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公开(公告)号：US08964515B2
公开(公告)日：2015-02-24
申请号：US14141834
申请日：2013-12-27
Applicant: Seagate Technology LLC
Inventor： Hamid Ghazvini , David Kuo , Minh Huong Le , Kim Yang Lee , HongYing Wang , Nobuo Kurataka , Yautzong Hsu , Henry Hung Yang
CPC classification number: G06K5/00 , G11B5/746 , G11B5/82 , G11B5/84 , G11B5/855 , G11B20/182 , G11B27/36 , G11B2220/2516
Abstract: A system and method of calibrating optical measuring equipment includes optically measuring discrete objects of a first known predictable pattern from a calibration apparatus, wherein the first known predictable pattern is a bit pattern. A recording surface optical reader is calibrated based on the optically measuring. Using the first known predictable pattern, contamination is filtered from the results of the optically measuring.
Abstract translation: 校准光学测量设备的系统和方法包括从校准装置光学测量第一已知可预测图案的离散物体，其中第一已知可预测图案是位图案。 基于光学测量校准记录表面光学读取器。 使用第一已知的可预测模式，从光学测量的结果中滤去污染物。
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2.发明申请BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME 有权位图形媒体模板，包括对齐标记及其使用方法公开(公告)号：US20150116690A1
公开(公告)日：2015-04-30
申请号：US14068050
申请日：2013-10-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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公开(公告)号：US09773520B2
公开(公告)日：2017-09-26
申请号：US14158611
申请日：2014-01-17
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , HongYing Wang , Kim Y. Lee
CPC classification number: G11B5/855 , G03F7/0002
Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
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公开(公告)号：US09626996B2
公开(公告)日：2017-04-18
申请号：US14588865
申请日：2015-01-02
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Zhaoning Yu , Kim Yang Lee , Michael Feldbaum , Yautzong Hsu , Wei Hu , Shuaigang Xiao , Henry Yang , HongYing Wang , Rene Johannes Marinus van de Veerdonk , David Kuo
IPC: G03F7/004 , G11B5/855 , H01L21/3065 , G03F7/40 , H01L21/027 , G03F7/20 , H01L21/02 , B82Y10/00 , B82Y40/00 , G03F7/00 , B81C1/00 , B32B27/36 , B32B27/28 , B32B27/30 , B32B3/30 , G03F7/16 , B05D1/00 , C23F4/00
CPC classification number: G11B5/855 , B05D1/005 , B32B3/30 , B32B27/283 , B32B27/302 , B32B27/308 , B32B27/36 , B32B2457/14 , B81C1/00031 , B81C2201/0149 , B82Y10/00 , B82Y40/00 , C23F4/00 , G03F7/0002 , G03F7/0035 , G03F7/165 , G03F7/2022 , G03F7/203 , G03F7/2059 , G03F7/40 , H01L21/02112 , H01L21/0274 , H01L21/3065 , Y10T428/24612
Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.
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5.发明申请BIT PATTERNED MEDIA TEMPLATE INCLUDING ALIGNMENT MARK AND METHOD OF USING SAME 审中-公开位图形媒体模板，包括对齐标记及其使用方法公开(公告)号：US20170023866A1
公开(公告)日：2017-01-26
申请号：US15289505
申请日：2016-10-10
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
IPC: G03F7/20
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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Patent Agency Ranking
公开(公告)号：US09079216B2
公开(公告)日：2015-07-14
申请号：US13798087
申请日：2013-03-13
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , Yautzong Hsu , HongYing Wang , Kim Lee
IPC: B44C1/22 , C23F1/00 , G11B5/65 , B05D3/10 , B05D3/00 , B05C21/00 , G03F7/20 , G11B5/74 , G11B5/855 , H01L21/02 , H01L21/3065
CPC classification number: B05D3/107 , B05C21/005 , B05D3/007 , G03F7/20 , G11B5/746 , G11B5/855 , H01L21/02112 , H01L21/3065 , Y10T428/24802
Abstract: The embodiments disclose a method of fabricating servo integrated templates including depositing a protective layer on servo zone resist layer patterns, patterning integrated data zone features into a substrate, depositing a protective layer on data zones and removing the servo zone protective layer and patterning integrated servo zone features into the substrate and removing the data zone protective layer creating a substrate template used in fabricating data and servo zone integrated patterned stacks.
Abstract translation: 这些实施例公开了一种制造伺服集成模板的方法，包括在伺服区抗蚀剂层图案上沉积保护层，将集成的数据区特征图案化成衬底，在数据区上沉积保护层并移除伺服区保护层， 特征进入衬底并移除数据区保护层，形成用于制造数据和伺服区集成图案化堆叠的衬底模板。
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公开(公告)号：US09964855B2
公开(公告)日：2018-05-08
申请号：US15289505
申请日：2016-10-10
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y. Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
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公开(公告)号：US20130186856A1
公开(公告)日：2013-07-25
申请号：US13798087
申请日：2013-03-13
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： Shuaigang Xiao , XiaoMin Yang , Yuatzong Hsu , HongYing Wang , Kim Lee
CPC classification number: B05D3/107 , B05C21/005 , B05D3/007 , G03F7/20 , G11B5/746 , G11B5/855 , H01L21/02112 , H01L21/3065 , Y10T428/24802
Abstract: The embodiments disclose a method of fabricating servo integrated templates including depositing a protective layer on servo zone resist layer patterns, patterning integrated data zone features into a substrate, depositing a protective layer on data zones and removing the servo zone protective layer and patterning integrated servo zone features into the substrate and removing the data zone protective layer creating a substrate template used in fabricating data and servo zone integrated patterned stacks.
Abstract translation: 这些实施例公开了一种制造伺服集成模板的方法，包括在伺服区抗蚀剂层图案上沉积保护层，将集成的数据区特征图案化成衬底，在数据区上沉积保护层并移除伺服区保护层， 特征进入衬底并移除数据区保护层，形成用于制造数据和伺服区集成图案化堆叠的衬底模板。
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9.发明授权Bit patterned media template including alignment mark and method of using same 有权包括对准标记的位图案化媒体模板及其使用方法公开(公告)号：US09466324B2
公开(公告)日：2016-10-11
申请号：US14068050
申请日：2013-10-31
Applicant: SEAGATE TECHNOLOGY LLC
Inventor： HongYing Wang , Kim Y Lee , Yautzong Hsu , Nobuo Kurataka , Gennady Gauzner , Shuaigang Xiao
CPC classification number: G03F7/70141 , G03F7/0002 , G03F9/7042 , G03F9/7076 , G11B5/855
Abstract: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at least one guide pattern alignment mark is formed over the at least one substrate alignment mark. The method further includes determining an alignment error of the at least one guide pattern alignment mark relative to the at least one substrate alignment mark; and patterning features on at least one region of the substrate, where the features are positioned on the substrate based on the at least one lithography alignment mark and the alignment error.
Abstract translation: 公开了一种方法，其包括在衬底中形成至少一个衬底对准标记和至少一个光刻对准标记; 在所述基板上形成种子层; 以及在所述种子层中形成引导图案和至少一个引导图案对准标记，其中所述至少一个引导图案对准标记形成在所述至少一个基板对准标记上。 所述方法还包括确定所述至少一个引导图案对准标记相对于所述至少一个基板对准标记的对准误差; 以及在所述基板的至少一个区域上构图特征，其中所述特征基于所述至少一个光刻对准标记和所述对准误差位于所述基板上。
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10.发明申请IMPRINT PATTERN GUIDED SELF-ASSEMBLY OF LAMELLAR BLOCK COPOLYMER FOR BPM 有权印刷图案用于BPM的LAMELLAR块状共聚物的自组装公开(公告)号：US20150206548A1
公开(公告)日：2015-07-23
申请号：US14158611
申请日：2014-01-17
Applicant: Seagate Technology LLC
Inventor： XiaoMin Yang , Shuaigang Xiao , Yautzong Hsu , HongYing Wang , Kim Y. Lee
IPC: G11B5/84
CPC classification number: G11B5/855 , G03F7/0002
Abstract: The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.
Abstract translation: 实施方案公开了使用修剪的印迹抗蚀剂和化学对比图案来引导预定层状嵌段共聚物（BCP）的定向自组装（DSA）的方法，其中使用BCP和DSA形成铬（Cr）层状引导线 干Cr剥离工艺，并将Cr层状引导线图案蚀刻到衬底中以制造压印模板。
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