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14 条记录 (耗时 0.032 秒)

    Vacuum heating furnace with tapered portion
    3.
    发明授权
    Vacuum heating furnace with tapered portion 失效
    带锥形部分的真空加热炉

    公开(公告)号：US6093911A

    公开(公告)日：2000-07-25

    申请号：US83055

    申请日：1998-05-22

    申请人： Hiroki Kawada ,  Tomoji Watanabe ,  Nobuo Tsumaki ,  Toshimitsu Miyata

    发明人： Hiroki Kawada ,  Tomoji Watanabe ,  Nobuo Tsumaki ,  Toshimitsu Miyata

    IPC分类号： H01L21/22 ,  H01L21/00

    CPC分类号： H01L21/67115

    摘要： A vacuum heating furnace comprises a translucent container for retaining a heated object and a heating light source for heating a heated object retained in the translucent container. The translucent container has on its surface a tapered portion to receive transmitted light totally reflected on the inner surface of the translucent container at an angle smaller than a critical angle.

    摘要翻译： 真空加热炉包括用于保持加热物体的半透明容器和用于加热保持在半透明容器中的被加热物体的加热光源。 半透明容器在其表面上具有锥形部分，以小于临界角的角度接收在半透明容器的内表面上全反射的透射光。

    Vacuum heating furnace with tapered portion
    4.
    发明授权
    Vacuum heating furnace with tapered portion 失效
    带锥形部分的真空加热炉

    公开(公告)号：US06288368B1

    公开(公告)日：2001-09-11

    申请号：US09547316

    申请日：2000-04-11

    申请人： Hiroki Kawada ,  Tomoji Watanabe ,  Nobuo Tsumaki ,  Toshimitsu Miyata

    发明人： Hiroki Kawada ,  Tomoji Watanabe ,  Nobuo Tsumaki ,  Toshimitsu Miyata

    IPC分类号： A21B100

    CPC分类号： H01L21/67115

    摘要： A vacuum heating furnace comprises a translucent container for retaining a heated object and a heating light source for heating a heated object retained in the translucent container. The translucent container has on its surface a tapered portion to receive transmitted light totally reflected on the inner surface of the translucent container at an angle smaller than a critical angle.

    摘要翻译： 真空加热炉包括用于保持加热物体的半透明容器和用于加热保持在半透明容器中的被加热物体的加热光源。 半透明容器在其表面上具有锥形部分，以小于临界角的角度接收在半透明容器的内表面上全反射的透射光。

    Vibration-controlling bearing
    5.
    发明授权
    Vibration-controlling bearing 失效
    振动控制轴承

    公开(公告)号：US4602873A

    公开(公告)日：1986-07-29

    申请号：US672688

    申请日：1984-11-19

    申请人： Hideki Izumi ,  Nobuo Tsumaki ,  Kazuo Ihara

    发明人： Hideki Izumi ,  Nobuo Tsumaki ,  Kazuo Ihara

    IPC分类号： F16C27/00 ,  F16C27/02 ,  F16C33/10 ,  F16C17/02

    CPC分类号： F16C33/106 ,  F16C17/028 ,  F16C27/02

    摘要： A vibration-controlling bearing for controlling vibration developing in a rotary shaft supported in a housing of a rotary machine including a bearing member of a cylindrical shape interposed between an outer peripheral surface of the rotary shaft and an inner peripheral surface of the housing and spaced apart therefrom by respective gaps. A dynamic pressure is generated between an inner peripheral surface of the bearing member and the outer peripheral surface of the rotary shaft. Communicating ducts are formed in the bearing member for transmitting a portion of the dynamic pressure generated to a gap between the outer peripheral surface of the bearing member and the inner peripheral surface of the housing.

    摘要翻译： 一种用于控制旋转轴的振动的振动控制轴承，所述振动轴支撑在旋转机械的壳体中，所述旋转机械包括插入在所述旋转轴的外周表面和所述壳体的内周表面之间并且间隔开的圆柱形状的轴承部件 通过各自的间隙。 在轴承部件的内周面与旋转轴的外周面之间产生动态压力。 在轴承构件中形成有通道导管，用于将产生的动压的一部分传递到轴承构件的外周面与壳体的内周面之间的间隙。

    ULTRASONIC CLEANING APPARATUS
    6.
    发明申请
    ULTRASONIC CLEANING APPARATUS 审中-公开
    超声波清洗装置

    公开(公告)号：US20090025761A1

    公开(公告)日：2009-01-29

    申请号：US11577120

    申请日：2005-10-06

    申请人： Youichirou Matsumoto ,  Teiichirou Ikeda ,  Shin Yoshizawa ,  Terutaka Sahara ,  Nobuo Tsumaki ,  Yoshimitsu Kitada

    发明人： Youichirou Matsumoto ,  Teiichirou Ikeda ,  Shin Yoshizawa ,  Terutaka Sahara ,  Nobuo Tsumaki ,  Yoshimitsu Kitada

    IPC分类号： B08B13/00

    CPC分类号： B08B3/12 ,  B06B2201/71 ,  B08B3/02 ,  B08B2203/0288 ,  G10K11/352

    摘要： An ultrasonic cleaning apparatus which performs ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned, by using a cleaning liquid to which ultrasonic waves are applied has a cleaning bath pooling the cleaning liquid, a support base on which the object to be cleaned is supported in the cleaning liquid, ultrasonic wave generation device for alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves toward the object to be cleaned, a focus position adjustment device of adjusting the distance between a focus position for the focus and the surface of the object to be cleaned, and moving device of moving at least any one of the ultrasonic wave generation device and the support base so that the effect on the surface of the object to be cleaned of the ultrasonic waves generated by the ultrasonic wave generation device is uniform.

    摘要翻译： 一种超声波清洗装置，其通过使用施加了超声波的清洗液对附着在待清洁物体的表面上的污染物进行超声波清洗，具有将清洗液收集在一起的清洗液， 清洗液被支撑在清洗液中，超声波产生装置用于交替聚焦具有1至10MHz的频率的第一超声波和具有等于或低于第一超声波的频率的1/2的第二超声波朝向物体 要被清洁的焦点位置调节装置，调整焦点的焦点位置和待清洁物体的表面之间的距离以及移动超声波产生装置和支撑基底中的至少一个的移动装置， 由超声波发生装置产生的超声波对待清洁物体的表面的影响是均匀的。

    Plasma treatment method and manufacturing method of semiconductor device
    7.
    发明授权
    Plasma treatment method and manufacturing method of semiconductor device 失效
    半导体器件的等离子体处理方法和制造方法

    公开(公告)号：US06186153B1

    公开(公告)日：2001-02-13

    申请号：US09040423

    申请日：1998-03-18

    申请人： Hiroyuki Kitsunai ,  Nobuo Tsumaki ,  Shigeru Kakuta ,  Kazuo Nojiri ,  Kazue Takahashi

    发明人： Hiroyuki Kitsunai ,  Nobuo Tsumaki ,  Shigeru Kakuta ,  Kazuo Nojiri ,  Kazue Takahashi

    IPC分类号： C25F700

    CPC分类号： H01L21/02046 ,  C23C16/4405 ,  H01L21/30604 ,  Y10S438/905

    摘要： Providing a dry cleaning method capable of removing deposition films which adhere to the inner walls of a semiconductor manufacturing apparatus-that is, removing dust production sources therefrom. To this end, the dry cleaning process is supplemented by a step of removing either ion sputtered matter or products of the internal member materials of the apparatus or chemical compounds of such apparatus internal member materials and of an etching gas, in addition to a step of removing etching reaction products. It thus becomes possible to eliminate dust generation due to pealing off of deposition films with an increase in the number of wafers being processed, which in turn increases the manufacturing yield and working efficiency of the manufacturing apparatus.

    摘要翻译： 提供能够除去附着在半导体制造装置的内壁上的沉积膜的干式清洗方法，即从其除去灰尘生成源。 为此，通过除去离子溅射物质或该装置内部构件材料的内部构件材料的产物或这种设备内部构件材料的化学化合物和蚀刻气体的步骤来补充干法，除了步骤 去除蚀刻反应产物。 因此，随着处理晶片数量的增加，可以消除由于沉积膜剥落引起的灰尘的产生，这又提高了制造装置的制造成品率和工作效率。

    Guiding apparatus
    8.
    发明授权
    Guiding apparatus 失效
    引导装置

    公开(公告)号：US4630942A

    公开(公告)日：1986-12-23

    申请号：US692574

    申请日：1985-01-18

    申请人： Nobuo Tsumaki ,  Hiromitsu Tokisue ,  Hiroshi Inoue

    发明人： Nobuo Tsumaki ,  Hiromitsu Tokisue ,  Hiroshi Inoue

    IPC分类号： F16C32/06 ,  B23Q1/26 ,  B23Q1/38 ,  B23Q23/00 ,  F16C29/02 ,  G05B19/402 ,  F16C29/00 ,  F16C33/02

    CPC分类号： F16C32/06 ,  B23Q1/38 ,  B23Q1/385 ,  F16C29/025 ,  G05B19/402 ,  G05B2219/49195 ,  G05B2219/49271

    摘要： A guiding apparatus having a slider supported in a floating manner above a base by means of hydrostatic bearings, a pressurized fluid supplying means for supplying the hydrostatic bearings with a pressurized fluid, and detecting means for detecting the displacement of the slider with respect to a designated coordinate. The pressure of the pressurized fluid from the pressurized fluid supplying means is adjusted in accordance with a signal which is obtained as a result of the comparison between the value representing the reference position of the slider with respect to the base and the value actually measured by the detecting means, thereby adjusting the sizes of the gaps for forming hydrostatic fluid film for the hydrostatic bearings, thereby to correct the position of the slider to the designated position. With this arrangement, the absolute position of the slider is precisely determined without being affected by disturbance factors such as the precision of assembling of the base and the slider. This guiding apparatus is suited to use as precision positioning apparatus such as that used in the assembly of photomodule elements.

    摘要翻译： 一种引导装置，其具有通过静压轴承以浮动方式在基座上方支撑的滑块，用于向静压轴承供应加压流体的加压流体供应装置，以及用于检测滑块相对于指定的位移的检测装置 坐标。 来自加压流体供应装置的加压流体的压力根据由表示滑块的基准位置的值相对于基座的值和由实际测量的值相比较而得到的信号进行调整 检测装置，从而调节用于形成静压轴承的静液流体膜的间隙的尺寸，从而将滑块的位置校正到指定位置。 通过这种布置，滑块的绝对位置被精确地确定，而不受诸如基座和滑块的组装精度等扰动因素的影响。 这种引导装置适用于诸如用于组装光模块元件的精密定位装置。

    Remote diagnostic system and method for semiconductor manufacturing equipment
    9.
    发明授权
    Remote diagnostic system and method for semiconductor manufacturing equipment 失效
    半导体制造设备远程诊断系统及方法

    公开(公告)号：US06618692B2

    公开(公告)日：2003-09-09

    申请号：US09791761

    申请日：2001-02-26

    申请人： Kazue Takahashi ,  Nobuo Tsumaki ,  Hideyuki Yamamoto

    发明人： Kazue Takahashi ,  Nobuo Tsumaki ,  Hideyuki Yamamoto

    IPC分类号： G06F1130

    CPC分类号： H01L22/20 ,  G05B23/0294 ,  G05B2219/33284 ,  G05B2219/34038 ,  G05B2219/45031

    摘要： A remote diagnostic system for semiconductor manufacturing equipment which diagnoses user's semiconductor manufacturing equipment connected to a piece of diagnostic equipment which is provided by a third party through a communication network. The diagnostic equipment having at least one diagnostic program which diagnoses said semiconductor manufacturing equipment and a control section which starts the diagnostic program when accessed by a specific user terminal which has been given an access right, and the terminal sends data which is requested by the diagnostic equipment for diagnosis and receives a result of diagnosis from the diagnostic equipment.

    摘要翻译： 一种用于半导体制造设备的远程诊断系统，其诊断连接到由第三方通过通信网络提供的诊断设备的用户半导体制造设备。 所述诊断设备具有诊断所述半导体制造设备的至少一个诊断程序，以及当被具有访问权限的特定用户终端访问时启动诊断程序的控制部分，并且所述终端发送所述诊断请求的数据 用于诊断的设备，并从诊断设备接收诊断结果。