公开(公告)号：US5999589A

公开(公告)日：1999-12-07

申请号：US140679

申请日：1998-08-26

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.

摘要翻译： 基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和 中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

公开(公告)号：US5883932A

公开(公告)日：1999-03-16

申请号：US464225

申请日：1995-06-05

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

公开(公告)号：US5191218A

公开(公告)日：1993-03-02

申请号：US723336

申请日：1991-06-28

申请人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

发明人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  H01L21/683

CPC分类号： G03F7/707 ,  G03F7/70875 ,  H01L21/6838 ,  Y10S294/907 ,  Y10T279/11

摘要： A vacuum-attraction holding device includes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

公开(公告)号：US5825463A

公开(公告)日：1998-10-20

申请号：US791545

申请日：1997-01-31

申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

CPC分类号： G03F1/22 ,  G03F7/707

摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

公开(公告)号：US5854819A

公开(公告)日：1998-12-29

申请号：US797467

申请日：1997-02-06

申请人： Shinichi Hara ,  Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Kazuyuki Kasumi

发明人： Shinichi Hara ,  Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  H01L21/30

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/708

摘要： There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.

摘要翻译： 公开了一种掩模支撑装置，其包括用于支撑设置有其中形成有掩模图案的矩形窗口的掩模基板的卡盘机构和用于加强掩模基板的框架，以及用于将所述掩模 ，来自相互正交的方向的载荷。 用于施加载荷的机构包括固定的参考，其接触在荫罩框架的外周上的两个位置，以及两个按压机构，用于从两个接触位置相对的两个方向向荫罩框架施加负载。

公开(公告)号：US5930324A

公开(公告)日：1999-07-27

申请号：US831867

申请日：1997-04-02

申请人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

发明人： Shin Matsui ,  Ryuichi Ebinuma ,  Yuji Chiba ,  Yutaka Tanaka

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/30

CPC分类号： G03F7/702 ,  G03F7/70691 ,  G03F7/70841 ,  G03F9/7015

摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.

摘要翻译： 一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件， 由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态 测量部分相对于辐射光的光轴。

公开(公告)号：US5356686A

公开(公告)日：1994-10-18

申请号：US182513

申请日：1994-01-14

申请人： Hidehiko Fujioka ,  Takeshi Miyachi ,  Yasuaki Fukuda ,  Yuji Chiba ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

发明人： Hidehiko Fujioka ,  Takeshi Miyachi ,  Yasuaki Fukuda ,  Yuji Chiba ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

IPC分类号： G03F1/22 ,  G03F1/60 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00 ,  G21K5/00

CPC分类号： G03F1/22 ,  G03F7/70866 ,  Y10T428/21 ,  Y10T428/24612 ,  Y10T428/24851

摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.

摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。

公开(公告)号：US5026239A

公开(公告)日：1991-06-25

申请号：US402601

申请日：1989-09-05

申请人： Yuji Chiba ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Isamu Shimoda

发明人： Yuji Chiba ,  Hidehiko Fujioka ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Isamu Shimoda

IPC分类号： G03F7/20 ,  H01L21/677

CPC分类号： H01L21/67748 ,  G03F7/70741 ,  G03F7/70866 ,  H01L21/67751 ,  H01L21/67778 ,  Y10S414/137

摘要： A mask cassette and mask cassette loading device, suitably usable in an X-ray exposure apparatus for exposing a wafer to a mask with X-rays contained in synchrotron radiation, to print a pattern of the mask on the wafer, are disclosed. The mask cassette includes a base for accommodating a plurality masks and a cover which can be separated from and coupled to the base only in one direction. When the two are coupled by a locking mechanism, the cassette can be completely closed against atmospheric pressure. The mask cassette loading device includes a common mechanism which serves to release the locking mechanism of the cassette and also, to move the cassette base relative to the cover. Thus, with a simple and compact structure, the protection and replacement of X-ray masks are ensured with certainty.

公开(公告)号：US4977459A

公开(公告)日：1990-12-11

申请号：US500097

申请日：1990-03-21

申请人： Ryuichi Ebinuma ,  Yuji Chiba ,  Nobutoshi Mizusawa

发明人： Ryuichi Ebinuma ,  Yuji Chiba ,  Nobutoshi Mizusawa

IPC分类号： B41J2/175 ,  B41J2/165 ,  B41J2/19 ,  B41J29/46

CPC分类号： B41J2/19 ,  B41J2/16579 ,  B41J2202/12

摘要： An ink-jet apparatus in which a recorded image is read to provide a image reference signal for comparison with an image recording signal, the resulting comparison being used as a basis for diagnosing an ink injection state of a recording head nozzles in order to determine and implement an ink injection recovery process.

公开(公告)号：US5552812A

公开(公告)日：1996-09-03

申请号：US465933

申请日：1995-06-06

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00

CPC分类号： B41J2/17523 ,  B41J11/14 ,  B41J2/1652 ,  B41J2/16585 ,  B41J2/1714 ,  B41J2/17513 ,  B41J2/1752 ,  B41J29/02 ,  B41J29/377 ,  G03G21/1628 ,  G03G21/1647 ,  G03G21/206 ,  H04N1/00525 ,  H04N1/00543 ,  H04N1/00554 ,  H04N1/00976 ,  G03G2221/1645 ,  G03G2221/1651 ,  G03G2221/1672 ,  G03G2221/1687

摘要： A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head. The recording apparatus further having a blower which introduces air and directs an air stream through the apparatus and past a full page width recording head. The air stream directs ink mist generated by the printhead through a recording medium discharge port such that ink mist is removed from the apparatus body by riding the air stream or by adhering to the recording medium. Internal contamination of the recording apparatus is avoided.

摘要翻译： 记录装置具有上部单元，该上部单元具有用于排出墨水的记录头，用于响应于信息在记录介质上进行记录，并且该装置的电路的至少一部分具有用于保持 通过记录头在记录站中记录介质，下部单元能够相对于上部单元间隔开;以及传送构件，用于将记录介质传送到记录站。 上部单元和下部单元能够通过记录头在记录站中间隔开并打开。 该记录装置还具有引入空气并引导空气流通过设备并经过全页宽度记录头的鼓风机。 空气流通过记录介质排出口引导由打印头产生的墨雾，从而通过乘坐空气流或通过粘附到记录介质将墨雾从设备主体移除。 避免了记录装置的内部污染。