SEMICONDUCTOR WAFER AND MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE
    4.
    发明申请
    SEMICONDUCTOR WAFER AND MANUFACTURING PROCESS FOR SEMICONDUCTOR DEVICE 有权
    半导体器件的半导体晶体管和制造工艺

    公开(公告)号:US20090227088A1

    公开(公告)日:2009-09-10

    申请号:US12465349

    申请日:2009-05-13

    IPC分类号: H01L21/78 H01L23/544

    摘要: A semiconductor wafer 1 has first scribe lines 31 in two mutually perpendicular directions which have a first width and divide the semiconductor wafer 1 into a plurality of areas; second scribe lines 32 which have a second width smaller than the first width and divide the area into a plurality of semiconductor chip areas 2; an electrode pad 5 formed along the edge of the semiconductor chip area 2; and a metal-containing accessory pattern 4 disposed in the scribe lines. In the second scribe lines 32, the accessory pattern 4 is absent in at least the outermost surface in an area adjacent to the edge having the electrode pad 5 in the chip area 2.

    摘要翻译: 半导体晶片1具有第一切割线31,其具有第一宽度,并且将半导体晶片1分割成多个区域; 第二划痕线32具有小于第一宽度的第二宽度,并将该区域划分成多个半导体芯片区域2; 沿着半导体芯片区域2的边缘形成的电极焊盘5; 以及设置在划线中的含金属的附件图案4。 在第二划片线32中,在与芯片区域2中具有电极焊盘5的边缘相邻的区域中的至少最外表面中不存在附件图案4。

    LASER BEAM PROCESSING APPARATUS FOR PROCESSING SEMICONDUCTOR WAFER IN PRODUCTION OF SEMICONDUCTOR DEVICES, LASER BEAM PROCESSING METHOD EXECUTED THEREIN, AND SUCH SEMICONDUCTOR WAFER PROCESSED THEREBY
    5.
    发明申请
    LASER BEAM PROCESSING APPARATUS FOR PROCESSING SEMICONDUCTOR WAFER IN PRODUCTION OF SEMICONDUCTOR DEVICES, LASER BEAM PROCESSING METHOD EXECUTED THEREIN, AND SUCH SEMICONDUCTOR WAFER PROCESSED THEREBY 审中-公开
    用于加工半导体器件的半导体晶体管的激光束处理装置,其执行的激光束处理方法及其半导体波形处理方法

    公开(公告)号:US20080099454A1

    公开(公告)日:2008-05-01

    申请号:US11968830

    申请日:2008-01-03

    申请人: Tsuyoshi KIDA

    发明人: Tsuyoshi KIDA

    IPC分类号: B23K26/00

    摘要: In a laser beam processing apparatus that processes a semiconductor wafer having a multi-layered wiring structure formed thereon, scribe lines defined thereon, and at least one alignment mark formed on any one of the scribe lines, a laser beam generator system generates a laser beam, and a movement system relatively moves the semiconductor wafer with respect to the laser beam such that the semiconductor wafer is irradiated with a laser beam along the scribe lines to partially remove the multi-layered wiring structure from the semiconductor wafer along the scribe lines. An irradiation control system controls the irradiation of the semiconductor wafer with the laser beam along the scribe lines such that the alignment mark is left on the scribe line.

    摘要翻译: 在对其上形成有多层布线结构的半导体晶片进行处理的激光束处理装置中,在其上限定的划线以及形成在任一个划线上的至少一个对准标记,激光束发生器系统产生激光束 并且移动系统相对于激光束相对地移动半导体晶片,使得半导体晶片沿着划线照射激光束,以沿着划线部分地从半导体晶片去除多层布线结构。 照射控制系统利用激光束沿着划线来控制半导体晶片的照射,使得对准标记留在划线上。