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    LEAD MEMBER
    3.
    发明申请
    LEAD MEMBER 有权

    公开(公告)号：US20220190447A1

    公开(公告)日：2022-06-16

    申请号：US17262871

    申请日：2020-06-10

    申请人： SUMITOMO ELECTRIC INDUSTRIES, LTD.

    发明人： Takashi SHIMAMURA ,  Kengo GOTO ,  Yusuke KUREISHI ,  Akihisa HOSOE

    IPC分类号： H01M50/534 ,  C25D11/14

    摘要： A lead member includes: a lead conductor having a first main surface and a second main surface that is an opposite side of the first main surface; and a resin portion, while exposing both end portions of the lead conductor in a first direction, covering the first main surface, the second main surface, and both side surfaces between the both end portions of the lead conductor, wherein the lead conductor includes a metal substrate, and a colored layer formed on at least a portion of a surface of the metal substrate, wherein in an entire wavelength band of 220 nm or more and 850 nm or less, when a total reflectance of barium sulfate is defined as 1.0, a regular reflectance of the colored layer is 0.3 or less.

    MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR ALUMINUM FILM
    9.
    发明申请
    MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR ALUMINUM FILM 审中-公开
    铝薄膜的制造方法和制造设备

    公开(公告)号：US20170002474A1

    公开(公告)日：2017-01-05

    申请号：US15114871

    申请日：2015-01-26

    申请人： SUMITOMO ELECTRIC INDUSTRIES, LTD.

    发明人： Junichi NISHIMURA ,  Akihisa HOSOE ,  Kazuki OKUNO ,  Koutarou KIMURA ,  Kengo GOTO ,  Hideaki SAKAIDA ,  Junichi MOTOMURA

    IPC分类号： C25D5/56 ,  C25D21/04 ,  C25D7/06 ,  C25D3/66 ,  C25D5/00

    CPC分类号： C25D5/56 ,  C25D1/08 ,  C25D3/66 ,  C25D3/665 ,  C25D5/003 ,  C25D7/0614 ,  C25D7/0621 ,  C25D17/004 ,  C25D21/04

    摘要： Provided are a manufacturing method and a manufacturing apparatus for an aluminum film in which moisture and oxygen do not intrude into a plating chamber. A manufacturing method for an aluminum film, in which aluminum is electrodeposited on a surface of a long, porous resin substrate imparted with electrical conductivity in a molten salt electrolytic solution, includes a step of transferring the substrate W into a plating chamber 1 through a sealing chamber 4 disposed on the entrance side of the plating chamber; a step of electrodepositing an aluminum film on the surface of the substrate W in the plating chamber 1; and a step of transferring the substrate having the aluminum film electrodeposited thereon from the plating chamber 1 through a sealing chamber 5 disposed on the exit side of the plating chamber 1, in which an inert gas is supplied into the plating chamber such that the plating chamber has a positive pressure relative to outside air, and the inert gas is forcibly discharged from an inert gas exhaust pipe 7 provided on each of the two sealing chambers.

    摘要翻译： 提供了一种铝膜的制造方法和制造装置，其中水分和氧气不会侵入电镀室。 一种铝膜的制造方法，其中将铝电解沉积在在熔融盐电解液中具有导电性的长的多孔树脂基板的表面上，包括通过密封将基板W转移到电镀室1中的步骤 设置在电镀室的入口侧的腔室4; 电镀室1中的基板W的表面上电沉积铝膜的步骤; 以及通过设置在电镀室1的出口侧的密封室5将从电镀室1电沉积有铝膜的基板转移到电镀室中的步骤，其中惰性气体被供应到电镀室中，使得电镀室 相对于外部空气具有正压力，并且惰性气体被强制地从设置在两个密封室中的惰性气体排出管7排出。