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公开(公告)号：US09612212B1
公开(公告)日：2017-04-04
申请号：US14954158
申请日：2015-11-30
发明人： Choonshik Leem , Chungsam Jun
IPC分类号： G01N21/00 , G01N21/956 , G01N21/21 , G01N21/88 , H01L21/66 , H01L21/768
CPC分类号： G01N21/956 , G01N21/211 , G01N21/8806 , G01N2021/8848 , G01N2201/0683 , G01N2201/12 , H01L21/76816 , H01L21/76877 , H01L22/12
摘要： An ellipsometer includes a stage, a light source, a polarizer, a detector, and a processor. The stage is configured to support a substrate including a pattern. The light source is configured to emit illumination toward the substrate. The polarizer is configured to polarize the illumination. The detector is configured to generate, in association with a plurality of azimuthal angles, data corresponding to polarized illumination reflected from the substrate. The processor is configured to: control rotation of the stage in association with sequential inspection of the pattern at the plurality of azimuthal angles, and determine asymmetry of the pattern based on the data. Each azimuthal angle of the plurality of azimuthal angles corresponds to a different rotational state of the stage.
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公开(公告)号：US09360308B2
公开(公告)日：2016-06-07
申请号：US14248673
申请日：2014-04-09
发明人： Byung Hyun Hwang , Kwang-Hoon Kim , Woongkyu Son , Chulgi Song , Choonshik Leem
摘要： A method for analyzing an object includes measuring a first reflectivity of light from a surface and measuring a second reflectivity of light from the object, after the object is formed on the surface. A variation between the first and second reflectivities is calculated, and the variation is transformed by a predetermined transform. A thickness of the object is determined based on the transformed variation.
摘要翻译： 用于分析物体的方法包括在物体形成在表面上之后测量来自表面的光的第一反射率和测量来自物体的光的第二反射率。 计算第一和第二反射率之间的变化，并且通过预定变换来变换变化。 基于变换的变化确定对象的厚度。
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公开(公告)号：US10949949B2
公开(公告)日：2021-03-16
申请号：US16402375
申请日：2019-05-03
发明人： Choonshik Leem , Taelim Choi , Yongdeok Kim
摘要： A non-transitory computer-readable medium for monitoring a semiconductor fabrication process includes an image conversion model having an artificial neural network. The image conversion model, when executed, causes the processor to receive a first image and a second image of a semiconductor wafer. The artificial neural network is trained by inputting a dataset representing the first image and the second image, generating a conversion image of the semiconductor wafer and calibrating weights and biases of the artificial neural network to match the conversion image to the second image. A third image of the semiconductor wafer is generated based on the calibrated weights and biases of the artificial neural network. The image conversion model with the trained artificial neural network may be transmitted to another device for image conversion of low resolution images.
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公开(公告)号：US10373882B2
公开(公告)日：2019-08-06
申请号：US15969247
申请日：2018-05-02
发明人： Choonshik Leem , Jihye Lee , Deokyong Kim , Soobok Chin
IPC分类号： G01N21/95 , G01N21/956 , H01J37/28 , H01L21/66
摘要： The measurement method may include obtaining first measurement data from a recess region formed in a semiconductor substrate, obtaining second measurement data from a conductive pattern filling a portion of the recess region, calculating a first volume of the recess region from the first measurement data, calculating a second volume of the conductive pattern from the second measurement data, and calculating a measurement target parameter using a difference between the first and second volumes.
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公开(公告)号：US09719946B2
公开(公告)日：2017-08-01
申请号：US15449423
申请日：2017-03-03
发明人： Choonshik Leem , Chungsam Jun
IPC分类号： H01L21/00 , G01N21/956 , G01N21/21 , G01N21/88 , H01L21/66
CPC分类号： G01N21/956 , G01N21/211 , G01N21/8806 , G01N2021/8848 , G01N2201/0683 , G01N2201/12 , H01L21/76816 , H01L21/76877 , H01L22/12
摘要： An ellipsometer includes a stage, a light source, a polarizer, a detector, and a processor. The stage is configured to support a substrate including a pattern. The light source is configured to emit illumination toward the substrate. The polarizer is configured to polarize the illumination. The detector is configured to generate, in association with a plurality of azimuthal angles, data corresponding to polarized illumination reflected from the substrate. The processor is configured to: control rotation of the stage in association with sequential inspection of the pattern at the plurality of azimuthal angles, and determine asymmetry of the pattern based on the data. Each azimuthal angle of the plurality of azimuthal angles corresponds to a different rotational state of the stage.
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