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公开(公告)号：US10290781B2
公开(公告)日：2019-05-14
申请号：US15357000
申请日：2016-11-21
发明人： Young Do Kim , Jin Ho Ju , Min Kang , Woo Sub Shim
摘要： Provided is a color filter array panel. The color filter array panel according to exemplary embodiments of the present invention includes: a substrate; a color filter disposed on the substrate and including a colorant including at least one of a pigment and a dye, and a solid fluorescent material; and a light source unit supplying light to the color filter, in which the solid fluorescent material is an aggregation induced emission enhancement (AIEE) material of which a liquid state is solidified to increase fluorescence efficiency.
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公开(公告)号：US09977324B2
公开(公告)日：2018-05-22
申请号：US15464228
申请日：2017-03-20
发明人： DongEon Lee , Min Kang , Bong Yeon Kim , Yong Son , Junhyuk Woo , Hyunjoo Lee , Jinho Ju
CPC分类号： G03F1/30 , G03F1/26 , G03F7/2002 , G03F7/2008 , G03F7/70191 , G03F7/70283 , G03F9/7003 , G03F9/7007
摘要： A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.
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3.发明授权Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法公开(公告)号：US09395619B2
公开(公告)日：2016-07-19
申请号：US14307797
申请日：2014-06-18
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Jun-Hyuk Woo , Hyun-Joo Lee , Sang-Uk Lim , Jin-Ho Ju
CPC分类号： G03F1/26 , G02F2001/136231 , G03F7/20 , G03F7/40 , H01L27/1288
摘要： A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
摘要翻译： 相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于 第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。
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4.发明授权Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same 有权曝光系统，使用其形成图案的方法以及使用其制造显示基板的方法公开(公告)号：US08982326B2
公开(公告)日：2015-03-17
申请号：US13652911
申请日：2012-10-16
发明人： Jong-Kwang Lee , Min Kang , Jin-Ho Ju , Bong-Yeon Kim
CPC分类号： G03F7/70575 , G03F1/30 , G03F7/70283
摘要： An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate.
摘要翻译： 曝光系统包括曝光装置和相移掩模。 曝光装置发射包括彼此不同的多个波长的多波长光。 相移掩模包括透明基板和遮光层。 透明基板包括第一表面和与第一表面相对的第二表面。 多波长光入射到第一表面。 透明基板还包括从第二表面朝向第一表面延伸的凹槽。 遮光层包括暴露透明基板的第二表面的第一开口和与第一开口间隔开并暴露透明基板的凹部的第二开口。
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5.发明申请PATTERN MASK AND METHOD OF MANUFACTURING THIN FILM PATTERN USING PATTERN MASK 有权图案掩模和使用图案掩模制作薄膜图案的方法公开(公告)号：US20140065523A1
公开(公告)日：2014-03-06
申请号：US13829521
申请日：2013-03-14
发明人： JUN HYUK WOO , Min Kang , Bong-Yeon Kim , Jeong Won Kim , Jin Ho Ju , Tae Gyun Kim , Chul Won Park , Hyun Joo Lee
IPC分类号： G03F1/00
CPC分类号： G03F1/00 , G03F1/30 , H01L21/0274 , H01L27/1288
摘要： A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm.
摘要翻译： 用于图案化薄膜的图案掩模包括具有形成在其上的多个凹槽的透明或半透明衬底，其具有约4.6μm至约10.8μm的间距。
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6.发明授权公开(公告)号：US09885950B2
公开(公告)日：2018-02-06
申请号：US14691530
申请日：2015-04-20
发明人： Yong Son , Min Kang , Bong Yeon Kim , Hyun Joo Lee , Jin Ho Ju
摘要： A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
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公开(公告)号：US09632438B2
公开(公告)日：2017-04-25
申请号：US14604459
申请日：2015-01-23
发明人： DongEon Lee , Min Kang , Bong Yeon Kim , Yong Son , Junhyuk Woo , Hyunjoo Lee , Jinho Ju
CPC分类号： G03F1/30 , G03F1/26 , G03F7/2002 , G03F7/2008 , G03F7/70191 , G03F7/70283 , G03F9/7003 , G03F9/7007
摘要： A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.
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公开(公告)号：US09436091B2
公开(公告)日：2016-09-06
申请号：US14444255
申请日：2014-07-28
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Hyun-joo Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/2016 , G03F7/70375
摘要： A method for forming a fine pattern includes forming an etching target material layer on a substrate, forming a first photoresist layer on the etching target material layer, forming a metal pattern on the first photoresist layer, the metal pattern having a plurality of lines and thin film lines alternately arranged, the lines having predetermined linewidth and thickness and are spaced apart from each other by a predetermined distance, exciting surface plasmons in the metal pattern by light irradiation to produce a surface plasmon resonance that exposes a fine first pattern shape in the first photoresist layer, forming a first photoresist pattern by removing the metal pattern and developing the first photoresist layer, and etching the etching target material layer by using the first photoresist pattern as a mask.
摘要翻译： 一种形成精细图案的方法包括在基板上形成蚀刻目标材料层，在蚀刻靶材料层上形成第一光致抗蚀剂层，在第一光致抗蚀剂层上形成金属图案，金属图案具有多条线和薄的 薄膜线交替布置，线具有预定的线宽和厚度并且彼此隔开预定距离，通过光照射激发金属图案中的表面等离子体激元，以产生表面等离子体共振，其在第一 光致抗蚀剂层，通过去除金属图案和显影第一光致抗蚀剂层形成第一光致抗蚀剂图案，并且通过使用第一光致抗蚀剂图案作为掩模来蚀刻蚀刻目标材料层。
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9.发明授权公开(公告)号：US09134603B2
公开(公告)日：2015-09-15
申请号：US13856477
申请日：2013-04-04
发明人： Min Kang , Bong-Yeon Kim , Jeong Won Kim , Hyang-Shik Kong , Jin Ho Ju , Kyoung Sik Kim , Seung Hwa Baek , Jun Hyuk Woo , Hyun Joo Lee
IPC分类号： G03F1/38
摘要： A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
摘要翻译： 用于曝光的光掩模包括：透明基板; 位于所述透明基板上的遮光图案层; 位于所述遮光图案层上并包括电介质材料的第一电介质层; 以及负折射率层，其位于所述第一电介质层上并且包括金属。 用于曝光的光掩模的表面等离子体激元准结合模式与将光照射到光掩模进行曝光的光曝光器的光源的波长范围重叠。
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公开(公告)号：US08895214B2
公开(公告)日：2014-11-25
申请号：US14180234
申请日：2014-02-13
发明人： Bong-Yeon Kim , Min Kang , Jeong Won Kim , Jin Ho Ju , Jun Hyuk Woo , Hyun Joo Lee
IPC分类号： G03F1/32
摘要： An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
摘要翻译： 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。
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