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公开(公告)号:US20180166559A1
公开(公告)日:2018-06-14
申请号:US15376916
申请日:2016-12-13
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Guangle Zhou , Chuanbin Pan , Juan Saenz , Tanmay Kumar
IPC: H01L29/66 , H01L27/11521 , H01L27/11568 , H01L27/11556 , H01L27/11582 , H01L27/24 , H01L45/00
CPC classification number: H01L29/66666 , H01L27/11556 , H01L27/11582 , H01L27/2454 , H01L27/249 , H01L29/7827 , H01L45/04 , H01L45/12 , H01L45/1226 , H01L45/146 , H01L45/147
Abstract: A method is provided that includes forming a word line above a substrate, the word line disposed in a first direction, the word line including a first portion including a first conductive material and a second portion including a second conductive material, forming a bit line above the substrate, the bit line disposed in a second direction perpendicular to the first direction, forming a nonvolatile memory material between the word line and the bit line, the nonvolatile memory material including a semiconductor material layer and a conductive oxide material layer, the semiconductor material layer disposed adjacent the second portion of the word line, and forming a memory cell including the nonvolatile memory material at an intersection of the local bit line and the word line.
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公开(公告)号:US09806256B1
公开(公告)日:2017-10-31
申请号:US15299919
申请日:2016-10-21
Applicant: SANDISK TECHNOLOGIES LLC
Inventor: Ming-Che Wu , Chuanbin Pan , Guangle Zhou , Tanmay Kumar
CPC classification number: H01L45/124 , G11C13/0007 , G11C13/0026 , G11C13/0028 , G11C13/003 , G11C13/004 , G11C13/0069 , G11C13/0097 , G11C2213/51 , G11C2213/52 , H01L27/2436 , H01L45/08 , H01L45/085 , H01L45/1246 , H01L45/1266 , H01L45/146 , H01L45/1675
Abstract: A resistive memory device includes a first electrode, a sidewall spacer electrode located on a sidewall of a dielectric material contacting the first electrode, a resistive memory cell containing a resistive memory material and contacting the sidewall spacer electrode, and a second electrode containing the resistive memory cell.
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