公开(公告)号：US20230073867A1

公开(公告)日：2023-03-09

申请号：US17940207

申请日：2022-09-08

Applicant: SEMES CO., LTD. ,  SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Jung Suk GOH ,  A Rah CHO ,  Woo Sin JUNG ,  Dae Sung KIM ,  Hae Kyung KIM ,  Hyungmin PARK ,  Jungjin LEE ,  Linfeng PIAO ,  Jubeom LEE

IPC: G03F7/16

Abstract: Provided is a liquid supplying apparatus including: a trap tank for receiving a liquid from a storage bottle in which the liquid is stored and accommodating the received liquid; a pipe for connecting the storage bottle and the trap tank; and a valve installed on the pipe and for opening and closing a flow path of the pipe, in which the valve is installed closer to the storage bottle than the trap tank.

公开(公告)号：US20230173520A1

公开(公告)日：2023-06-08

申请号：US18059681

申请日：2022-11-29

Applicant: SEMES CO., LTD.

Inventor： Hae Kyung KIM ,  Dae Sung KIM ,  Woo Sin JUNG

IPC: B05B12/08 ,  G03F7/16

CPC classification number: B05B12/081 ,  G03F7/16

Abstract: Provided is a pressurizing apparatus that pressurizes a photoresist. In an embodiment, the pressurizing apparatus includes: a housing including a wall surface defining an internal space; a film separating the internal space into a first space and a second space; a first inlet which is in communication with the first space; a second outlet which is in communication with the first space; and a pressurization gas inlet which is in communication with the second space, and in the housing, a transverse section of the internal space has a large width of a first direction and a small width of a second direction perpendicular to the first direction, and the width of the internal space in the second direction includes a section which is narrowed toward a second side which is the other side from a first side which is one side in the first direction.

公开(公告)号：US20230215745A1

公开(公告)日：2023-07-06

申请号：US17990819

申请日：2022-11-21

Applicant: SEMES CO., LTD.

Inventor： Woo Sin JUNG ,  Young CHOI ,  Dae Sung KIM ,  Hae Kyung KIM ,  Dongwoon PARK

IPC: H01L21/67

CPC classification number: H01L21/6715

Abstract: A liquid trap tank and a liquid supply unit for the liquid trap tank are provided. The liquid trap tank includes a tank body which has an accommodating space formed therein to accommodate a liquid and has an inlet portion formed on one side and an outlet portion formed on an opposite side; and a liquid supply unit coupled to the inlet of the tank body to supply the liquid from the outside of the tank body to the accommodating space, wherein the liquid supply unit comprises an inlet pipe portion coupled to the inlet portion to introduce the liquid into the accommodating space and a flow directing portion connected to the inlet pipe portion and configured to induce a flow of the liquid to suppress generation of air bubbles due to a drop of the liquid passing through the inlet pipe portion.

公开(公告)号：US20230201844A1

公开(公告)日：2023-06-29

申请号：US18145952

申请日：2022-12-23

Applicant: SEMES CO., LTD

Inventor： A Rah CHO ,  Woo Sin JUNG ,  Hae Kyung KIM ,  Dae Sung KIM

IPC: B05B1/00 ,  B05B12/08 ,  B05B15/20 ,  B05B15/50

CPC classification number: B05B1/005 ,  B05B12/088 ,  B05B15/20 ,  B05B15/50

Abstract: Provided is an equipment for treating a substrate. The substrate treating equipment may include: a nozzle supplying a chemical solution to a substrate; and a chemical solution supply apparatus supplying the chemical solution to the nozzle, and the chemical solution supply apparatus may include a pump member, an extraction nozzle provided on a flow path through which the chemical solution is introduced into the pump member and spraying the chemical solution by a spray scheme, and a control unit controlling an operation of the pump member.

公开(公告)号：US20230176482A1

公开(公告)日：2023-06-08

申请号：US18060629

申请日：2022-12-01

Applicant: SEMES CO., LTD.

Inventor： Hae Kyung KIM ,  Dae Sung Kim ,  Woo Sin Jung

IPC: G03F7/16 ,  B05C11/10

CPC classification number: G03F7/16 ,  B05C11/1026 ,  B05C11/1013 ,  B05C11/1036

Abstract: Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.