摘要:
A precursor film having a required gallium component proportion is formed easily at low cost. A precursor film for use in forming the light absorption layer of a CIS type thin-film solar cell, etc., or a method for forming the film are provided. A Cu—Ga layer having a high gallium component proportion (Ga/(Ga+Cu)) of X % by weight Ga is formed as a first layer by sputtering using a precursor film comprising a Cu—Ga alloy layer having the gallium component proportion of X % by weight Ga as a target (deposition step A). Thereafter, a copper layer is formed as a second layer on the first layer by sputtering using a copper layer as a target (deposition step B) to thereby form a precursor film having the required gallium component proportion of Y % (X>Y) by weight Ga as the sum of the first layer and second layer. A method of film formation by simultaneous vapor deposition is also possible.
摘要:
Film formation is conducted at a low temperature to improve conversion efficiency and productivity and to enable a wider choice of substrate materials to be used. The invention relates to the light absorption layer of a CIS compound semiconductor thin-film solar cell and to a method of forming the layer. The light absorption layer comprises a compound represented by Cux(In1-yGay)(Se1-zSz)2 and having a chalcopyrite type structure, the proportions of the components satisfying 0.86≦x≦0.98, 0.05≦y≦0.25, 0≦z≦0.3, x=αT+β, α=0.015y−0.00025, and β=−7.9y+1.105, provided that T (° C.) is anneal temperature and the allowable range for x is ±0.02. The layer is formed by the selenization method at a low temperature (about 500≦T≦550). As the substrate is used a soda-lime glass having a low melting point.
摘要翻译:在低温下进行成膜以提高转换效率和生产率,并能够使用更广泛的基板材料。 本发明涉及CIS化合物半导体薄膜太阳能电池的光吸收层及其形成方法。 光吸收层包含由Cu x Si(In 1-y Ga y y)(Se 1-z)表示的化合物, 具有黄铜矿型结构,组分的比例满足0.86 <= x <= 0.98,0.05 <= y <= 0.25,0 <= z <= 0.3,x =αT+β,α= 0.015y-0.00025和β= -7.9y + 1.105,条件是T(℃)为退火温度,x的允许范围为±0.02。 该层通过硒化法在低温(约500 <= T <= 550)下形成。 由于使用的基材是低熔点的钠钙玻璃。
摘要:
A method of manufacturing a CIS-based thin film solar cell that achieves high photoelectric conversion efficiency comprises: forming a backside electrode layer on a substrate; forming a p-type CIS-based light absorbing layer thereon; and further forming an n-type transparent and electrically conductive film. The above-mentioned forming a p-type CIS-based light absorbing layer comprises: forming a metal precursor film (30a) at least comprising a first metal layer (31, 32) containing a I group element and a second metal layer (33) containing a III group element; and selenizing and/or sulfurizing the metal precursor film, and the above-mentioned forming the metal precursor film includes forming either one of the first metal layer (31, 32) or the second metal layer (33) of at least two layers including a layer (31) that contains an alkali metal and a layer (32) that substantially does not contain the alkali metal.
摘要:
In order to manufacture a CIS-based thin film solar cell that can achieve high photoelectric conversion efficiency by adding an alkali element to a light absorbing layer easily and with good controllability, a backside electrode layer (2) is formed on a substrate (1). Then, a p-type CIS-based light absorbing layer (3) is formed on backside electrode layer (2), and then an n-type transparent and electroconductive film (5) is formed on this p-type CIS-based light absorbing layer (3). At this time, the backside electrode layer (2) is constituted by forming a first electrode layer (21) using a backside electrode material in which an alkali metal is mixed and, then forming a second electrode layer (22) using the backside electrode material that does not substantially contain the alkali metal.
摘要:
A simple device is used to make the temperature in an apparatus even and improve the state of being in contact with reactant gases, selenium, and sulfur.A fan 3 as a device for atmosphere homogenization is disposed in an apparatus, and the work is disposed in the manner which enables a reactant gas to circulate smoothly. Namely, flat platy works 2 are disposed apart from each other at a certain distance parallel to the direction of the major axis of the apparatus while keeping the plates vertical so that the apparatus has passages within the group of works and has gas passages over and under the works and on both sides thereof. Thus, each work is apt to come into contact with the reactant gases in the apparatus and the temperature in the apparatus is even. The state of being in contact with the reactant gases, selenium, and sulfur is improved.
摘要:
In order to manufacture a CIS-based thin film solar cell that can achieve high photoelectric conversion efficiency by adding an alkali element to a light absorbing layer easily and with good controllability, a backside electrode layer (2) is formed on a substrate (1). Then, a p-type CIS-based light absorbing layer (3) is formed on backside electrode layer (2), and then an n-type transparent and electroconductive film (5) is formed on this p-type CIS-based light absorbing layer (3). At this time, the backside electrode layer (2) is constituted by forming a first electrode layer (21) using a backside electrode material in which an alkali metal is mixed and, then forming a second electrode layer (22) using the backside electrode material that does not substantially contain the alkali metal.
摘要:
The triethylaluminum contained as an impurity in low-purity raw-material diethylzinc, which is inexpensive, is utilized as an additive to reduce the cost of film formation. Diethylzinc having a low purity (99.99-98% or 99.99-90%) is used as a raw material to produce a ZnO transparent conductive film by the MOCVD (metal-organic chemical vapor deposition) method. Water vapor (H2O) is used as an oxidizing agent and the triethylaluminum contained as an impurity in the raw material is utilized as an additive (diborane is further added as an additive) to cause the diethylzinc, the water vapor (H2O), and the triethylaluminum (and the diborane) to undergo a vapor-phase reaction to produce a ZnO transparent conductive film.
摘要翻译:作为低成本的原料二乙基锌中的杂质含有的三乙基铝被用作添加剂以降低成膜成本。 使用低纯度的二乙基锌(99.99-98%或99.99-90%)作为原料,通过MOCVD(金属有机化学气相沉积)法制造ZnO透明导电膜。 使用水蒸汽(H 2 O 2)作为氧化剂,将作为原料的杂质含有的三乙基铝用作添加剂(进一步添加乙硼烷作为添加剂),使二乙基锌, 水蒸汽(H 2 O 2)和三乙基铝(和乙硼烷)进行气相反应以制备ZnO透明导电膜。
摘要:
This invention provides a CIS-based thin film solar battery and a process for producing the same in which the formation of an alkali barrier layer and a metal backside electrode layer is carried out at a low cost in a short time to prevent such an unfavorable phenomenon that a light absorbing layer is separated from the interface of the light absorbing layer and the metal backside electrode layer. The CIS-based thin film solar battery (1) comprises a glass substrate (2), an alkali-free layer (7) such as silica, a metal backside electrode layer (3) having a laminate structure, a p-type CIS-based light absorbing layer (4), a high-resistance buffer layer (5), and an n-type window layer (6) stacked in that order. The layer (7), either alone or together with a first layer (3a) in the layer (3), can function as an alkali barrier layer (8) that can prevent and control the thermal diffusion of an alkali component into the light absorbing layer during the formation of the layer (4) from the substrate (2). In the layer (3a), crystal grains are fine and has high density. After the formation of the layer (7) on the substrate by RF or DC sputtering, the layer (3) is continuously formed on the layer (7) by DC sputtering.
摘要:
If arc interruption occurs during AC arc welding, a first AC frequency predetermined for normal welding is switched to a second AC frequency higher than the first AC frequency. This allows the arc to be reignited without applying a high frequency high voltage, thereby preventing the damage of the surface of the weld bead or communication failure due to the high frequency high voltage.
摘要:
According to one embodiment, a process unit includes a process section present around an image bearing member, attached and detached to and from a body, including a rotating section, and configured to apply an image forming process to the image bearing member, a moving section present on a shaft of the rotating section and configured to slide to a first position close to the rotating section and a second position away from the rotating section, and a positioning section present between the rotating section and the moving section and configured to move following the rotating section and hold the moving section in the first position and the second position.