公开(公告)号：US09348219B2

公开(公告)日：2016-05-24

申请号：US14612145

申请日：2015-02-02

Applicant: Seagate Technology LLC

Inventor： Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

IPC: G03F7/00 ,  C09K13/00 ,  G03F7/40 ,  G11B5/74 ,  G11B5/855

CPC classification number: G03F7/0002 ,  C09K13/00 ,  G03F7/40 ,  G11B5/746 ,  G11B5/855

Abstract: Provided herein are methods for depositing a spin-on-glass composition over an imprinted resist; curing the spin-on-glass composition to form a cured spin-on-glass composition; and forming a patterned mask by etching the cured spin-on-glass composition, the resist, and an underlying mask composition, wherein the patterned mask comprises features of the cured spin-on-glass composition atop the mask composition, and wherein curing the spin-on-glass composition is configured to prevent shifting or toppling of the spin-on glass composition from atop the mask composition while forming the patterned mask.

Abstract translation: 本文提供了在旋涂玻璃组合物上沉积抗蚀剂的方法; 固化旋涂玻璃组合物以形成固化的旋涂玻璃组合物; 并通过蚀刻固化的旋涂玻璃组合物，抗蚀剂和下面的掩模组合物来形成图案化掩模，其中图案化掩模包括固化的旋涂玻璃组合物在掩模组合物上的特征，并且其中固化旋转 玻璃组合物构造成在形成图案化掩模的同时防止旋涂玻璃组合物从掩模组合物顶部移位或倒下。

公开(公告)号：US09626996B2

公开(公告)日：2017-04-18

申请号：US14588865

申请日：2015-01-02

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Zhaoning Yu ,  Kim Yang Lee ,  Michael Feldbaum ,  Yautzong Hsu ,  Wei Hu ,  Shuaigang Xiao ,  Henry Yang ,  HongYing Wang ,  Rene Johannes Marinus van de Veerdonk ,  David Kuo

IPC: G03F7/004 ,  G11B5/855 ,  H01L21/3065 ,  G03F7/40 ,  H01L21/027 ,  G03F7/20 ,  H01L21/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B81C1/00 ,  B32B27/36 ,  B32B27/28 ,  B32B27/30 ,  B32B3/30 ,  G03F7/16 ,  B05D1/00 ,  C23F4/00

CPC classification number: G11B5/855 ,  B05D1/005 ,  B32B3/30 ,  B32B27/283 ,  B32B27/302 ,  B32B27/308 ,  B32B27/36 ,  B32B2457/14 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C23F4/00 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/2022 ,  G03F7/203 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/3065 ,  Y10T428/24612

Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

公开(公告)号：US09299609B2

公开(公告)日：2016-03-29

申请号：US14339052

申请日：2014-07-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/66 ,  G01R31/26 ,  H01L21/768

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案，其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。

公开(公告)号：US20160027681A1

公开(公告)日：2016-01-28

申请号：US14339052

申请日：2014-07-23

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/768

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

Abstract translation: 提供一种包括基板的装置; 第一硬掩模图案，其包括设置在所述基板的顶表面上的多个第一特征; 以及设置在第一硬掩模层上的第二硬掩模图案。 第二硬掩模图案包括与第一特征中的一个或多个重叠的多个第二特征。

公开(公告)号：US09837274B2

公开(公告)日：2017-12-05

申请号：US15055303

申请日：2016-02-26

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/00 ,  H01L21/033 ,  G03F7/00 ,  G11B5/74

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

公开(公告)号：US09797924B2

公开(公告)日：2017-10-24

申请号：US14783403

申请日：2013-04-17

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Gennady Gauzner ,  Zhaoning Yu ,  Nobuo Kurataka ,  David S. Kuo ,  Kim Y Lee ,  Yautzong Hsu ,  Hong Ying Wang

IPC: B32B3/02 ,  G01Q40/02 ,  G01Q40/00 ,  G03F7/00 ,  H01J37/26 ,  G01N21/01

CPC classification number: G01Q40/02 ,  G01N21/01 ,  G01N2201/13 ,  G01Q40/00 ,  G03F7/0002 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/2602 ,  H01J2237/2826

Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

公开(公告)号：US20150118625A1

公开(公告)日：2015-04-30

申请号：US14588865

申请日：2015-01-02

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Zhaoning Yu ,  Kim Yang Lee ,  Michael Feldbaum ,  Yautzong Hsu ,  Wei Hu ,  Shuaigang Xiao ,  Henry Yang ,  HongYing Wang ,  Rene Johannes Marinus van de Veerdonk ,  David Kuo

IPC: G11B5/855 ,  C23F4/00 ,  G03F7/20 ,  B05D1/00

CPC classification number: G11B5/855 ,  B05D1/005 ,  B32B3/30 ,  B32B27/283 ,  B32B27/302 ,  B32B27/308 ,  B32B27/36 ,  B32B2457/14 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C23F4/00 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/165 ,  G03F7/2022 ,  G03F7/203 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/3065 ,  Y10T428/24612

Abstract: Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

Abstract translation: 本文提供了一种方法，包括：a）将初始模板的初始图案转移到衬底; b）以密度倍增因子k在衬底上进行嵌段共聚物自组装; c）使用密度倍增因子k在后续模板中创建后续模式; 和d）重复步骤a）-c），随后的模板作为初始模板，直到满足关于模式密度和模式分辨率的后续模式的设计规范。

公开(公告)号：US20160181102A1

公开(公告)日：2016-06-23

申请号：US15055303

申请日：2016-02-26

Applicant: Seagate Technology LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Yautzong Hsu ,  Zhaoning Yu ,  Kim Y. Lee ,  David S. Kuo

IPC: H01L21/033

CPC classification number: H01L21/0338 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337

Abstract: Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

公开(公告)号：US20160069929A1

公开(公告)日：2016-03-10

申请号：US14783403

申请日：2013-04-17

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Gennady Gauzner ,  Zhaoning Yu ,  Nobuo Kurataka ,  David S. Kuo ,  Kim Y. Lee ,  Yautzong Hsu ,  Hong Ying Wang

IPC: G01Q40/02 ,  G01N21/01 ,  H01J37/26

CPC classification number: G01Q40/02 ,  G01N21/01 ,  G01N2201/13 ,  G01Q40/00 ,  G03F7/0002 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/2602 ,  H01J2237/2826

Abstract: Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

Abstract translation: 本文提供的装置包括基板; 功能层，其中所述功能层具有分析装置的工件的成分特征; 以及配置成校准分析装置的预定特征。 本文还提供了一种装置，包括覆盖衬底的功能层; 以及用于校准配置成测量工件表面的分析装置的预定特征，其中所述功能层具有类似于所述工件的组成。 本文还提供了一种方法，包括向分析装置提供具有功能层的光刻校准标准，其中功能层具有分析装置的工件的成分特征; 向与分析仪器连接的计算机提供校准标准规格; 并根据校准标准读数和校准标准规格校准分析仪器。

公开(公告)号：US20150155164A1

公开(公告)日：2015-06-04

申请号：US14612145

申请日：2015-02-02

Applicant: Seagate Technology LLC

Inventor： Zhaoning Yu ,  Nobuo Kurataka ,  Gennady Gauzner

IPC: H01L21/02 ,  H01L21/033 ,  H01L21/311

CPC classification number: G03F7/0002 ,  C09K13/00 ,  G03F7/40 ,  G11B5/746 ,  G11B5/855

Abstract: Provided herein are methods for depositing a spin-on-glass composition over an imprinted resist; curing the spin-on-glass composition to form a cured spin-on-glass composition; and forming a patterned mask by etching the cured spin-on-glass composition, the resist, and an underlying mask composition, wherein the patterned mask comprises features of the cured spin-on-glass composition atop the mask composition, and wherein curing the spin-on-glass composition is configured to prevent shifting or toppling of the spin-on glass composition from atop the mask composition while forming the patterned mask.

Abstract translation: 本文提供了在旋涂玻璃组合物上沉积抗蚀剂的方法; 固化旋涂玻璃组合物以形成固化的旋涂玻璃组合物; 并通过蚀刻固化的旋涂玻璃组合物，抗蚀剂和下面的掩模组合物来形成图案化掩模，其中图案化掩模包括固化的旋涂玻璃组合物在掩模组合物上的特征，并且其中固化旋转 玻璃组合物构造成在形成图案化掩模的同时防止旋涂玻璃组合物从掩模组合物顶部移位或倒下。