公开(公告)号：US5999589A

公开(公告)日：1999-12-07

申请号：US140679

申请日：1998-08-26

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.

摘要翻译： 基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和 中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

公开(公告)号：US5883932A

公开(公告)日：1999-03-16

申请号：US464225

申请日：1995-06-05

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

公开(公告)号：US5160961A

公开(公告)日：1992-11-03

申请号：US672636

申请日：1991-03-20

申请人： Mitsuji Marumo ,  Kazunori Iwamoto ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

发明人： Mitsuji Marumo ,  Kazunori Iwamoto ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa

IPC分类号： H01L21/673 ,  G03F7/20 ,  H01L21/027 ,  H01L21/677 ,  H01L21/683 ,  H01L21/687

CPC分类号： G03F7/7075 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/6838 ,  H01L21/68707

摘要： A device for holding a substrate includes a holding system for holding a substrate by attraction and a guard system for preventing dropping of the substrate held by the holding system, the guard system being out of contact with the substrate as the same is held by the holding system.

公开(公告)号：US5191218A

公开(公告)日：1993-03-02

申请号：US723336

申请日：1991-06-28

申请人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

发明人： Tetsuzo Mori ,  Mitsuji Marumo ,  Kazunori Iwamoto ,  Yuji Chiba ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  H01L21/683

CPC分类号： G03F7/707 ,  G03F7/70875 ,  H01L21/6838 ,  Y10S294/907 ,  Y10T279/11

摘要： A vacuum-attraction holding device includes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

公开(公告)号：US5640440A

公开(公告)日：1997-06-17

申请号：US504235

申请日：1995-07-19

申请人： Mitsutoshi Kuno ,  Kazunori Iwamoto ,  Mitsuji Marumo

发明人： Mitsutoshi Kuno ,  Kazunori Iwamoto ,  Mitsuji Marumo

IPC分类号： B25J9/10 ,  B25J13/08 ,  B25J15/06 ,  B65G49/07 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  H01L21/68

CPC分类号： H01L21/67259 ,  G03F7/7075

摘要： A substrate conveying system includes an attracting device for attracting a substrate with reduced pressure, a moving device for relatively moving the substrate relative to the attracting device, and a detecting device for detecting the pressure of the attracting device during the relative movement of the substrate to thereby obtain positional information related to the substrate.

摘要翻译： 基板输送系统包括用于以减压的方式吸引基板的吸引装置，用于使基板相对于吸引装置相对移动的移动装置，以及检测装置，用于在基板相对移动期间检测吸引装置的压力 从而获得与基板相关的位置信息。

公开(公告)号：US5231291A

公开(公告)日：1993-07-27

申请号：US821888

申请日：1992-01-17

申请人： Mitsuaki Amemiya ,  Eiji Sakamoto ,  Koji Uda ,  Kunitaka Ozawa ,  Kazunori Iwamoto ,  Shunichi Uzawa ,  Mitsuji Marumo

发明人： Mitsuaki Amemiya ,  Eiji Sakamoto ,  Koji Uda ,  Kunitaka Ozawa ,  Kazunori Iwamoto ,  Shunichi Uzawa ,  Mitsuji Marumo

IPC分类号： G03F7/20 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/67109 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70866 ,  G03F7/70875

摘要： A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.

摘要翻译： 晶片台包括用于通过吸引保持晶片的晶片保持表面; 流动通道，温度调节介质通过该通道流动以去除晶片台中的任何热量; 用于测量由晶片保持表面保持的晶片的温度的温度测量系统; 设置在晶片保持表面和流动通道之间的温度调节系统; 用于设定与晶片保持面保持的晶片有关的温度的温度设定系统; 流量控制系统，用于控制温度调节介质流过所述流动通道的流量; 以及温度控制系统，用于基于由温度设定系统设定的值和由温度测量系统测量的值来控制与热量相关的温度调节系统的操作。

公开(公告)号：US5168512A

公开(公告)日：1992-12-01

申请号：US668238

申请日：1991-03-12

申请人： Kazunori Iwamoto ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa ,  Ryuichi Ebinuma

发明人： Kazunori Iwamoto ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shunichi Uzawa ,  Ryuichi Ebinuma

IPC分类号： G03F7/20 ,  G21K1/02 ,  H01L21/027

CPC分类号： G03F7/702 ,  G03F7/2039 ,  G03F7/70691 ,  G03F7/70808 ,  G21K1/025 ,  H01L21/0278

摘要： A method for the manufacture of semiconductor devices wherein a radiation beam including first and second beams is projected from a synchrotron orbit radiation source into an ambience maintained substantially at a vacuum, includes the steps of directing the radiation beam to a wafer through a window effective to isolate the ambience to thereby print a circuit pattern on an X-ray sensitive layer on the wafer with the first beam, providing a support for supporting the window having an opening, extracting the second beam through the opening, and detecting and correcting any deviation of the first beam with respect to the wafer.

公开(公告)号：US06965428B2

公开(公告)日：2005-11-15

申请号：US10704638

申请日：2003-11-12

申请人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

发明人： Yasuyo Muto ,  Kazunori Iwamoto ,  Yukio Takabayashi ,  Takashi Meguro

IPC分类号： H01L21/683 ,  H01L21/027 ,  H01L21/68 ,  H01L21/687 ,  G03B27/58 ,  G03B27/62

CPC分类号： H01L21/68785 ,  G03F7/707 ,  G03F7/70716 ,  H01L21/68 ,  H01L21/68792 ,  Y10T279/23

摘要： A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

摘要翻译： 平台装置具有夹持和保持基板的基板保持单元，并且包括具有要安装基板保持单元的凹部的平坦表面。 固定构件将设置在基板保持单元上的突起支撑件固定到平坦表面上。 基板保持单元由固定构件支撑，而突起支撑件的远端与平坦表面的凹部接触，并且基板保持单元的剩余部分不与平坦表面接触。

公开(公告)号：US06856404B2

公开(公告)日：2005-02-15

申请号：US09323034

申请日：1999-06-01

申请人： Kazunori Iwamoto ,  Nobuyoshi Deguchi

发明人： Kazunori Iwamoto ,  Nobuyoshi Deguchi

IPC分类号： G03F7/20 ,  H01L21/027 ,  G01B9/02

CPC分类号： G03F7/70358 ,  G03F7/70725 ,  G03F7/70775

摘要： A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in an X direction intersecting the scan direction, an alignment scope for performing measurement for alignment of the substrate, at a position spaced, in the Y direction, from a position where the exposure of the substrate is to be carried out, an X measuring device for performing yaw measurement of said stage by use of an X reflection surface provided on said stage along the Y direction, a Y measuring device for performing yaw measurement of the stage by use of a Y reflection surface provided on the stage along the X direction, and a controller being operable to select yaw measurement information of the X measuring device for an alignment operation including the alignment measurement using the alignment scope, and being operable to select yaw measurement information of the Y measuring device for the scan exposure.

摘要翻译： 用于通过扫描曝光将图案转印到基板上的扫描型曝光。 该装置包括：用于在与扫描方向对应的Y方向上移动基板的台，并且在与扫描方向相交的X方向上，用于在Y方向上间隔开的位置处进行用于对准基板的测量的对准范围 从要进行基板的曝光的位置，用于通过使用沿着Y方向设置在所述台上的X反射面来进行所述平台的偏航测量的X测量装置，用于执行偏航的Y测量装置 通过使用沿X方向设置在舞台上的Y反射面来测量舞台，以及控制器，用于选择X测量装置的偏航测量信息，以进行包括使用对准范围的对准测量的对准操作，并且 可操作地选择用于扫描曝光的Y测量装置的偏航测量信息。

公开(公告)号：US6069683A

公开(公告)日：2000-05-30

申请号：US927280

申请日：1997-09-11

申请人： Kazunori Iwamoto

发明人： Kazunori Iwamoto

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70358 ,  G03F7/70833 ,  G03F9/70

摘要： An exposure apparatus includes a projection optical system for projecting a pattern of an original onto a substrate, an original stage for moving the original relative to the projection optical system, a substrate stage for moving the substrate relative to the projection optical system, an alignment detecting system for detecting alignment information related to alignment of at least one of the original and the substrate, a correcting device for correcting the alignment information detected by the alignment detecting system, on the basis of the position of the original stage, and a controller for controlling alignment of at least one of the original and the substrate on the basis of the alignment information as corrected by the correcting device.

摘要翻译： 曝光装置包括用于将原稿的图案投影到基板上的投影光学系统，用于相对于投影光学系统移动原稿的原稿台，用于相对于投影光学系统移动基板的基板台，对准检测 用于检测与原稿和基板中的至少一个对准相关的对准信息的系统，用于基于原始台的位置校正由对准检测系统检测的对准信息的校正装置，以及用于控制 基于校正装置校正的对准信息，对原稿和基板中的至少一个进行对准。