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37 条记录 (耗时 0.026 秒)

    Photosensitive composition
    1.
    发明授权
    Photosensitive composition 失效
    感光组合物

    公开(公告)号：US5849463A

    公开(公告)日：1998-12-15

    申请号：US879368

    申请日：1997-06-20

    申请人： Shigeo Tsuji ,  Akihisa Murata ,  Toshiyuki Matsumura ,  Nobuyuki Ishii ,  Noriyuki Kidu

    发明人： Shigeo Tsuji ,  Akihisa Murata ,  Toshiyuki Matsumura ,  Nobuyuki Ishii ,  Noriyuki Kidu

    IPC分类号： G03F7/021 ,  G03F7/033 ,  G03F7/32 ,  G03F7/00

    CPC分类号： G03F7/32 ,  G03F7/021 ,  G03F7/033 ,  Y10S430/114

    摘要： A photosensitive composition comprising (1) a compound having at least one addition-polymerizable ethylenically unsaturated double bond, (2) an acidic vinyl copolymer soluble or swellable in alkaline water, which contains, in its molecule, a vinyl monomer having an aromatic hydroxyl group, as a constituting unit, (3) a photopolymerization initiator, and (4) a diazo resin, wherein the diazo resin is a copolycondensed compound which contains, in its molecule, an aromatic compound having a carboxyl group and/or a hydroxyl group, and an aromatic diazonium compound, as constituting units.

    摘要翻译： 一种光敏组合物，其包含（1）具有至少一种可加成聚合的烯属不饱和双键的化合物，（2）在碱性水中可溶或可溶胀的酸性乙烯基共聚物，其分子中含有具有芳族羟基的乙烯基单体 作为构成单元，（3）光聚合引发剂，（4）重氮树脂，其中重氮树脂是其分子中含有具有羧基和/或羟基的芳族化合物的共缩聚化合物， 和芳族重氮化合物作为构成单元。

    Light-sensitive composition
    2.
    发明授权
    Light-sensitive composition 失效
    感光组合物

    公开(公告)号：US5427887A

    公开(公告)日：1995-06-27

    申请号：US106699

    申请日：1993-08-16

    申请人： Satoshi Konuma ,  Toshiyuki Matsumura ,  Akihisa Murata ,  Shigeo Tsuji

    发明人： Satoshi Konuma ,  Toshiyuki Matsumura ,  Akihisa Murata ,  Shigeo Tsuji

    IPC分类号： G03F7/021 ,  G03C1/60

    CPC分类号： G03F7/021 ,  Y10S430/111

    摘要： Disclosed is a light-sensitive composition which comprises(A) a diazo resin and(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.

    摘要翻译： 公开了一种感光性组合物，其包含（A）重氮树脂和（B）碱溶性和可溶胀的聚合物化合物，所述高分子化合物是含有作为结构单元的结构的0.1〜10摩尔％ 衍生自具有8个或更多个碳原子的烷基的丙烯酸或甲基丙烯酸的酯。

    Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus
    4.
    发明授权
    Cleaning sheet, transfer member provided with cleaning function, and method for cleaning substrate processing apparatus 失效
    具有清洁功能的清洁片，转印部件以及清洗基板处理装置的方法

    公开(公告)号：US08524007B2

    公开(公告)日：2013-09-03

    申请号：US12977762

    申请日：2010-12-23

    申请人： Daisuke Uenda ,  Yukio Arimitsu ,  Yoshio Terada ,  Yasuhiro Amano ,  Akihisa Murata

    发明人： Daisuke Uenda ,  Yukio Arimitsu ,  Yoshio Terada ,  Yasuhiro Amano ,  Akihisa Murata

    IPC分类号： B08B7/00 ,  B32B3/30 ,  B32B17/10

    CPC分类号： B08B1/00 ,  B08B7/0028 ,  H01L21/02096 ,  Y10T428/24355 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/31

    摘要： A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.

    摘要翻译： 一种清洁片，包括具有0.05微米以下的算术平均粗糙度Ra和1.0mum以下的最大高度Rz的微细度形状的清洁层。 优选地，每1mm平坦表面的清洁层的基本表面积为1mm 2的平坦区域的硅晶片镜表面的基本表面积的150％或更多。 清洁片可以设置在转印构件的至少一个表面上，使得转印构件具有清洁功能。 当清洁片或具有清洁功能的转印元件在衬底处理设备中转移以代替待处理衬底时，清洁片接触并清洁衬底处理设备的位置。

    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS
    9.
    发明申请
    CLEANING SHEET, TRANSFER MEMBER PROVIDED WITH CLEANING FUNCTION, AND METHOD FOR CLEANING SUBSTRATE PROCESSING APPARATUS 失效
    清洁片，具有清洁功能的转移构件以及清洁基板处理装置的方法

    公开(公告)号：US20090263153A1

    公开(公告)日：2009-10-22

    申请号：US12067235

    申请日：2006-10-12

    申请人： Daisuke Uenda ,  Yukio Arimitsu ,  Yoshio Terada ,  Yasuhiro Amano ,  Akihisa Murata

    发明人： Daisuke Uenda ,  Yukio Arimitsu ,  Yoshio Terada ,  Yasuhiro Amano ,  Akihisa Murata

    IPC分类号： G03G21/00 ,  B32B3/00

    CPC分类号： B08B1/00 ,  B08B7/0028 ,  H01L21/02096 ,  Y10T428/24355 ,  Y10T428/2457 ,  Y10T428/24612 ,  Y10T428/31

    摘要： There are provided a transfer member provided with a cleaning function, which have excellent foreign matter removing performance and transfer performance, and which can remove foreign matters having a predetermined particle diameter with especially high efficiency.The transfer member provided with a cleaning function includes a transfer member and the cleaning layer provided on at least one surface of the transfer member. The cleaning layer has a microasperity shape having an arithmetic average roughness Ra of 0.05 μm or less and a maximum height Rz of 1.0 μm or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2.

    摘要翻译： 提供具有清除功能的转印构件，其具有优异的异物去除性能和转印性能，并且可以以特别高的效率去除具有预定粒径的异物。 设置有清洁功能的传送构件包括传送构件和设置在传送构件的至少一个表面上的清洁层。 清洁层具有0.05微米以下的算术平均粗糙度Ra和1.0μm以下的最大高度Rz的微细度形状。 优选地，每1mm平坦表面的清洁层的基本表面积为1mm 2的平坦区域的硅晶片镜表面的基本表面积的150％或更多。