METHOD FOR INDICATING A DM-RS ANTENNA PORT IN A WIRELESS COMMUNICATION SYSTEM
    1.
    发明申请
    METHOD FOR INDICATING A DM-RS ANTENNA PORT IN A WIRELESS COMMUNICATION SYSTEM 审中-公开
    在无线通信系统中显示DM-RS天线端口的方法

    公开(公告)号:US20150382356A1

    公开(公告)日:2015-12-31

    申请号:US14846045

    申请日:2015-09-04

    Abstract: A control information interpretation method of a terminal and a base station in a mobile communication system, and a terminal and a base station concerning the same, respectively, are provided. The control information interpretation method of a terminal includes receiving, by the terminal, control information including transport block information and antenna port related information; identifying whether a codeword 0 is enabled and a codeword 1 is disabled, or both the codeword 0 and the codeword 1 are enabled based on the transport block information; and interpreting the antenna port related information according to a result of the identification.

    Abstract translation: 提供移动通信系统中的终端和基站的控制信息解释方法,以及分别涉及其的终端和基站。 终端的控制信息解释方法包括:由终端接收包括传输块信息和天线端口相关信息的控制信息; 识别代码字0是否被使能,并且码字1被禁用,或者码字0和码字1都基于传输块信息被使能; 并根据识别的结果解释天线端口相关信息。

    METHOD AND APPARATUS FOR TRANSMITTING/RECEIVING A REFERENCE SIGNAL IN A WIRELESS COMMUNICATION SYSTEM
    3.
    发明申请
    METHOD AND APPARATUS FOR TRANSMITTING/RECEIVING A REFERENCE SIGNAL IN A WIRELESS COMMUNICATION SYSTEM 审中-公开
    用于在无线通信系统中发送/接收参考信号的方法和装置

    公开(公告)号:US20130142121A1

    公开(公告)日:2013-06-06

    申请号:US13716834

    申请日:2012-12-17

    Abstract: A method and apparatus for transmitting/receiving reference signals in Long Term Evolution (LTE) and LTE-Advanced (LTE-A) systems includes determining whether a dedicated reference signal is detected in a current subframe; estimating, if a dedicated reference signal is detected in the current subframe, a data channel using the dedicated reference signal to receive data; and estimating, if no dedicated reference signal is detected in the current subframe, a data channel using a common reference signal detected in the current subframe to receive data. The transmission scheme uses a DeModulation Reference Signal (DM-RS) for channel response estimation. To secure backward compatibility of the LTE-A system, a Common Reference Signal is transmitted in normal subframes.

    Abstract translation: 一种用于在长期演进(LTE)和LTE高级(LTE-A)系统中发送/接收参考信号的方法和装置,包括确定在当前子帧中是否检测到专用参考信号; 如果在当前子帧中检测到专用参考信号,则估计使用专用参考信号接收数据的数据信道; 以及如果在当前子帧中没有检测到专用参考信号,则估计使用当前子帧中检测到的公共参考信号的数据信道来接收数据。 传输方案使用解调参考信号(DM-RS)进行信道响应估计。 为了确保LTE-A系统的向后兼容性,在普通子帧中传送公共参考信号。

    CHEMICAL VAPOR DEPOSITION APPARATUS HAVING SUSCEPTOR
    7.
    发明申请
    CHEMICAL VAPOR DEPOSITION APPARATUS HAVING SUSCEPTOR 审中-公开
    具有SUSCEPTOR的化学气相沉积装置

    公开(公告)号:US20130255578A1

    公开(公告)日:2013-10-03

    申请号:US13798772

    申请日:2013-03-13

    CPC classification number: H01L21/02104 C23C16/4584 C23C16/46

    Abstract: A chemical vapor deposition (CVD) apparatus including a chamber, a susceptor in the chamber, and a heating chamber may be provided. The susceptor includes a rotor, a rotational shaft coupled to a lower portion of the rotor, a driving device coupled to the rotational shaft, and at least one pocket defined at an upper surface of the rotor. The driving device rotatably drives the rotational shaft. The at least one pocket includes a mounting portion configured to receive a substrate thereon and a protruding portion, e.g., a convex portion, protruding from a bottom surface of the at least one pocket such that the protruding portion is positioned at a region corresponding to the rotational shaft. The heating unit surrounds the rotational shaft and heats the substrate.

    Abstract translation: 可以提供包括室,腔室中的基座和加热室的化学气相沉积(CVD)设备。 基座包括转子,联接到转子的下部的旋转轴,耦合到旋转轴的驱动装置和限定在转子的上表面的至少一个凹部。 驱动装置可旋转地驱动旋转轴。 所述至少一个口袋包括被配置为在其上容纳衬底的安装部分和从所述至少一个口袋的底表面突出的突出部分,例如凸起部分,使得所述突出部分位于对应于 旋转轴。 加热单元围绕旋转轴并加热基板。

    CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING SEMICONDUCTOR EPITAXIAL THIN FILM USING THE SAME
    10.
    发明申请
    CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING SEMICONDUCTOR EPITAXIAL THIN FILM USING THE SAME 审中-公开
    化学蒸气沉积装置及其形成使用其的半导体外延薄膜的方法

    公开(公告)号:US20150037920A1

    公开(公告)日:2015-02-05

    申请号:US14518948

    申请日:2014-10-20

    Abstract: A chemical vapor deposition apparatus includes: a reaction chamber including an inner tube having a predetermined volume of an inner space, and an outer tube tightly sealing the inner tube; a wafer holder disposed within the inner tube and on which a plurality of wafers are stacked at predetermined intervals; and a gas supply unit including at least one gas line supplying an external reaction gas to the reaction chamber, and a plurality of spray nozzles communicating with the gas line to spray the reaction gas to the wafers, whereby semiconductor epitaxial thin films are grown on the surfaces of the wafers, wherein the semiconductor epitaxial thin film grown on the surface of the wafer includes a light emitting structure in which a first-conductivity-type semiconductor layer, an active layer, and a second-conductivity-type semiconductor layer are sequentially formed.

    Abstract translation: 化学气相沉积装置包括:反应室,包括具有预定体积的内部空间的内管和紧密地密封内管的外管; 设置在所述内管内并且以预定间隔堆叠多个晶片的晶片保持架; 以及气体供给单元,其包括向反应室供给外部反应气体的至少一个气体管线,以及与气体管线连通的多个喷嘴,以将反应气体喷射到晶片,由此在其上生长半导体外延薄膜 晶片的表面,其中在晶片表面上生长的半导体外延薄膜包括其中顺序形成第一导电型半导体层,有源层和第二导电型半导体层的发光结构 。

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