射涂料组合物,其包含能够由交联剂交联的交联剂和可交联聚合物,其中可交联聚合物包含由结构(1)表示的单元:其中A是稠合的 芳香环,B为结构(2),C为结构式(3)的羟基联苯,其中R 1为C 1 -C 4烷基且R 2为C 1 -C 4烷基。 本发明还涉及使用该组合物形成图像的方法。

    Antireflective coating composition
    8.
    发明申请
    Antireflective coating composition 有权
    防反射涂料组合物

    公开(公告)号:US20090280435A1

    公开(公告)日:2009-11-12

    申请号:US12115776

    申请日:2008-05-06

    IPC分类号: G03F7/20 G03F7/039

    CPC分类号: G03F7/091

    摘要: The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

    摘要翻译: 本发明涉及包含聚合物,交联剂和热酸发生剂的抗反射涂料组合物,其中聚合物包含至少一个结构单元(1),至少一个结构单元(2)和至少一个结构结构 (3),其中R 1至R 9独立地选自H和C 1 -C 6烷基,R'和R“独立地选自H和C 1 -C 6烷基,X是C 1 -C 6亚烷基,Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。

    Antireflective Coating Composition
    10.
    发明申请
    Antireflective Coating Composition 有权
    防反射涂料组合物

    公开(公告)号:US20090246691A1

    公开(公告)日:2009-10-01

    申请号:US12060307

    申请日:2008-04-01

    IPC分类号: G03F7/004 G03F7/00

    CPC分类号: G03F7/091

    摘要: The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2. where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure. 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

    摘要翻译: 本发明涉及一种抗反射组合物,其包含热酸产生剂和环氧聚合物,其包含至少一个结构单元1,至少一个结构单元,其中R1至R12独立地选自氢和C1-C4烷基, 结构体。 1具有选自顺式,反式或其混合物的构型,x和y是聚合物中单体单元的摩尔%。 本发明还涉及一种用于制造微电子器件的方法。