-
公开(公告)号：US20130209694A1
公开(公告)日：2013-08-15
申请号：US13370606
申请日：2012-02-10
申请人： Shih-Wei Chang , Valeriy V. Ginzburg , Erin B. Vogel , Daniel J. Murray , Peter Trefonas , Phillip D. Hustad
发明人： Shih-Wei Chang , Valeriy V. Ginzburg , Erin B. Vogel , Daniel J. Murray , Peter Trefonas , Phillip D. Hustad
IPC分类号： C09D153/00 , C09D133/12 , B05D3/02 , C08K5/101
CPC分类号： C08L53/00 , B05D3/02 , B82Y40/00 , C08F120/14 , C08F297/026 , C08L2205/025 , C09D153/00 , C08F220/14 , C08F2230/085 , C08L33/12
摘要： A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.
摘要翻译： 含有二嵌段共聚物共混物的嵌段共聚物组合物，包括第一聚（甲基丙烯酸甲酯）-b-聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）二嵌段共聚物; 和第二聚（甲基丙烯酸甲酯）-b-聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）二嵌段共聚物。 还提供了用嵌段共聚物组合物处理的基材。
-
公开(公告)号：US20130209693A1
公开(公告)日：2013-08-15
申请号：US13370588
申请日：2012-02-10
申请人： Erin B. Vogel , Valeriy V. Ginzburg , Shih-Wei Chang , Daniel J. Murray , Phillip D. Hustad , Peter Trefonas
发明人： Erin B. Vogel , Valeriy V. Ginzburg , Shih-Wei Chang , Daniel J. Murray , Phillip D. Hustad , Peter Trefonas
IPC分类号： C08F293/00 , B05D3/02 , C08K5/01
CPC分类号： C08L53/00 , B05D3/02 , B29K2995/0026 , B29L2031/30 , C08F297/026 , C09D133/12 , C08F220/14 , C08F230/08
摘要： A copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
摘要翻译： 提供包含具有聚（甲基丙烯酸甲酯）嵌段和聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）嵌段的嵌段共聚物的共聚物组合物; 其中嵌段共聚物的数均分子量MN为1〜1000kg / mol; 并且其中所述嵌段共聚物表现出1至2的多分散性PD。还提供了用共聚物组合物处理的基材。
-
公开(公告)号：US08710150B2
公开(公告)日：2014-04-29
申请号：US13370606
申请日：2012-02-10
申请人： Shih-Wei Chang , Valeriy V. Ginzburg , Erin B. Vogel , Daniel J. Murray , Peter Trefonas , Phillip D. Hustad
发明人： Shih-Wei Chang , Valeriy V. Ginzburg , Erin B. Vogel , Daniel J. Murray , Peter Trefonas , Phillip D. Hustad
CPC分类号： C08L53/00 , B05D3/02 , B82Y40/00 , C08F120/14 , C08F297/026 , C08L2205/025 , C09D153/00 , C08F220/14 , C08F2230/085 , C08L33/12
摘要： A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.
摘要翻译： 含有二嵌段共聚物共混物的嵌段共聚物组合物，包括第一聚（甲基丙烯酸甲酯）-b-聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）二嵌段共聚物; 和第二聚（甲基丙烯酸甲酯）-b-聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）二嵌段共聚物。 还提供了用嵌段共聚物组合物处理的基材。
-
公开(公告)号：US08697810B2
公开(公告)日：2014-04-15
申请号：US13370588
申请日：2012-02-10
申请人： Erin B. Vogel , Valeriy V. Ginzburg , Shih-Wei Chang , Daniel J. Murray , Phillip D. Hustad , Peter Trefonas
发明人： Erin B. Vogel , Valeriy V. Ginzburg , Shih-Wei Chang , Daniel J. Murray , Phillip D. Hustad , Peter Trefonas
CPC分类号： C08L53/00 , B05D3/02 , B29K2995/0026 , B29L2031/30 , C08F297/026 , C09D133/12 , C08F220/14 , C08F230/08
摘要： A copolymer composition including a block copolymer having a poly(methyl methacrylate) block and a poly((trimethylsilyl)methyl methacrylate) block is provided; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
摘要翻译： 提供包含具有聚（甲基丙烯酸甲酯）嵌段和聚（（三甲基甲硅烷基）甲基丙烯酸甲酯）嵌段的嵌段共聚物的共聚物组合物; 其中嵌段共聚物的数均分子量MN为1〜1000kg / mol; 并且其中所述嵌段共聚物表现出1至2的多分散性PD。还提供了用所述共聚物组合物处理的基材。
-
公开(公告)号：US08821738B2
公开(公告)日：2014-09-02
申请号：US13547230
申请日：2012-07-12
CPC分类号： B05D3/0254 , B44C1/227 , B81C1/00531 , B82Y40/00 , C08G77/442 , C09D183/00 , C09D183/10 , C23C18/00 , C23C18/1204 , C23C18/1212 , C23C18/122 , C23C18/1241 , C23C18/1245 , C23C18/1279 , G03F7/0002 , Y10S438/947 , C08K5/05
摘要： A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; annealing the film in a gaseous atmosphere containing ≧20 wt % oxygen; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
摘要翻译： 提供了一种处理衬底的方法; 其中所述方法包括施加包含聚（苯乙烯）-b-聚（硅氧烷）嵌段共聚物组分的共聚物组合物的膜; 以及对所述基材的表面的抗氧化剂; 任选地，烘烤该膜; 在含有≥20重量％氧的气体气氛中退火该膜; 然后处理退火的膜以从退火的膜中除去聚（苯乙烯），并将退火膜中的聚（硅氧烷）转化为SiO x。
-
公开(公告)号：US20130209344A1
公开(公告)日：2013-08-15
申请号：US13370907
申请日：2012-02-10
IPC分类号： B05D7/24 , B05D3/02 , C01B33/113
CPC分类号： H01L21/31058 , B05D1/005 , B05D3/0254 , B05D7/02 , B81C1/00031 , B81C2201/0149 , C08G77/442 , C09D151/08 , C09D183/10 , G03F7/0002 , H01L21/0337 , H01L21/31138
摘要： A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
-
公开(公告)号：US08961918B2
公开(公告)日：2015-02-24
申请号：US13370907
申请日：2012-02-10
CPC分类号： H01L21/31058 , B05D1/005 , B05D3/0254 , B05D7/02 , B81C1/00031 , B81C2201/0149 , C08G77/442 , C09D151/08 , C09D183/10 , G03F7/0002 , H01L21/0337 , H01L21/31138
摘要： A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
摘要翻译： 提供了一种处理衬底的方法; 其中所述方法包括将包含聚（苯乙烯）-b-聚（二甲基硅氧烷）嵌段共聚物组分的共聚物组合物的膜施加到所述基材的表面; 任选地，烘烤该膜; 在特定的大气条件下对该膜进行高温退火处理一段特定的时间; 然后处理退火的膜以从退火的膜中除去聚（苯乙烯），并将退火膜中的聚（二甲基硅氧烷）转化为SiO x。
-
公开(公告)号：US08821739B2
公开(公告)日：2014-09-02
申请号：US13547246
申请日：2012-07-12
CPC分类号： B05D3/0254 , B44C1/227 , B81C1/00531 , B82Y40/00 , C08G77/442 , C09D183/00 , C09D183/10 , C23C18/00 , C23C18/04 , C23C18/1212 , C23C18/122 , C23C18/1241 , C23C18/1245 , C23C18/1275 , C23C18/1283 , Y10S438/947 , C08K5/05
摘要： A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
-
公开(公告)号：US20140014002A1
公开(公告)日：2014-01-16
申请号：US13547246
申请日：2012-07-12
IPC分类号： B05D3/02
CPC分类号： B05D3/0254 , B44C1/227 , B81C1/00531 , B82Y40/00 , C08G77/442 , C09D183/00 , C09D183/10 , C23C18/00 , C23C18/04 , C23C18/1212 , C23C18/122 , C23C18/1241 , C23C18/1245 , C23C18/1275 , C23C18/1283 , Y10S438/947 , C08K5/05
摘要： A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiOx.
摘要翻译： 提供了一种处理衬底的方法; 其中所述方法包括施加包含聚（苯乙烯）-b-聚（硅氧烷）嵌段共聚物组分的共聚物组合物的膜; 以及对所述基材的表面的抗氧化剂; 任选地，烘烤该膜; 在气态气氛下对该膜进行高温退火处理一定时间; 然后处理退火的膜以从退火的膜中除去聚（苯乙烯），并将退火膜中的聚（硅氧烷）转化为SiO x。
-
公开(公告)号：US20140061155A1
公开(公告)日：2014-03-06
申请号：US13601183
申请日：2012-08-31
申请人： Xinyu Gu , Shih-Wei Chang , Rahul Sharma , Valeriy Ginzburg , Phillip Hustad , Jeffrey Weinhold , Peter Trefonas
发明人： Xinyu Gu , Shih-Wei Chang , Rahul Sharma , Valeriy Ginzburg , Phillip Hustad , Jeffrey Weinhold , Peter Trefonas
IPC分类号： C09D153/00
CPC分类号： C09D153/00 , G03F7/00 , G03F7/0002
摘要： A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
摘要翻译： 提供共聚物组合物和处理基材以在其上形成线空间特征的方法。
-
-
-
-
-
-
-
-
-
搜索结果
19 条记录 (耗时 0.027 秒)
