MULTIBAND ANTENNA AND ELECTRONIC DEVICE INCLUDING THE SAME
    7.
    发明申请
    MULTIBAND ANTENNA AND ELECTRONIC DEVICE INCLUDING THE SAME 审中-公开
    包括其中的多天线天线和电子设备

    公开(公告)号:US20160352015A1

    公开(公告)日:2016-12-01

    申请号:US15165415

    申请日:2016-05-26

    Abstract: An electronic device is provided. The electronic device includes a housing including a first surface, a second surface facing the first surface, and side surfaces surrounding a space between the first surface and the second surface, a first conductive member and a second conductive member forming at least part of the side surfaces, being parallel to the first surface, and extending parallel to each other, a first nonconductive member disposed between the first conductive member and the second conductive member to electrically isolate the first conductive member and the second conductive member from each other, and a communication circuit that performs wireless communication by using the first conductive member and the second conductive member as radiators.

    Abstract translation: 提供电子设备。 电子设备包括壳体,其包括第一表面,面向第一表面的第二表面和围绕第一表面和第二表面之间的空间的侧表面,第一导电构件和形成至少一部分侧面的第二导电构件 表面平行于第一表面并且彼此平行延伸;第一非导电构件,设置在第一导电构件和第二导电构件之间,以将第一导电构件和第二导电构件彼此电隔离;以及通信 电路,其通过使用第一导电构件和第二导电构件作为散热器执行无线通信。

    DISCHARGING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20240226920A9

    公开(公告)日:2024-07-11

    申请号:US18465524

    申请日:2023-09-12

    CPC classification number: B05B1/02

    Abstract: According to at least one example embodiment, a substrate treating apparatus includes a substrate support structure including a spin head, the substrate support structure configured to support a substrate, and rotate the substrate, at least one treating liquid recovery container configured to recover at least one substrate treating liquid, and a discharging device including a first nozzle and a second nozzle, the first nozzle configured to discharge a chemical onto the substrate, and the second nozzle configured to discharge deionized water onto the substrate, wherein the first nozzle includes a surface pattern configured to provide roughness on an inner surface of the first nozzle.

    DISCHARGING DEVICE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20240131532A1

    公开(公告)日:2024-04-25

    申请号:US18465524

    申请日:2023-09-11

    CPC classification number: B05B1/02

    Abstract: According to at least one example embodiment, a substrate treating apparatus includes a substrate support structure including a spin head, the substrate support structure configured to support a substrate, and rotate the substrate, at least one treating liquid recovery container configured to recover at least one substrate treating liquid, and a discharging device including a first nozzle and a second nozzle, the first nozzle configured to discharge a chemical onto the substrate, and the second nozzle configured to discharge deionized water onto the substrate, wherein the first nozzle includes a surface pattern configured to provide roughness on an inner surface of the first nozzle.

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