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公开(公告)号：US20120248343A1
公开(公告)日：2012-10-04
申请号：US13494442
申请日：2012-06-12
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.
摘要翻译： 用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。 该腔室包括入口，来自激光装置的激光束通过入口进入腔室。 目标供给单元被配置为将目标材料供应到室内的预定区域。 收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎片进入碎片进入表面。 碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。 收集容器收集从收集单元流出的碎屑。
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公开(公告)号：US20120236884A1
公开(公告)日：2012-09-20
申请号：US13421116
申请日：2012-03-15
IPC分类号： H01S3/10
CPC分类号： H01S3/106 , H01S3/005 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0971 , H01S3/2316 , H01S3/2333
摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.
摘要翻译： 本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。 该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长 通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系统来切换光束宽度放大率或缩小因子的切换机构 或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系统的取向反转。
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公开(公告)号：US20100054297A1
公开(公告)日：2010-03-04
申请号：US12545495
申请日：2009-08-21
IPC分类号： H01S3/08
CPC分类号： H01S3/005 , G02B1/02 , H01S3/0057 , H01S3/08009 , H01S3/08054 , H01S3/10061 , H01S3/2251
摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.
摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。
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公开(公告)号：US20110158281A1
公开(公告)日：2011-06-30
申请号：US12899886
申请日：2010-10-07
IPC分类号： H01S3/034
CPC分类号： H01S3/034 , G02B1/02 , G02B5/3091 , H01S3/0346 , H01S3/08054 , H01S3/0816 , H01S3/225 , H01S3/2251
摘要： A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.
摘要翻译： 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。
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5.发明申请HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权保持装置，室外装置和极光超紫外光发生系统公开(公告)号：US20130134330A1
公开(公告)日：2013-05-30
申请号：US13620589
申请日：2012-09-14
CPC分类号： G02B7/02 , G02B7/028 , G02B7/1815 , H05G2/005 , H05G2/008
摘要： A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.
摘要翻译： 用于保持光学元件的保持装置包括具有夹持光学元件的第一和第二构件的保持器，以及用于在第二构件和光学元件之间形成密封的密封构件。
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公开(公告)号：US20120267553A1
公开(公告)日：2012-10-25
申请号：US13540314
申请日：2012-07-02
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G01J3/10 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.
摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。
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公开(公告)号：US20130161540A1
公开(公告)日：2013-06-27
申请号：US13560310
申请日：2012-07-27
申请人： Shinji NAGAI , Osamu WAKABAYASHI
发明人： Shinji NAGAI , Osamu WAKABAYASHI
IPC分类号： G21K5/04
摘要： An apparatus for generating extreme ultraviolet light (EUV) includes a chamber, a target supply unit, a collector mirror, an exhaust device, a gas supply device and an ultraviolet light source. The target supply unit supplies a target material to a predetermined region inside the chamber. The collector mirror collects EUV light generated from the target material. The exhaust device is connected to the chamber. The gas supply device is connected to the chamber to supply an etchant gas into the chamber. The ultraviolet light source irradiates a reflective surface of the collector mirror with ultraviolet light.
摘要翻译： 用于产生极紫外光（EUV）的装置包括室，目标供应单元，集电镜，排气装置，气体供应装置和紫外光源。 目标供应单元将目标材料供应到室内的预定区域。 收集镜收集从目标材料产生的EUV光。 排气装置连接到室。 气体供应装置连接到室以将蚀刻剂气体供应到室中。 紫外光源用紫外线照射收集反射镜的反射面。
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公开(公告)号：US20110253913A1
公开(公告)日：2011-10-20
申请号：US13070735
申请日：2011-03-24
申请人： Shinji NAGAI , Osamu WAKABAYASHI
发明人： Shinji NAGAI , Osamu WAKABAYASHI
IPC分类号： G01J3/10
CPC分类号： H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/003
摘要： A chamber apparatus used with a laser apparatus and a focusing optical system for focusing a laser beam outputted from the laser apparatus may include: a chamber provided with an inlet through which the laser beam is introduced into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; and a collection unit provided in the chamber for collecting a charged particle generated when the target material is irradiated with the laser beam in the chamber.
摘要翻译： 与激光装置一起使用的腔室装置和用于聚焦从激光装置输出的激光束的聚焦光学系统可以包括：设置有入口的腔室，激光束通过入口引入腔室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 以及收集单元，设置在所述室中，用于收集当所述目标材料在所述室中被激光束照射时产生的带电粒子。
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公开(公告)号：US20150139258A1
公开(公告)日：2015-05-21
申请号：US14602208
申请日：2015-01-21
IPC分类号： H01S3/097
CPC分类号： H01S3/09702 , H01S3/0014 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/2366
摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.
摘要翻译： 根据实施例的激光装置可以包括：填充有激光增益介质的激光室; 设置在激光室中的一对电极; 充电器，被配置为施加用于在所述一对电极之间发生放电的充电电压; 脉冲功率模块，被配置为将由充电器施加的充电电压转换成短脉冲电压，并且在一对电极之间施加短脉冲电压; 以及控制器，被配置为基于所述充电电压来计算施加到所述一对电极的输入能量Ein，通过对所计算的输入能量Ein进行积分来计算输入能量Ein的积分值Einsum，并且确定积分值Einsum是否超过积分 输入能量的寿命值Einsumlife。
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公开(公告)号：US20140369373A1
公开(公告)日：2014-12-18
申请号：US14245371
申请日：2014-04-04
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译： 本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。 用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。 具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器 ）。 谐振器被配置为稳定谐振器。
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