摘要:
There is provided an economical product information display body A capable of increasing credibility of the product information and sufficiently assuring product reliability and safety at a low cost. The display body A is attached to a product and has a visible information display C relating to the product and invisible information identification means D. The invisible information identification means D is composed of an information presenting substance consisting of one or more elements emitting fluorescence when radiated by an electromagnetic wave of a particular wavelength range or a compound consisting of two or more elements or a substance including these elements or a compound. One or more information of the product information display by the visible information display is correlated to the information presenting substance.
摘要:
A drum type washing machine includes a housing, a rotary drum, a water tub accommodating the rotary drum therein, a door for opening and closing a housing opening for allowing laundry to be loaded into or unloaded from the rotary drum therethrough, a water tub opening communicating with the housing opening, a rotary drum opening communicating with the housing opening and the water tub opening; and an elastic connection member for connecting the housing opening and water tub opening, and having a portion that makes a pressurized contact with the door when the door is closed. A center of the housing opening is displaced upward with respect to a center of the rotary drum opening, and an angle of inclination of the housing opening with respect to a vertical plane is set to be greater than that of the rotary drum opening with respect to the vertical plane.
摘要:
A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.
摘要:
A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
摘要:
Resist compositions comprising as the base resin a polymer using tert-amyloxystyrene as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in the baking temperature range of 100-110° C. which is unachievable with tert-butoxystyrene. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.
摘要:
Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
摘要:
A chemical amplification type resist composition contains as a photoacid generator a sulfonyldiazomethane compound of formula (1) wherein R is H or C1-4 alkyl or alkoxy, G is SO2 or CO, R3 is C1-10 alkyl or C6-14 aryl, p is 1 or 2, q is 0 or 1, p+q=2, n is 0 or 1, m is 3 to 11, and k is 0 to 4. The composition is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution and improved pattern profile after development.
摘要:
A protective screen (5) is provided near a peephole part (7) of a door main body (2) and has its heat resisting temperature higher than the heat resisting temperature of a window frame. Even when a material to be cooked ignites, flame hardly goes outside from the peephole part (7). A temperature switch (3) does not need to be provided in a heating chamber (1). Accordingly, the cooking apparatus can be easily designed.
摘要:
A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要:
With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound.