公开(公告)号：US12031076B2

公开(公告)日：2024-07-09

申请号：US18122706

申请日：2023-03-17

Applicant: Samsung Display Co., Ltd.

Inventor： Jonghee Park ,  Hyoung Sik Kim ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  Suck Jun Lee ,  Youngmin Kim ,  Jinhyung Kim ,  Donghun Lee ,  Kyu-Hun Lim ,  Dongmin Jang

IPC: C09K13/06 ,  C23F1/02 ,  C23F1/44 ,  H10K59/12 ,  H10K71/00 ,  H10K71/20

CPC classification number: C09K13/06 ,  C23F1/02 ,  C23F1/44 ,  H10K59/1201 ,  H10K71/233 ,  H10K71/621

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

公开(公告)号：US11869903B2

公开(公告)日：2024-01-09

申请号：US17554078

申请日：2021-12-17

Applicant: Samsung Display Co., LTD.

Inventor： Jonghee Park ,  Jin Seock Kim

IPC: H01L27/12 ,  H01L21/3213 ,  H10K59/12

CPC classification number: H01L27/1259 ,  H01L21/32134 ,  H01L21/32139 ,  H10K59/12 ,  H10K59/1201

Abstract: A method of manufacturing a display apparatus includes forming a first conductive layer on a base substrate including a panel area and a margin area disposed next to the panel area, the margin area including a dummy pattern area, forming a photoresist layer on the first conductive layer, forming a photoresist pattern by exposing and developing the photoresist layer, forming a first conductive pattern by etching the first conductive layer using the photoresist pattern, and removing the photoresist pattern. The forming the first conductive pattern includes forming a first pixel circuit pattern in the panel area, and forming a dummy pattern in the dummy pattern area of the margin area. An opening ratio of a portion where the dummy pattern is not formed with respect to the dummy pattern area is about 30% or more.

公开(公告)号：US20230167360A1

公开(公告)日：2023-06-01

申请号：US17994173

申请日：2022-11-25

Applicant: Samsung Display Co., Ltd. ,  ENF TECHNOLOGY CO., LTD.

Inventor： Hyoungsik Kim ,  Jonghee Park ,  Sehoon Kim ,  Boyeon Lee ,  Yangryeong Kim ,  Seokil Jung ,  Ikjoon Kim ,  Sangseung Park ,  Wonho Noh ,  Mingyeong Jeong

IPC: C09K13/06 ,  C23F1/30 ,  C23F1/16

CPC classification number: C09K13/06 ,  C23F1/30 ,  C23F1/16

Abstract: An etchant composition is disclosed that provides selective etching of an indium oxide film or a sliver-containing metal layer. The etchant composition includes nitric acid, an organic acid, a sulfur compound, and a tin compound. The organic acid does not include the elements of sulfur and tin. The sulfur compound does not include the element of tin. The etchant composition may minimize the damage of a lower metal film and may exhibit excellent etching characteristics in terms of etching rate, bias, residue, precipitation, and etching uniformity.

公开(公告)号：US10723946B2

公开(公告)日：2020-07-28

申请号：US16157054

申请日：2018-10-10

Applicant: Samsung Display Co., Ltd. ,  Dongwoo Fine-Chem Co., Ltd.

Inventor： Jonghee Park ,  Kitae Kim ,  Jinseock Kim ,  Beomsoo Kim ,  Sangtae Kim ,  Kyungbo Shim ,  Giyong Nam ,  Youngjin Yoon ,  Daesung Lim

IPC: C09K13/06 ,  H01L27/12 ,  H01L51/52 ,  H01L51/56 ,  H01L51/00 ,  H01L27/32

Abstract: An etchant includes: based on a total weight of the etchant, about 1 wt % to about 15 wt % of sulfurized peroxide, about 5 wt % to about 10 wt % of nitric acid, about 20 wt % to about 40 wt % of organic acid, about 0.05 wt % to about 5 wt % of ferric nitrate, about 0.1 wt % to about 5 wt % of ionic sequestrant, and 0.1 wt % to 5 wt % of corrosion inhibitor, wherein a remaining amount is deionized water.

公开(公告)号：US11639470B2

公开(公告)日：2023-05-02

申请号：US17388712

申请日：2021-07-29

Applicant: Samsung Display Co., Ltd.

Inventor： Jonghee Park ,  Hyoung Sik Kim ,  O Byoung Kwon ,  Gi-Yong Nam ,  Kyungchan Min ,  Suck Jun Lee ,  Youngmin Kim ,  Jinhyung Kim ,  Donghun Lee ,  Kyu-Hun Lim ,  Dongmin Jang

IPC: C09K13/06 ,  C23F1/44 ,  H01L51/00 ,  C23F1/02

Abstract: An etching composition for a silver-containing thin film, the etching composition comprising an inorganic acid compound, a sulfonic acid compound, an organic acid compound, a nitrate, a metal oxidizing agent, an amino acid compound, and water.

公开(公告)号：US11091694B2

公开(公告)日：2021-08-17

申请号：US16579073

申请日：2019-09-23

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jonghee Park ,  Kitae Kim ,  Jinseock Kim ,  Gyu-Po Kim ,  Hyun-Cheol Shin ,  Dae-Woo Lee ,  Sang-Hyuk Lee ,  Zheng Hong

IPC: C09K13/06 ,  C23F1/16 ,  C09G1/00 ,  H01L21/3213

Abstract: An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

公开(公告)号：US10825876B2

公开(公告)日：2020-11-03

申请号：US16553257

申请日：2019-08-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Young Dae Kim ,  Jin Seock Kim ,  Kitae Kim ,  Jonghee Park

IPC: H01L27/32 ,  H01L51/00 ,  H01L51/50 ,  H01L51/52 ,  H01L51/56

Abstract: A display device includes an insulating layer disposed on a substrate, a pixel electrode including a first conductive layer, a second conductive layer, and a third conductive layer sequentially stacked on the insulating layer, a pixel defining layer covering the pixel electrode and partially exposing the pixel electrode through an opening, an organic light emitting layer disposed in the opening of the pixel defining layer, and an opposing electrode disposed on the organic light emitting layer and overlapping the pixel electrode. A length of the first conductive layer is less than a length of the second conductive layer.

公开(公告)号：US11683975B2

公开(公告)日：2023-06-20

申请号：US16953047

申请日：2020-11-19

Applicant: Samsung Display Co., Ltd.

Inventor： Jonghee Park ,  Jinseock Kim

IPC: H01L51/00 ,  C09K13/06 ,  H01L27/32 ,  H01L51/52 ,  H01L51/56

CPC classification number: H01L51/0017 ,  C09K13/06 ,  H01L27/3244 ,  H01L51/5215 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/301

Abstract: An etchant composition includes an inorganic acid compound of about 8 wt % to about 15 wt %, a sulfonic acid compound of about 2.5 wt % to about 8 wt %, a sulfate compound of about 6 wt % to about 14 wt %, an organic acid compound of about 40 wt % to about 55 wt %, a metal or metal salt of about 0.01 wt % to about 0.06 wt %, and water.

公开(公告)号：US11508762B2

公开(公告)日：2022-11-22

申请号：US17159518

申请日：2021-01-27

Applicant: Samsung Display Co., Ltd.

Inventor： Youngdae Kim ,  Jinseock Kim ,  Jonghee Park

IPC: H01L27/12 ,  H01L21/67 ,  H01L21/3213 ,  H01L21/677

Abstract: A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.

公开(公告)号：US11407943B2

公开(公告)日：2022-08-09

申请号：US16575593

申请日：2019-09-19

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jonghee Park ,  Kitae Kim ,  Jinseock Kim ,  Gyu-Po Kim ,  Hyun-Cheol Shin ,  Dae-Woo Lee ,  Sang-Hyuk Lee

IPC: C09K13/06 ,  C23F1/16

Abstract: An etching composition for a silver-containing thin film includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a metal-based oxidizer, and water.