NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE

    公开(公告)号:US20240234628A1

    公开(公告)日:2024-07-11

    申请号:US18224255

    申请日:2023-07-20

    IPC分类号: H01L33/12 H01L33/06 H01L33/32

    CPC分类号: H01L33/12 H01L33/06 H01L33/32

    摘要: A nitride-based semiconductor light-emitting device, including a first semiconductor layer, wherein the first semiconductor layer is nitride-based and has a first conductivity type; a light-emitting layer provided on the first semiconductor layer, wherein the light-emitting layer may include a nitride-based semiconductor including Indium (In); a second semiconductor layer provided on the light-emitting layer, wherein the second semiconductor layer is nitride-based and has a second conductivity type; and a strain relaxation layer provided between the first semiconductor layer and the light-emitting layer, and including an AlGaN layer having a protrusion whose horizontal cross-section area decreases as the protrusion extends in a vertical direction from the second semiconductor layer to the first semiconductor layer.

    SEMICONDUCTOR LIGHT EMITTING DEVICE AND DISPLAY APPARATUS

    公开(公告)号:US20210242370A1

    公开(公告)日:2021-08-05

    申请号:US17032332

    申请日:2020-09-25

    摘要: A semiconductor light emitting device includes a light emitting structure in the form of a rod, including a first conductivity-type semiconductor layer, an active layer and a second conductivity-type semiconductor layer, and having a first surface, a second surface opposing the first surface, and a side surface connecting the first and second surfaces; a regrowth semiconductor layer surrounding an entire side surface of the light emitting structure and having a first thickness in a first position along a perimeter of the side surface and a second thickness, different from the first thickness, in a second position along a perimeter of the side surface; a first electrode on the first surface of the light emitting structure and connected to the first conductivity-type semiconductor layer; and a second electrode on the second surface of the light emitting structure and connected to the second conductivity-type semiconductor layer.

    THREE DIMENSIONALLY STRUCTURED SEMICONDUCTOR LIGHT EMITTING DIODE AND DISPLAY APPARATUS

    公开(公告)号:US20210242369A1

    公开(公告)日:2021-08-05

    申请号:US17022496

    申请日:2020-09-16

    摘要: A three-dimensionally structured semiconductor light emitting diode includes a first conductivity-type semiconductor rod having integral first and second portions, the first portion defining a first surface, the second portion defining a second surface opposite the first surface, and a side surface between the first and second surfaces, an active layer and a second conductivity-type semiconductor layer on the side surface of the first conductivity-type semiconductor rod, the active layer and the second conductivity-type semiconductor layer being on the second portion of the first conductivity-type semiconductor rod, an insulating cap layer on the second surface of the first conductivity-type semiconductor rod, a transparent electrode layer on the second conductivity-type semiconductor layer, and a passivation layer on the transparent electrode layer and exposing a portion of the transparent electrode layer, the passivation layer extending to cover ends of the active layer and the second conductivity-type semiconductor layer adjacent to the first surface.

    SEMICONDUCTOR LIGHT EMITTING DEVICES

    公开(公告)号:US20210408327A1

    公开(公告)日:2021-12-30

    申请号:US17352708

    申请日:2021-06-21

    IPC分类号: H01L33/14 H01L33/38 H01L33/44

    摘要: A semiconductor light emitting device is provided. The device includes a light emitting structure stack including a first conductive semiconductor layer, a second conductive semiconductor layer, and an active layer arranged between the first conductive semiconductor layer and the second conductive semiconductor layer; a first electrode electrically connected to the first conductive semiconductor layer; a second electrode electrically connected to the second conductive semiconductor layer; and a field control structure on a sidewall of the light emitting structure stack, the field control structure including a field control electrode on a sidewall of the active layer; and a dielectric layer between the field control electrode and the active layer.

    MULTI-WAVELENGTH LIGHT-EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240072100A1

    公开(公告)日:2024-02-29

    申请号:US18214736

    申请日:2023-06-27

    IPC分类号: H01L27/15

    CPC分类号: H01L27/156

    摘要: A multi-wavelength light-emitting device configured to emit light of a first wavelength, light of a second wavelength, and a third wavelength, includes a substrate, a first type semiconductor layer provided on the substrate, an active layer provided on the first type semiconductor layer, a second type semiconductor layer provided on the active layer, and an electrode provided on the second type semiconductor layer. The active layer includes a first active area configured to emit the light of the first wavelength, a second active area configured to emit the light of the second wavelength, and a third active area configured to emit the light of the third wavelength.

    LIGHT EMITTING DEVICE, DISPLAY APPARATUS, AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240047614A1

    公开(公告)日:2024-02-08

    申请号:US18118993

    申请日:2023-03-08

    摘要: A light emitting device includes a light emitting device includes: a first nitride semiconductor layer doped with an n-type dopant and having a first lattice constant; an active layer provided on the first nitride semiconductor layer and having a second lattice constant greater than the first lattice constant, the active layer including a nitride semiconductor material including indium; a stress relaxation layer interposed between the first nitride semiconductor layer and the active layer and having a third lattice constant between the first lattice constant and the second lattice constant, the stress relaxation layer including a nitride semiconductor material including indium; and a second nitride semiconductor layer provide on the active layer and doped with a p-type dopant, wherein the active layer includes: an upper active region provided on an upper surface of the stress relaxation layer, and a side active region provided on a side surface of the stress relaxation layer.