ELECTROSTATIC CHUCK DEVICE AND CONTROL METHOD THEREOF
    3.
    发明申请
    ELECTROSTATIC CHUCK DEVICE AND CONTROL METHOD THEREOF 审中-公开
    静电切割装置及其控制方法

    公开(公告)号:US20130224675A1

    公开(公告)日:2013-08-29

    申请号:US13778328

    申请日:2013-02-27

    Inventor: Myoung Soo PARK

    CPC classification number: F27D5/00 F27D5/0037

    Abstract: An electrostatic chuck device includes a surface to support a substrate, an electrode to generate electrostatic force for the substrate, and a plurality of heaters to heat different regions of the surface. The plurality of heaters include a first heater to heat a first region to a first temperature, a second heater to heat a second region to a second temperature, and a third heater to heat a third region to a third temperature between the first and second temperatures. The second region is closer to a peripheral area of the surface than the first region, and the third region between the first and second regions.

    Abstract translation: 静电吸盘装置包括用于支撑衬底的表面,用于为衬底产生静电力的电极,以及用于加热表面的不同区域的多个加热器。 多个加热器包括将第一区域加热至第一温度的第一加热器,将第二区域加热至第二温度的第二加热器,以及将第三区域加热至第一和第二温度之间的第三温度的第三加热器 。 第二区域比第一区域更靠近表面的周边区域,并且第一区域和第二区域之间的第三区域。

    ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20190148205A1

    公开(公告)日:2019-05-16

    申请号:US16248328

    申请日:2019-01-15

    Abstract: An electrostatic chuck includes a base, a dielectric plate on the base, a chuck electrode in the dielectric plate, and a lower heater section including lower heaters in the dielectric plate between the chuck electrode and the base, and a lower ground electrode between the lower heaters and the base. The chuck further includes an upper heater section including upper heaters between the lower heaters and the chuck electrode, and a upper ground electrode between the upper heaters and the lower heaters, and a plurality of via contact electrodes connecting the upper ground electrode into the lower ground electrode.

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